Patent classifications
C11D1/58
Solvent compositions for removing petroleum residue from a substrate and methods of use thereof
A method of cleaning highway and road construction equipment is disclosed.
Solvent compositions for removing petroleum residue from a substrate and methods of use thereof
A method of cleaning highway and road construction equipment is disclosed.
Bicyclic Surfactants
Fused and unfused bicyclic rings are a convenient scaffold for synthesizing various compounds. Amphiphilic compounds constructed upon a fused or unfused bicyclic ring scaffold may exhibit surfactant properties differing from those of more conventional classes of surfactants. Such amphiphilic compounds may have a structure of formula (I), wherein A is an aromatic ring, a heteroaromatic ring, or a cycloaliphatic ring, each ring being defined by 5 to 10 ring atoms, B is an aromatic ring or a heteroaromatic ring, each ring being defined by 5 to 6 ring atoms, wherein at least one G is a hydrophobic moiety and at least one G is a hydrophilic moiety, and z is 0 or a positive integer ranging up to the number of ring atoms in each of A and B; and wherein the hydrophobic moiety comprises branched or unbranched C.sub.6 to C.sub.30 alkyl or alkenyl group, and the hydrophilic moiety comprises a polar functional group selected from the group consisting of quaternary ammonium, sulfonate, sulfate, carboxylate, phosphate, and ethoxylated.
##STR00001##
Solvent Composition and Process for Removal of Asphalt and Other Contaminant Materials
A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.
Solvent Composition and Process for Removal of Asphalt and Other Contaminant Materials
A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.
Solvent Composition and Process for Removal of Asphalt and Other Contaminant Materials
A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.
SOLVENT COMPOSITIONS FOR REMOVING PETROLEUM RESIDUE FROM A SUBSTRATE AND METHODS OF USE THEREOF
A method of cleaning highway and road construction equipment is disclosed.
SOLVENT COMPOSITIONS FOR REMOVING PETROLEUM RESIDUE FROM A SUBSTRATE AND METHODS OF USE THEREOF
A method of cleaning highway and road construction equipment is disclosed.
Solvent composition and process for removal of asphalt and other contaminant materials
A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.
Post CMP cleaning composition
The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.