C11D1/40

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE
20230203409 · 2023-06-29 ·

A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer and the second metal atom-containing layer is exposed on a surface. The cleaning liquid includes at least one of a compound represented by General Formula (a1), a hydrate of the compound, and a salt of the compound, and at least one amine other than the hydrazine compound and a quaternary hydroxide. In General Formula (a1), R.sup.1 and R.sup.2 represent an organic group including no carbonyl group or a hydrogen atom

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LAUNDRY DETERGENT COMPOSITION CONTAINING DYE FIXATIVE AND AMINE-BASED SURFACTANT
20230193159 · 2023-06-22 ·

A laundry detergent composition contains a dye fixative and an amine-based surfactant.

METHOD FOR REDUCING INCIDENCE OF MASTITIS IN DAIRY ANIMALS USING AMINE OXIDE ANTISEPTIC COMPOSITIONS

Methods and compositions for reducing the incidence of mastitis in dairy animals, the method comprising the steps of: topically applying an antimicrobial composition onto the teats or udder of the animal, the composition comprising: a first component comprising from about 2.0% to about 20.0% by weight of the composition of an amine oxide; and a second component comprising a germicide or an oxidizing agent.

METHOD FOR REDUCING INCIDENCE OF MASTITIS IN DAIRY ANIMALS USING AMINE OXIDE ANTISEPTIC COMPOSITIONS

Methods and compositions for reducing the incidence of mastitis in dairy animals, the method comprising the steps of: topically applying an antimicrobial composition onto the teats or udder of the animal, the composition comprising: a first component comprising from about 2.0% to about 20.0% by weight of the composition of an amine oxide; and a second component comprising a germicide or an oxidizing agent.

Cationic surfactant foam stabilizing composition

A foam stabilizing composition is disclosed. The composition comprises (A) a siloxane cationic surfactant comprising a cationic moiety having the formula Z.sup.1-D.sup.1-N(Y).sub.a(R).sub.2−a, wherein Z.sup.1 is a siloxane moiety, D.sup.1 is a divalent linking group, R is H or an unsubstituted hydrocarbyl group having from 1 to 4 carbon atoms, subscript a is 1 or 2, and each Y has formula -D-NR.sup.1.sub.3+, where D is a divalent linking group and each R.sup.1 is independently an unsubstituted hydrocarbyl group having from 1 to 4 carbon atoms. The composition also comprises (B) an organic cationic surfactant comprising a cationic moiety having the formula Z.sup.2-D.sup.2-N(Y).sub.b(R).sub.2−b, wherein Z.sup.2 is an unsubstituted hydrocarbyl group, D.sup.2 is a covalent bond or a divalent linking group, subscript b is 1 or 2, and R, Y, and subscript a, are defined above. An aqueous film-forming foam comprising the composition and method of using the same are also disclosed.

Multi-purpose disinfectant, degreaser, cleaner and herbicide
11678663 · 2023-06-20 ·

A natural cleaning and herbicide composition having an quaternary ammonium compound, one or more additional amine-based surfactants, and an herbicidally active limonene component, that synergistically creates an effective COVID-19 disinfectant in wipes, an effective clearer for bulk cleaning applications, as well as an impressive gross soils remover following EPA protocol. The composition may further contain sodium silicate, tetrasodium iminodisuccinate, an ethanolamine, caustic potash, and/or water. A formulation of the present disclosure comprises a mixture of about 74% soft water, about 1% Tetrasodium Iminodisuccinate, about 0.5% Monoethanolamine, about 0.5% Sodium Silicate, about 2% alkali surfactant, about 12% Ethoxylated Amine, about 1% Amine Oxide, about 1% Quaternary Amine, and about 6% Limonene.

CLEANING COMPOSITIONS EMPLOYING EXTENDED CHAIN ANIONIC SURFACTANTS
20230183605 · 2023-06-15 ·

The invention discloses synergistic combinations of surfactant blends and cleaning compositions employing the same. In certain embodiments a surfactant system is disclosed which includes an extended anionic surfactant with novel co-surfactants including one or more of an alkyl glycerol ether, an ethoxylated alkyl glycerol ether, an alcohol ethoxylate and/or a gemini surfactant. This system forms emulsions with, and can remove greasy and oily stains, even those comprised of non-trans fats. The compositions may be used alone, as a pre-spotter or other pre-treatment or as a part of a soft surface or hard surface cleaning composition.

DETERGENT COMPOSITION AND CHEMICAL-MECHANICAL POLISHING COMPOSITION
20230174892 · 2023-06-08 · ·

A detergent composition and a polishing composition are provided. The detergent composition facilitates sufficient removal of polishing agents, metal microparticles, and anticorrosives in cleaning of a semiconductor substrate and long-term maintenance of flatness of a metal wiring surface after cleaning and achieves excellent quality stability for a long period of time; and the polishing composition facilitates suppression of scratching on a polished object such as a semiconductor substrate, and reduction of filter clogging. A detergent composition containing an alkanol hydroxylamine compound represented by General Formula (1) and having a pH of 10 to 13, and a chemical-mechanical polishing composition containing the detergent composition and a polishing agent. In Formula (1), R.sup.a1 and R.sup.a2 are the same or different and each represents a hydrogen atom or an alkyl group having from 1 to 10 carbons and having from 1 to 3 hydroxyl groups, with proviso that R.sup.a1 and R.sup.a2 are not simultaneously hydrogen atoms, and a total number of hydroxyl groups present in R.sup.a1 and R.sup.a2 is not 0.

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DETERGENT COMPOSITION AND CHEMICAL-MECHANICAL POLISHING COMPOSITION
20230174892 · 2023-06-08 · ·

A detergent composition and a polishing composition are provided. The detergent composition facilitates sufficient removal of polishing agents, metal microparticles, and anticorrosives in cleaning of a semiconductor substrate and long-term maintenance of flatness of a metal wiring surface after cleaning and achieves excellent quality stability for a long period of time; and the polishing composition facilitates suppression of scratching on a polished object such as a semiconductor substrate, and reduction of filter clogging. A detergent composition containing an alkanol hydroxylamine compound represented by General Formula (1) and having a pH of 10 to 13, and a chemical-mechanical polishing composition containing the detergent composition and a polishing agent. In Formula (1), R.sup.a1 and R.sup.a2 are the same or different and each represents a hydrogen atom or an alkyl group having from 1 to 10 carbons and having from 1 to 3 hydroxyl groups, with proviso that R.sup.a1 and R.sup.a2 are not simultaneously hydrogen atoms, and a total number of hydroxyl groups present in R.sup.a1 and R.sup.a2 is not 0.

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Surfactant blend for removal of fatty soils

Alkaline cleaning compositions with a blend of an amine and a nonionic alcohol ethoxylate between about 1:2 to about 1:10, preferably about 1:5 to about 1:10, with an alkalinity source and chelant are provided. The cleaning compositions provide efficacious cleaning of fatty soils to enhance fatty soil removal. Methods of cleaning surfaces using the cleaning composition are also disclosed.