A method for capturing carbon dioxide includes contacting a carbon dioxide lean gas mixture with water. One or more acid gas impurities may pass from the carbon dioxide lean gas mixture to the water to form a gas mixture and an aqueous effluent. The gas mixture is passed to a pressure swing adsorption system or a temperature swing adsorption system to increase a concentration of carbon dioxide in the gas mixture to form a carbon dioxide enriched gas mixture. The carbon dioxide enriched gas mixture is contacted with the aqueous effluent in a carbon dioxide scrubber. Carbon dioxide passes from the carbon dioxide enriched gas mixture to the aqueous effluent to form a stripped gas and acid gas enriched water. The acid gas enriched water is passed to a reactive rock formation. The one or more acid gas impurities and carbon dioxide are mineralized and permanently sequestered.

This process comprises quenching and washing with water a gas stream derived from pyrolysis, and separating an aqueous phase from a washed gas stream; compressing, then cooling a washed gas stream; washing the compressed gas stream under pressure; passing the washed gas stream through at least one acid removal unit; drying the acid-depleted gas stream; passing the dry gas stream through at least one impurity removal unit; and feeding the purified gas stream into a cryogenic absorption unit and supplying the cryogenic absorption unit with a hydrocarbon cryogenic solvent to obtain a light gas residue, and a fraction of C.sub.2.sup.+ hydrocarbons.

A gas processing system for recovering methane gas from a landfill includes a high pressure main absorber plus a relatively low pressure one. The low pressure absorber receives a gas stream from an equally low pressure flash tank. This low pressure gas stream consists mostly of carbon dioxide and methane. The methane would normally be lost due to the high cost of recompressing the carbon dioxide, but by running this mixture of carbon dioxide and methane through the low pressure absorber with a slip stream of cold absorbent, a large portion of the carbon dioxide can be removed with negligible methane losses. The remaining methane can be recycled through the high pressure main absorber without having to recompress the removed portion of carbon dioxide.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

Acid gas compounds are removed from a process gas such as, for example, syngas or natural gas, by flowing a feed gas into a desulfurization unit to remove a substantial fraction of sulfur compounds from the feed gas and flowing the resulting desulfurized gas into a CO.sub.2 removal unit to remove a substantial fraction of CO.sub.2 from the desulfurized gas.

The invention provides a process to purify a gas stream by using an adsorbent bed and a secondary device to remove heavy hydrocarbons with a recycle stream then sent first to a vessel containing an amine solvent to remove acid gases including carbon dioxide and hydrogen sulfide and then in most embodiments of the invention sending the treated gas stream to a dehydration unit such as an adsorbent bed or to a triethylene glycol absorbent to remove water. The invention further provides improved integration of the process streams to allow for smaller amine solvent and dehydration units as compared to the prior art.

A process for producing methanol includes the following steps (a) reacting, via a catalytic partial oxidation (CPO) reaction, a CPO reactant mixture (hydrocarbon, oxygen, and optionally steam) in a CPO reactor to produce syngas including H.sub.2, CO, CO.sub.2, H.sub.2O, and unreacted hydrocarbons; and wherein the CPO reactor includes a CPO catalyst; (b) introducing the syngas to a methanol reactor to produce a methanol reactor effluent stream (methanol, water, hydrogen, carbon monoxide, carbon dioxide, and hydrocarbons); and (c) separating the methanol reactor effluent stream into a crude methanol stream, a hydrogen stream, a CO.sub.2 stream, and a purge gas stream. The crude methanol stream comprises includes methanol and water; wherein the purge gas stream includes carbon monoxide and hydrocarbons; and the CO2 stream includes at least a portion of the CO2 of the methanol reactor effluent stream; and (d) recycling at least a portion of the CO2 stream to the CPO reactor.

A system for mitigating naturally occurring radioactive materials (NORM) in an oxidative dehydrogenation process includes a feed stream, an oxidative dehydrogenation (ODH) reactor, an effluent stream, a processing unit, and a NORM reduction unit. The feed stream includes oxygen, a hydrocarbon, and NORM. The ODH reactor is configured to receive the feed stream and react the hydrocarbon with the oxygen to form a dehydrogenated hydrocarbon and water. The effluent stream includes the dehydrogenated hydrocarbon, water, unreacted hydrocarbon, and NORM. The processing unit is configured to process the effluent stream to form product stream and a recycle stream. The product stream includes the dehydrogenated hydrocarbon. The recycle stream includes unreacted hydrocarbon and NORM. The NORM reduction unit is configured to reduce an amount of the NORM in the recycle stream to produce a NORM-reduced recycle stream. The ODH reactor is configured to receive the NORM-reduced recycle stream.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.