A method for decomposing a nitroso compound, comprising: adding an aqueous solution containing hydrogen halide to a liquid to be treated that contains the nitroso compound in such a manner that the hydrogen halide is present in an amount of 2 mol or more and 20 mol or less per mol of a nitroso group in the nitroso compound; and subsequently heating the resulting liquid to be treated at a temperature of not lower that 75° C. and not higher than a boiling point of water under ordinary pressure, thereby an amines are recovered.

A gas processing furnace according to the present invention includes: a heater body filled with an electric heating element; and a tubular gas passage passing through the heater body. The gas processing furnace includes: a block-like heater body extending in the up-down direction and filled with the electric heating element; gas passages passing through the heater body in the up-down direction, the gas passages being consecutively disposed or extended in the front-back direction, the gas passages being arranged so as to form a plurality of arrays parallel to each other in the right-left direction, in a plan view; and a headbox mounted at an upper end portion of the heater body and configured to allow the gas passages to communicate with each other via a communication space formed inside the headbox.

A process for removal of impurities, in particular of dopants, from chlorosilanes which includes the following steps: (a) heating a deposition surface (3); (b) contacting the heated deposition surface (3) with at least one gaseous chlorosilane mixture, the gaseous chlorosilane mixture including at least one chlorosilane and at least one impurity, in particular at least one dopant; (c) at least partially removing the impurity, in particular the dopant, by forming polycrystalline silicon depositions on the deposition surface (3), the polycrystalline silicon depositions being enriched with the impurity, in particular with the dopant; (d) discharging the purified gaseous chlorosilane mixture; (e) contacting the heated deposition surface (3) with an etching gas to return the polycrystalline silicon depositions and the impurity, in particular the dopant, into the gas phase to form a gaseous etching gas mixture; and (f) discharging the gaseous etching gas mixture.

ABSTRACT An apparatus is for collecting a by-product in a semiconductor manufacturing process. The apparatus includes: a housing cooling channel on an inner wall thereof to cool exhaust gas which is temperature-controlled by a heater while being introduced through a gas inlet of an upper plate; an internal collecting tower including multiple vertical plates and multiple horizontal plates that are assembled, and condensing and collecting a by-product from the exhaust gas; a main cooling channel having a serpentine shape and cooling the exhaust gas uniformly by using coolant while passing through the internal collecting tower; and a multi-connection pipe sequentially supplying the coolant to the upper plate cooling channel, the housing cooling channel, and the main cooling channel and discharging the coolant, by using a supply pipe and a discharge pipe that are provided outside the housing.

A carbon processing system comprises an air mover and a multi-stage reactor. The multi-stage reactor processes ambient air and generates carbon dioxide and generates exhausted gas released to ambient air. In operation, air contacts the base solution via the air mover. The air reacts with the base solution thereby generating a base solution having carbon dioxide and generating exhaust (absorption reaction). Next, the exhaust is released from the reactor. Next, heat is applied to the base solution having carbon dioxide thereby generating carbon dioxide and generating a base solution without carbon dioxide (desorption reaction). The base solution without carbon dioxide generated after applying heat is reusable in processing new air. The absorption reaction and desorption reaction are reversible reactions resulting in regeneration of the base solution into its form prior to contact with the air yielding high scalability and less processing volume as required by many conventional carbon processing techniques.

A material for removing a contaminant, the material including an adsorption material for adsorption of a contaminant and a decomposition material for decomposition of a contaminant, wherein the adsorption material and the decomposition material are complexed with each other, and a contaminant decomposition onset temperature of the decomposition material is equal to or lower than a contaminant desorption onset temperature of the adsorption material.

A system for directly capturing and measuring greenhouse gasses from a mixture of gasses over a wide range of concentrations from ambient air to combustion exhaust products including: an emissions capture reaction vessel; a reaction media container configured to house a volume of reaction media, the reaction media configured to extract a constituent gas from gas flowing through the emissions capture reaction vessel and capture constituent gas; an intake and exhaust manifold configured to receive and release, respectively a portion of a gas stream via a first access tap on the exhaust stack; a computer system comprised of sensors and actuators connected to a network to directly measure efficiency and uptake of a system, and a fan arranged within the housing and configured to influence the amount and speed of the gas stream processed.

A system and a method for continuously separating carbon dioxide from gas mixtures, utilizing a continuous loop of porous monoliths which support a sorbent within its pores. Continuously exposing a portion of the continuous loop of monoliths to a flow of gas mixture containing a minor proportion of carbon dioxide, to adsorb carbon dioxide from the flow. The loop passes through a sealed regeneration and carbon dioxide capture assembly located astride a portion of the loop, and which is capable of sealingly containing a monolith in relative movement through the assembly. The assembly chamber comprises a plurality of separately sealed zones, including at least one zone for purging oxygen from the monoliths, -a subsequent zone for heating the monolith to release the adsorbed carbon dioxide, and another cooling zone for cooling the monolith prior to reentering the adsorption portion of the loop where it is exposed to oxygen.

A method of capturing CO.sub.2 and converting the captured CO.sub.2 into useful byproducts includes providing a material including a material matrix holding an ionic liquid, exposing the material to a source of thermal energy to capture CO.sub.2 within the material, removing the material from exposure to the source of thermal energy, and washing the material with a solution to convert the captured CO.sub.2 and wash the converted, captured CO.sub.2 from the material as filtrate. Materials and systems for capturing CO.sub.2 and converting the captured CO.sub.2 into useful byproducts are also provided.

Systems for separating and concentrating CO.sub.2 from air or a gas include a vortex tube designed for separating and concentrating CO.sub.2 from a gaseous input stream. The vortex tube has an operating design pressure of between 105 psi and 280 psi above atmospheric pressure and produces a concentrated CO.sub.2 outlet stream. The concentrated CO.sub.2 outlet stream is in fluid connection with a conversion system capable of converting the separated CO.sub.2 into another chemical compound.