A method for producing 225.sup.A including: a method (X) for purifying a .sup.226Ra-containing solution, including an adsorption step of allowing a .sup.226Ra ion to adsorb onto a carrier having a function of selectively adsorbing a divalent cation by bringing a .sup.226Ra-containing solution into contact with the carrier under an alkaline condition, and an elution step of eluting the .sup.226Ra ion from the carrier under an acidic condition; a method for producing a .sup.226Ra target, including an electrodeposition liquid preparation step of preparing an electrodeposition liquid by using a purified .sup.226Ra-containing solution obtained by the method (X), and an electrodeposition step of electrodepositing a .sup.226Ra-containing substance on a substrate by using the electrodeposition liquid; and a step of irradiating a .sup.226Ra target produced by the method for producing a .sup.226Ra target with at least one selected from a charged particle, a photon, and a neutron by using an accelerator.

An object of the present invention is to provide a method for purifying efficiently and easily a .sup.226Ra-containing solution obtained when .sup.225Ac is produced from a .sup.226Ra target, a method for producing a .sup.226Ra target by using the purified .sup.226Ra-containing solution obtained by the above purification method, and a method for producing .sup.225Ac including these above methods. The method for purifying a .sup.226Ra-containing solution according to the present invention is characterized by including an adsorption step (R1) of allowing .sup.226Ra ions to adsorb onto a carrier having a function of selectively adsorbing divalent cations by bringing a .sup.226Ra-containing solution (a) into contact with the carrier under an alkaline condition; and an elution step (R2) of eluting the .sup.226Ra ions from the carrier under an acidic condition.

This application discloses the method for separating element or isotopes such as protactinium and gallium and isotopes thereof from a corresponding mixture which method comprises contacting the mixture with a carbon-based separation material, wherein the carbon-based separation material selectively associates with the element or isotope thereof.

This application discloses the method for separating element or isotopes such as protactinium and gallium and isotopes thereof from a corresponding mixture which method comprises contacting the mixture with a carbon-based separation material, wherein the carbon-based separation material selectively associates with the element or isotope thereof.

A method for producing deuterium-depleted water by removing heavy water and semi-heavy water from water includes an adsorption step of supplying water vapor to a predetermined adsorbent at pressure at which heavy water and semi-heavy water are adsorbed by the adsorbent and light water is not easily adsorbed, causing the heavy water and semi-heavy water to be adsorbed, and recovering the water vapor not adsorbed by the adsorbent. The method also includes a desorption step of maintaining vapor pressure around the predetermined adsorbent which has adsorbed the water vapor in a range in which light water is desorbed and heavy water or semi-heavy water is not easily desorbed, and recovering the water vapor desorbed from the adsorbent.

Methods for enriching, separating, or enriching and separating isotopes and isotopologues, as well as other chemical species, contained in a supersonic beam are provided. In the methods, a supersonic beam having different isotopes, isotopologues, or other chemical species entrained therein and a beam comprising a matrix material converge on a surface. As the matrix material forms a solid matrix on the surface, heavier isotopes, isotopologues, and/or other chemical species become preferentially embedded in the matrix, while lighter isotopes, isotopologues, and/or other chemical species are preferentially scattered from the surface.

Methods and materials for the selective capture and storage of preselected materials from gas streams using metal organic framework (MOF) materials are described. In various embodiments preselected target material gases could include noble gasses such as Kr, Xe, Rn, Arultramicro to mesopore frameworks for selective separation and storage of noble gases, other gasses such as I.sub.2 or other particular isotopes either naturally occurring or man-made, or another preselected gas capture material such as a target material for legal, regulatory or treaty compliance, or a preselected material from a particular process such as a cleaning or etching agent from semiconducting or microelectronic manufacture, or a portion of an anesthetic gas such as nitrous oxide, isoflurane, sevoflurane or a fluorinated ethers.

Methods and materials for the selective capture and storage of preselected materials from gas streams using metal organic framework (MOF) materials are described. In various embodiments preselected target material gases could include noble gasses such as Kr, Xe, Rn, Arultramicro to mesopore frameworks for selective separation and storage of noble gases, other gasses such as I.sub.2 or other particular isotopes either naturally occurring or man-made, or another preselected gas capture material such as a target material for legal, regulatory or treaty compliance, or a preselected material from a particular process such as a cleaning or etching agent from semiconducting or microelectronic manufacture, or a portion of an anesthetic gas such as nitrous oxide, isoflurane, sevoflurane or a fluorinated ethers.

Methods and materials for the selective capture and storage of preselected materials from gas streams using metal organic framework (MOF) materials are described. In various embodiments preselected target material gases could include noble gasses such as Kr, Xe, Rn, Ar other gasses such as I.sub.2 or other particular isotopes either naturally occurring or man-made, or another preselected gas capture material such as a target material for legal, regulatory or treaty compliance, or a preselected material from a particular process such as a cleaning or etching agent from semiconducting or microelectronic manufacture, or a portion of an anesthetic gas such as nitrous oxide, isoflurane, sevoflurane or a fluorinated ethers.

Methods and materials for the selective capture and storage of preselected materials from gas streams using metal organic framework (MOF) materials are described. In various embodiments preselected target material gases could include noble gasses such as Kr, Xe, Rn, Ar other gasses such as I.sub.2 or other particular isotopes either naturally occurring or man-made, or another preselected gas capture material such as a target material for legal, regulatory or treaty compliance, or a preselected material from a particular process such as a cleaning or etching agent from semiconducting or microelectronic manufacture, or a portion of an anesthetic gas such as nitrous oxide, isoflurane, sevoflurane or a fluorinated ethers.