A new plasma catalyst in the form of a ceramic-matrix nanocomposite is disclosed for application to the plasma-assisted combustion. The new functionality of the nanoceramic plasma catalyst is driven by the synergistic effect of plasma and solids. The plasma catalyst is based on combinations of valve metal oxides, polar transition-metal oxides, rare-earth oxides and phosphides, alkali metal oxides, silicon oxides and nitrides, etc. are disclosed. The advantage of combining a heterogeneous catalytic and plasma catalytic effect allows utility for large area applications and is scalable for large-scale industries.

The disclosure relates to a method of performing ozonolysis or ozone-based oxidation on a liquid or emulsified reagent using a tubular falling film reactor with one or multiple tubes wherein the combined ozone and carrier gas flow is co-current.

Apparatus for undertaking a chemical reaction includes an elongate housing and a receptacle. The elongate housing may include a cooling means, and end fittings, which may include ports where fluids may be introduced and/or removed. In use of the apparatus, a chemical reaction product is formed within the receptacle. Subsequently the receptacle containing the chemical reaction product is withdrawn from the elongate housing.

A method of assembling an apparatus for containing reagents for a chemical reaction. The apparatus includes an elongate housing and a receptacle. The elongate housing may include a cooling means, and end fittings which may include ports where fluids may be introduced and/or removed. Specifically, the method relates to the securement of a receptacle relative to the outwardly facing surface of the housing.

Provided herein are high throughput continuous or semi-continuous reactors and processes for manufacturing graphenic materials, such as graphene. Such processes are suitable for manufacturing graphenic materials at rates that are up to hundreds of times faster than conventional techniques, and have little batch-to-batch variation. Also provided herein are graphenic compositions of matter, including large, high quality and/or highly uniform graphene.

A substrate processing apparatus is disclosed. Exemplary substrate processing apparatus includes a reaction chamber provided with a chamber wall; a susceptor disposed within the reaction chamber to support a substrate; a gas supply unit to supply a gas to the substrate; and an exhaust duct disposed within the reaction chamber, comprising: an inner ring comprising a first inner end and a second inner end; wherein the first inner end is configured to contact a bottom of the chamber wall; and an outer ring provided with a plurality of holes, the outer ring comprising a first outer end and a second outer end; wherein the first outer end is configured to contact a side of the chamber wall and the second outer end is configured to be engaged with the second inner end.

The packing has one or more thin-layer packing elements that are installed upright, the packing element having a main body portion with a planar liquid film formation surface, and one or more wall portions that are provided upright relative to the liquid film formation surface along a linear direction. The side surface of each wall portion has a curved portion at the base thereof connected to the liquid film formation surface, the curved portion curving so as to continue into the liquid film formation surface.

A packing for gas-liquid contact has at least one packing element of a thin layer shape, placed in a standing position. The packing element has a main body portion having a planar liquid film-forming surface extending along a liquid flow direction, and at least one wall portion provided to stand relative to the liquid film-forming surface and extending along the liquid flow direction. The wall portion has a side surface inclined at a predetermined angle to the liquid film-forming surface in a surface position of a liquid film to be formed by a liquid on the liquid film-forming surface.

A process including introducing, into a device, an aqueous fluid containing at least one inorganic salt, the water of the aqueous fluid being in supercritical conditions or close to the supercritical range in the device, and measuring the concentration or the amount of inorganic salt in the device, this measurement preferably being carried out before the entry of the inorganic salt into the device, Then bringing the inorganic salt into contact with an aqueous flow containing at least one hydroxide salt to obtain in the device an aqueous fluid mixture containing an inorganic salt and a hydroxide salt and adjusting the concentration or amount of the hydroxide salt as a function of the concentration or amount of the inorganic salt needed to at least partially solubilize the inorganic salt. Preferably the measurement of the concentration or the amount of inorganic salt leaving the device is also performed.

A shell-and-tube equipment has a cylindrical geometry and is arranged along a vertical axis. The shell-and-tube equipment comprises an upper chamber and a lower chamber connected to a common tube bundle on opposite sides. The upper chamber is provided with at least an inlet nozzle for inletting a first fluid. The tube bundle is surrounded by a shell provided with nozzles for inletting and outletting a second fluid which exchanges heat with the first fluid through the tube bundle. The upper chamber encloses at least a distribution device configured for uniformly delivering the first fluid towards the tube bundle. The distribution device comprises an annular channel which is arranged around the vertical axis and is in fluid communication with the inlet nozzle. The distribution device comprises a plurality of channel modules of circular trapezoid shape, tightly joined together at their respective vertical edges for forming the annular channel.