The use of a composition including at least one acido-basic neutralising agent for decontaminating an atmosphere contaminated by a corrosive gas, the acido-basic neutralising agent having at least 2 pKa's and being characterised by: pKa 1≤pKa 2, pKa 1>2, pKa 2<12, 4<½ (pKa 1+pKa 2)<10 pKa 1, representing the smallest of the basic pKa's and pKa 2 representing the largest of the acidic pKa's. Also, a method for decontaminating an atmosphere contaminated by a corrosive gas comprising the spraying of the neutralising agent, and to a decontamination device.

A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.

An apparatus and method for wet cleaning a gas stream has a housing with a gas inlet and a gas outlet, wherein, in the housing, there is at least a first washing segment that serves to clean the gas stream with a washing liquid and that is arranged in the flow path of the gas stream. Inside the housing of the apparatus, there is at least one fan that regulates air pressure along the flow path of the gas stream. A bypass channel for bypassing the flow path through the at least one washing segment as well as a regulator that is arranged in the bypass and that serves to discharge the gas stream being conveyed via the bypass channel are arranged inside the housing.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

Deleterious gas is captured from atmospheric air using capture units dispersed across a geographic region. Each unit has a filter that is capable of capturing compounds from the gas from air when air is passed through the filter by fans. The units additionally include a sensor for sensing a level of the gas in the air. An electronic processor controls the fan, and communicates data from the sensor to other units and/or a central electronic processor. The electronic processors of the units or the central processor controls the fan speed of units in areas of higher concentration of the gas, selecting which units to become active based upon a proximity of each unit to the gas concentration, as well as a direction of movement of the concentration. A communicated presence of errors or a low battery state of a unit, is used by the processor to select other units nearby for operation instead of the affected unit.

A heated inlet tube for use in a wet scrubber is disclosed. In one embodiment, the heated inlet tube comprises a heated tube concentric to the inlet tube to which a heated gas is applied thereby maintaining temperature of a waste gas stream as it flows through the inlet tube. In a further embodiment, an insulating tube concentrically surrounds the heated tube to further maintain the temperature of the waste gas stream.

Refrigeration systems with a purge for removing non-condensables from the refrigerant and an acid filter for remove acid from the refrigerant are provided. The acid filter can be operatively connected to the purge. Optionally, the purge can include a separating device for separating non-condensable gases from condensable refrigerant gases and an acid filter is provided to remove acid from the condensable refrigerant gases.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

A method and device for waste gas dedusting and a dedusting agent used in the method. A dust-containing waste gas (1) and an organic dedusting agent (4) are introduced into a dedusting tower (3), respectively, and make contact with each other in the tower; at least part of the water vapor in the dust-containing waste gas (1) is condensed, and the organic dedusting agent (4) and the condensed water adsorb solid particles, acidic pollutants, organic pollutants and/or heavy metal compounds in the dust-containing waste gas; and the resulting purified gas (2) is emptied out or subjected to a subsequent process. The organic dedusting agent (4) comprises a non-toxic and high boiling point organic solvent composition, being two or more selected from cooking oil, silicone oil, modified silicone oil, liquid-state asphalt oil, tung tree seed oil, liquid-state paraffin wax oil, mineral oil, palm oil and waste cooking oil.