A treatment application garment, such as a glove or a sock, is disclosed. The garment allows for various treatments directed toward the fingers and toes, such as the fingernails and toenails. For example, each digit of the garment may contain an absorbent pad containing acetone. The hand or foot is inserted into the garment such that the nail is positioned below the absorbent pad containing the acetone, allowing the acetone to be constantly applied to the nail to remove polish therefrom. After the treatment is complete, the glove may be removed and the open end thereof tied off, thereby containing the acetone and the smell thereof within the glove. Other features and treatments are also disclosed.

A treatment application garment, such as a glove or a sock, is disclosed. The garment allows for various treatments directed toward the fingers and toes, such as the fingernails and toenails. For example, each digit of the garment may contain an absorbent pad containing acetone. The hand or foot is inserted into the garment such that the nail is positioned below the absorbent pad containing the acetone, allowing the acetone to be constantly applied to the nail to remove polish therefrom. After the treatment is complete, the glove may be removed and the open end thereof tied off, thereby containing the acetone and the smell thereof within the glove. Other features and treatments are also disclosed.

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

There is provided herein a polyalkylene-oxide-free surfactant composition comprising an ester-modified organosilicon having the general formula (I)

AO.sub.aR.sup.4.sub.b(BO.sub.cR.sup.11.sub.d).sub.e(C).sub.fD.sub.g.

There is also provided methods for making the ester-modified organosilicon (I) and agricultural, coating, personal care and home care applications containing the polyalkylene-oxide-free surfactant composition.

There is provided herein a polyalkylene-oxide-free surfactant composition comprising an ester-modified organosilicon having the general formula (I)

AO.sub.aR.sup.4.sub.b(BO.sub.cR.sup.11.sub.d).sub.e(C).sub.fD.sub.g.

There is also provided methods for making the ester-modified organosilicon (I) and agricultural, coating, personal care and home care applications containing the polyalkylene-oxide-free surfactant composition.

The present invention relates to a composition, preferably a cosmetic composition, and more preferably a cleansing composition, comprising: (a) at least one polyglyceryl fatty acid diester and/or at least one polyglyceryl fatty acid triester; (b) at least one polyglyceryl fatty acid monoester; and (c) at least one oil, wherein the ingredients (a) and (b) comprise a fatty acid moiety with 6 to 22 carbon atoms, preferably 7 to 20 carbon atoms, and more preferably 8 to 18 carbon atoms, and 10 or less glycerol units, preferably 8 or less, and more preferably 6 or less, and the average HLB value of the ingredients (a) and (b) ranges from 8.0 to 11.0, preferably from 8.5 to 10.5, and more preferably from 9.0 to 10.0. The composition according to the present invention is stable and can provide sufficient makeup removability and a comfortable feeling just after being rinsed off.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.