An applicator head for a vacuum coating system includes a manifold shell having opposing shell plates, each including a conduit attachment coupled to a shell aperture. An applicator manifold is affixed to each shell plate. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds.

An apparatus for forming a thin film by repeating, plural times, a cycle including supplying and adsorbing a precursor gas onto a substrate and generating a reaction product by allowing the precursor gas on the substrate to react with a reaction gas, which includes: a main precursor gas supply part for supplying the precursor gas; a reaction gas supply part for supplying the reaction gas; an adjustment-purpose precursor gas supply part for supplying an adjustment-purpose precursor gas to adjust an in-plane film thickness distribution of the thin film; and a controller for outputting a control signal to execute a step of forming the thin film using the main precursor gas supply part and the reaction gas supply part, and subsequently a step of supplying the adjustment-purpose precursor gas from the adjustment-purpose precursor gas supply part to compensate for a film thickness of a portion having a relatively thin film thickness.

An apparatus for forming a thin film by repeating, plural times, a cycle including supplying and adsorbing a precursor gas onto a substrate and generating a reaction product by allowing the precursor gas on the substrate to react with a reaction gas, which includes: a main precursor gas supply part for supplying the precursor gas; a reaction gas supply part for supplying the reaction gas; an adjustment-purpose precursor gas supply part for supplying an adjustment-purpose precursor gas to adjust an in-plane film thickness distribution of the thin film; and a controller for outputting a control signal to execute a step of forming the thin film using the main precursor gas supply part and the reaction gas supply part, and subsequently a step of supplying the adjustment-purpose precursor gas from the adjustment-purpose precursor gas supply part to compensate for a film thickness of a portion having a relatively thin film thickness.

An imprint apparatus forms imprint material using a mold on a substrate. The imprint apparatus includes a movable stage configured to hold the substrate, a supply portion configured to discharge the imprint material, and a control unit configured to cause the supply portion to discharge the imprint material while moving the stage so that the imprint material is supplied onto the substrate. The control unit controls discharge of the imprint material from the supply portion so that a target amount of the imprint material is arranged at a target position on the substrate, based on property information indicating a relation between a discharge amount of imprint material from the supply portion and a position on a target object where the imprint material is to be arranged.

An imprint apparatus forms imprint material using a mold on a substrate. The imprint apparatus includes a movable stage configured to hold the substrate, a supply portion configured to discharge the imprint material, and a control unit configured to cause the supply portion to discharge the imprint material while moving the stage so that the imprint material is supplied onto the substrate. The control unit controls discharge of the imprint material from the supply portion so that a target amount of the imprint material is arranged at a target position on the substrate, based on property information indicating a relation between a discharge amount of imprint material from the supply portion and a position on a target object where the imprint material is to be arranged.

Provided is an adhesive application system configured to apply a necessary and sufficient amount of an adhesive to a thin steel strip without causing an increase in the equipment cost. The adhesive application system comprises an adhesive application device having adhesive dispensing nozzles (26, 27) for dispensing an adhesive to an adhesive application surface of a thin steel strip; a mechanism configured to elevate and lower the adhesive application device; and adhesive supply ports (17, 18) for supplying the adhesive at a predetermined pressure to the adhesive application device, wherein the adhesive application device has an end face that is to be brought into abutment against the thin steel strip, and wherein outlets of the adhesive dispensing nozzles (26, 27) are spaced inwardly away from the end face of the adhesive application device so that the outlets of the adhesive dispensing nozzles (26, 27) are maintained at a predetermined distance from a lower surface of the thin steel strip.

There is provided a dip coating apparatus that includes a sealed case assembly for containing at least one workpiece to be coated. The dip coating apparatus also includes an air pump communicated with the sealed case assembly, for pumping air from the sealed case assembly and injecting air into the sealed case assembly. Further, the dip coating apparatus includes a fresh coating solution container containing a coating solution, which is communicated with the sealed case assembly, for injecting the coating solution to the sealed case assembly and a recycle coating solution container, which is communicated with the sealed case assembly, for retrieving the coating solution from the sealed case assembly.

There is provided a dip coating apparatus that includes a sealed case assembly for containing at least one workpiece to be coated. The dip coating apparatus also includes an air pump communicated with the sealed case assembly, for pumping air from the sealed case assembly and injecting air into the sealed case assembly. Further, the dip coating apparatus includes a fresh coating solution container containing a coating solution, which is communicated with the sealed case assembly, for injecting the coating solution to the sealed case assembly and a recycle coating solution container, which is communicated with the sealed case assembly, for retrieving the coating solution from the sealed case assembly.

Systems for removing gas from a sealant and transferring gas-less sealant to an applicator are provided. The system may comprise: a rotatable chamber including: a first opening for receiving sealant; a hollow conduit arranged such that when gas accumulates in the center of the rotatable chamber when the rotatable chamber is rotating, the gas is ventable from the rotatable chamber; a second opening for receiving gas-less sealant from the rotatable chamber after the gas is vented from the hollow conduit; and a motor operatively configured to rotate the rotatable chamber; and a gas-less sealant applicator in fluid communication with the second opening of the rotatable chamber such that gas-less sealant released by the second opening is flowable into the applicator. The system may also include a robot arm including an end effector with a sealant dispensing nozzle. A method for applying sealant to an aircraft structure is also provided.

A pulsation dampener for a dispensing system comprising a housing, a diaphragm comprising at least one fluoropolymer layer, the diaphragm dividing the housing into a first compartment and a second compartment, an inlet port and an outlet port each in fluid communication with the first compartment thereby providing a flow path for a liquid to enter the first compartment via the first inlet port and exit the first compartment via the outlet port, and at least one gas disposed within the second compartment, the at least one gas having a kinetic diameter of 0.36 nm or greater, wherein the fluoropolymer of the at least one fluoropolymer layer and the at least one gas are selected such that a gas transmittance rate of the at least one gas through the diaphragm is from 0 mbar*L/second to 1*10.sup.−5 mbar*L/second.