The invention relates to a non-corrosive degreasing concentrate and ready to use formulation. In particular, non-corrosive compositions capable of removing polymerized grease as effectively as some alkali metal hydroxide (i.e. caustic) based degreasers without requiring the use of personal protective equipment are disclosed.

Described herein are compositions and methods for use in automotive care. In particular, the present disclosure is directed to compositions that provide an improved cure time and durability and methods of use thereof.

Disclosed are inhibitor/cleaner compositions comprising alkyldiphenyloxide disulfonates, and methods of inhibiting corrosion of and removing schmoo from metal containments in contact with corrosive water sources. Also disclosed are metal containment assemblages comprising inhibitor/cleaner compositions and metal containment therefore. The alkyldiphenyloxide disulfonates are soluble or substantially soluble in the water sources and inhibit corrosion of the metal containments by the water sources containing corrodents. The alkyldiphenyloxide disulfonates also remove schmoo from the metal containments. The inhibitor/cleaners of the invention are useful for addition to produced waters and other corrosive water sources resulting from enhanced oil recovery operations. The inhibitor/cleaners inhibit corrosion of tanks, devices, and other metal containments such as carbon steel pipes which come into contact with produced waters from the oil recovery operations, while also providing schmoo reduction and removal from the metal containments. The inhibitor cleaners are also useful for addition to other corrosive aqueous fluids to inhibit corrosion of metal containments with which the aqueous fluids come into contact, such as corrosive aqueous discharge from mines and other industrial operations such as paper-making.

This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one compound comprising at least three hydroxyl groups; 4) at least one carboxylic acid; 5) at least one Group II metal cation; 6) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 7) water. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate.

Present invention relates to a detergent composition and a method for preparing the composition. The composition may be a compressed tablet, a coated tablet, in form of small granules or pearls packed in a dose unit. The composition may also be formulated so as to be an effervescent composition. The detergent composition may conveniently be used in the food industry for cleaning of appliances in food processing and preparation or in the metal industry for cleaning of appliances with respect to soot or oil residues.

This invention provides a liquid composition that removes titanium nitride from a substrate without corroding tungsten or a low-k interlayer dielectric also present on said substrate. Said liquid composition has a pH between 0 and 4, inclusive, and contains the following: at least one oxidizing agent (A) selected from the group consisting of potassium permanganate, ammonium peroxodisulfate, potassium peroxodisulfate, and sodium peroxodisulfate; a fluorine compound (B); and a tungsten-corrosion preventer (C). The tungsten-corrosion preventer (C) either contains at least two different compounds selected from a group of compounds (C1) consisting of alkylamines, salts thereof, fluoroalkylamines, salts thereof, and the like or contains at least one compound selected from said group of compounds (C1) and at least one compound selected from a group of compounds (C2) consisting of polyoxyalkylene alkylamines, polyoxyalkylene fluoroalkylamines, and the like. The mass concentration of potassium permanganate in the abovementioned oxidizing agent (A) is between 0.001% and 0.1%, inclusive, and the mass concentration of the abovementioned fluorine compound (B) is between 0.01% and 1%, inclusive.

Methods and systems are provided for producing ionized alkaline solutions (e.g. ionized alkaline water) that exhibit long-term stability when stored at room temperature.

An aqueous formulation includes a) one or more proteolytic enzymes, b) one or more anionic surfactants, c) one or more non-ionic surfactants, d) one or more corrosion inhibitors, e) one or more multivalent aliphatic alcohols, f) one or more complexing agents, and g) one or more of para-hydroxybenzoic acid and esters thereof. The pH value of the formulation is in the range of from 9. to 12.5. The formulation is used in the mechanical cleaning of hard surfaces, in particular of medical instruments, and is preferably silicate free.

The invention relates to a composition comprising a) at least one N-methyl-N-acylglucamine of formula (I), wherein R.sup.1 represents a linear or branched, saturated or unsaturated hydrocarbon chain with 7 to 21 carbon atoms, one or more organic acids of formula (II) and/or the salts thereof, R.sup.2—COOM, wherein R.sup.2 represents a linear or branched alkyl group or a linear or branched mono- or poly-unsaturated alkenyl group with 5 to 29 carbon atoms, and M represents hydrogen or one or more cations, wherein the cations are present in charge-equalizing amounts, and c) one or more alkanolamines of formula (III), wherein NR.sup.1R.sup.2R.sup.3R.sup.1, R.sup.2 and R.sup.3 represent hydrogen, a linear or branched alkyl group with 1 to 4 carbon atoms, a cycloalkyl group with 5 to 7 carbon atoms, a linear or branched hydroxyalkyl group with 2 to 5 carbon atoms and 1 or 2 hydroxy groups or a hydroxyether group with 2 to 6 carbon atoms, with the provision that at least one of the groups is a hydroxyalkyl group or a hydroxyether group.

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This disclosure relates to a cleaning composition that contains 1) HF; 2) substituted or unsubstituted boric acid; 3) ammonium sulfate; 4) at least one metal corrosion inhibitor; 5) water; and 6) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.