Systems and methods are described for supplying a rinsing liquid including ultrapure water and an ammonia gas. The system includes an ultrapure water source and a gas mixture source in fluid communication with a contactor. The gas mixture includes ammonia gas and a carrier gas. The system includes a control unit configured to adjust a flow rate of the ultrapure water source such that an operational pressure of the contactor remains below a pressure threshold. The system includes a compressor configured to remove a residual transfer gas out of the contactor. The contactor generates a rinsing liquid having ultrapure water and a concentration of the ammonia gas dissolved therein. The system includes a pump in fluid communication between the contactor and an outlet. The pump is configured to deliver the rinsing liquid having a gaseous partial pressure below the pressure threshold at the outlet.

A bubble generating device includes a casing unit, a gas intake unit and a liquid input unit. The casing unit includes a flow passage converging from a first casing end towards a second casing end. The gas intake unit includes a mounting part mounted to the first casing end, a protrusion projecting and tapering from the mounting part into the flow passage, and a gas channel extending through the mounting part and protrusion and communicates with the flow passage. The liquid input unit includes a liquid channel communicating with the flow passage and defines an axis nonparallel to and radially offset from an axis of the flow passage.

The description relates to methods and apparatus that enable the efficient introduction of gases like air, oxygen and ozone into aqueous liquids. Gases are introduced into liquids for making that gas chemically or biologically available at a minimum energy expenditure. Impinging jets of liquid are directed into a pressurized saturation vessel having a gas-filled headspace and a saturation zone below the surface of the liquid at a velocity sufficient to create a turbulent impact and plunge zone. The resulting turbulence and mixing of gas and liquid in that zone under pressure, causes the gas to be driven into the liquid in the vessel and breaks up the gas and the liquid into a churning flow and creates a large number of bubbles. The resulting gas-enriched liquid is discharged from the vessel at an outlet to ensure a minimum of bubbles in the gas-enriched liquid.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

A substrate processing apparatus includes: at least one processing part for etching a polysilicon film or an amorphous silicon film formed on a substrate using an alkaline chemical liquid; a reservoir configured to recover and store the chemical liquid used in the at least one processing part; processing lines configured to supply the chemical liquid stored in the reservoir to the at least one processing part; a circulation line configured to take out the chemical liquid from the reservoir and to return the same to the reservoir; and a first gas supply line connected to the circulation line and configured to supply an inert gas to the circulation line. The circulation line includes an ejection port configured to eject a mixed fluid of the inert gas supplied by the first gas supply line and the chemical liquid taken out from the reservoir into the chemical liquid stored in the reservoir.

A discharge system includes a mixing vessel and a feedstock input in fluid communication with the mixing vessel. A solvent input is in fluid communication with the mixing vessel. A discharge output is in fluid communication with an outlet of the mixing vessel to discharge effluent. A method for generating turbulence on a liquid surface within a discharge system includes supplying a mixing vessel with feedstock fluid and solvent fluid to generate a liquid mixture and a gas pocket in the mixing vessel. The method includes supplying an impinging solvent fluid through a nozzle extending from a first end of the mixing vessel to generate a roiling surface at an interface between the gas pocket and the liquid mixture and permit uptake of gas from the gas pocket into the liquid mixture.

An apparatus configured to generate generating water having nano bubbles of molecular hydrogen on demand. The apparatus is connected to a water supply with a valve and has a pump which supplies pressurized water to a venturi gas liquid mixer that also receives a supply of Hydrogen gas. The mixed hydrogen gas/water steam is provided to a nano bubble generating apparatus that uses cavitation to generate nano bubbles of Hydrogen in the water. The Hydrogen nano bubbles have diameters of less than 200 nm and a concentration of up to 1.2 ppm. Further the concentration remains with 85% of the output concentration for at least 12 hours.

Systems and methods for delivering a gas, such as nitric oxide, are provided. In some embodiments, systems and methods are provided for delivering a gas, such as nitric oxide, in the form of nanobubbles and/or a dissolved gas using a liquid medium.

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture including the ammonia gas and the transfer gas. The system includes a contactor that receives the deionized water and the gas mixture and generates deionized water having ammonia gas dissolved therein. The system includes a sensor in fluid communication with at least one inlet of the contactor for measuring a flow rate of the deionized water, and a controller in communication with the sensor. The controller sets a flow rate of the ammonia gas based on the flow rate of the deionized water measured by the sensor, and a predetermined conductivity set point.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.