The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.

The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.

A micellar compositions including oil-soluble surfactants delivered by water-soluble surfactants are disclosed. The micellar compositions demonstrate enhanced crude oil mobilization in porous media. When the porous media was imbued with crude oil, the presence of the surfactant in the oil phase improved the mobilization performance of crude oil. Solutions of SDS were used to solubilize the surfactant, and the formation of SDS/PIBSI micellar composition was confirmed by Cryo-SEM images. High cleaning effectiveness of the micellar compositions on crude oil entrapped in porous media was demonstrated by image binarization.

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, an aprotic solvent such as dimethyl sulfoxide, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.

A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, an aprotic solvent such as dimethyl sulfoxide, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.

The need for an all-purpose hard surface cleaning composition which provides improved removal of greasy soap scum and water-marks, especially on inclined surfaces, is met by formulating an alkaline composition with an alkyl pyrrolidone, and a co-surfactant selected from the group consisting of: an amine oxide surfactant; a betaine surfactant; and mixtures thereof.

The need for an acidic liquid hard surface cleaning composition which provides improved removal of grease residues, while still being effective at removing limes-scale, is met by formulating an acidic liquid hard surface cleaning composition with an alkyl pyrrolidone, and additional nonionic surfactant selected from the group consisting of: alkoxylated nonionic surfactant, alkyl polyglucoside, and mixtures thereof, while limiting the amount of anionic surfactant present.

The need for an antimicrobial hard surface cleaning composition which provides improved removal of greasy residues, especially greasy soap scum, is met by formulating the antimicrobial hard surface cleaning composition with an alkyl pyrrolidone surfactant and additional nonionic surfactant.

A fluid aqueous composition for cleaning an electric personal care apparatus including at least one alkyl benzene sulfonate and at least two non-ionic surfactants. The alkyl benzene sulfonate may be sodium alkyl benzene sulfonate. The non-ionic surfactants may be a fatty alcohol polyalkylene glycol ether and a fatty alcohol polyglycol ether.

A fluid aqueous composition for cleaning an electric personal care apparatus including at least one alkyl benzene sulfonate and at least two non-ionic surfactants. The alkyl benzene sulfonate may be sodium alkyl benzene sulfonate. The non-ionic surfactants may be a fatty alcohol polyalkylene glycol ether and a fatty alcohol polyglycol ether.