Patent classifications
C11D1/40
POST-CMP CLEANING COMPOSITION FOR GERMANIUM- CONTAINING SUBSTRATE
A cleaning composition for cleaning a surface of a substrate comprising silicon germanium after a chemical mechanical polishing process is provided. The cleaning composition includes an oligomeric or polymeric polyamine, at least one wetting agent, a pH adjusting agent, and a solvent.
POST-CMP CLEANING COMPOSITION FOR GERMANIUM- CONTAINING SUBSTRATE
A cleaning composition for cleaning a surface of a substrate comprising silicon germanium after a chemical mechanical polishing process is provided. The cleaning composition includes an oligomeric or polymeric polyamine, at least one wetting agent, a pH adjusting agent, and a solvent.
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a liquid detergent composition for washing dishes which provides effective removal of both crystalline and polymerised grease, while requiring less time and effort to clean and rinse the dishes, is met when the composition is formulated with a surfactant system comprising an anionic surfactant, a co-surfactant, and a non-alkoxylated esteramine.
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a liquid detergent composition for washing dishes which provides effective removal of both crystalline and polymerised grease, while requiring less time and effort to clean and rinse the dishes, is met when the composition is formulated with a surfactant system comprising an anionic surfactant, a co-surfactant, and a non-alkoxylated esteramine.
CLEANING PRODUCT
The need for a cleaning product comprising a spray dispenser and a cleaning composition suitable for washing dishes which provides effective removal of both crystalline and polymerised grease, even at low surfactant and solvent levels, while also requiring less time and effort to clean and especially to rinse the dishes, regardless of hardness of the water used, is met by formulating the cleaning composition with a surfactant system comprising a non-alkoxylated esteramine.
CLEANING PRODUCT
The need for a cleaning product comprising a spray dispenser and a cleaning composition suitable for washing dishes which provides effective removal of both crystalline and polymerised grease, even at low surfactant and solvent levels, while also requiring less time and effort to clean and especially to rinse the dishes, regardless of hardness of the water used, is met by formulating the cleaning composition with a surfactant system comprising a non-alkoxylated esteramine.
SOIL REMOVAL ON COTTON VIA TREATMENT IN THE RINSE STEP FOR ENHANCED CLEANING IN THE SUBSEQUENT WASH
The disclosure relates to compositions particularly suited for removing soils from textiles, in particular the removal of oily food soils, oily cosmetic soils, and industrial soils from textiles containing cotton, particularly those comprising one or more of surfactants, and cationic amines, or silicone compounds. Methods of making and using such compounds are also provided.
MULTI-PURPOSE DISINFECTANT, DEGREASER, CLEANER AND HERBICIDE
A natural cleaning and herbicide composition having an quaternary ammonium compound, one or more additional amine-based surfactants, and an herbicidally active limonene component, that synergistically creates an effective COVID-19 disinfectant in wipes, an effective clearer for bulk cleaning applications, as well as an impressive gross soils remover following EPA protocol. The composition may further contain sodium silicate, tetrasodium iminodisuccinate, an ethanolamine, caustic potash, and/or water. A formulation of the present disclosure comprises a mixture of about 74% soft water, about 1% Tetrasodium Iminodisuccinate, about 0.5% Monoethanolamine, about 0.5% Sodium Silicate, about 2% alkali surfactant, about 12% Ethoxylated Amine, about 1% Amine Oxide, about 1% Quaternary Amine, and about 6% Limonene.
Cleaning solution composition and cleaning method using the same
A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
Cleaning solution composition and cleaning method using the same
A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.