The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.

A composition is provided for a non-aqueous foaming aerosol cleaner or lubricant. Foam builders, especially silicone glycol copolymers, are used to generate high density foam of the solvent-based formula. A cleaning product variant may be introduced via an air intake route for loosening deposits in an internal combustion engine. The high foam aerosol product dispenses easily without causing engine stalling. A process of lubricating a target substrate is also provided.

A composition is provided for a non-aqueous foaming aerosol cleaner or lubricant. Foam builders, especially silicone glycol copolymers, are used to generate high density foam of the solvent-based formula. A cleaning product variant may be introduced via an air intake route for loosening deposits in an internal combustion engine. The high foam aerosol product dispenses easily without causing engine stalling. A process of lubricating a target substrate is also provided.

A method of cleaning highway and road construction equipment is disclosed.

A method of cleaning highway and road construction equipment is disclosed.

An antimicrobial cleaning composition having a pH of from about 9 to about 14 wherein the composition comprises a bispyridinium alkane antimicrobial active and the composition is substantially free of a quaternary ammonium antimicrobial active.

An antimicrobial cleaning composition having a pH of from about 9 to about 14 wherein the composition comprises a bispyridinium alkane antimicrobial active and the composition is substantially free of a quaternary ammonium antimicrobial active.

The present invention relates to a method which can effectively remove perovskite light absorbers, hole transport layers, metal electrodes, and the like by immersing a waste perovskite-based photoelectric conversion element module in a cleaning solution under predetermined conditions. The present invention can recover a substrate from the waste module and manufacture a photoelectric conversion element having a photoelectric conversion efficiency level comparable to the initially high level again, using the same.

The present disclosure relates to compositions and methods for the removal of deposits from oilfield apparatus and wellbore surfaces. In particular, removal of deposits comprising heavy hydrocarbon materials and finely divided inorganic solids. The composition includes a mixture of a corrosion inhibitor component which is morpholine or a morpholine derivative having corrosion inhibitor properties, and a surfactant which is a quaternary ammonium compound having biocidal properties. Methods of removing a deposit from a surface or unplugging an oilwell which has been plugged with a deposit, are also included wherein the method comprising contacting the deposit with a composition as disclosed herein for a selected period of time.

The present disclosure relates to compositions and methods for the removal of deposits from oilfield apparatus and wellbore surfaces. In particular, removal of deposits comprising heavy hydrocarbon materials and finely divided inorganic solids. The composition includes a mixture of a corrosion inhibitor component which is morpholine or a morpholine derivative having corrosion inhibitor properties, and a surfactant which is a quaternary ammonium compound having biocidal properties. Methods of removing a deposit from a surface or unplugging an oilwell which has been plugged with a deposit, are also included wherein the method comprising contacting the deposit with a composition as disclosed herein for a selected period of time.