A device for coating semiconductor/semiconductor precursor particles on a flexible substrate and a preparation method of a semiconducting thin film, wherein the device includes: a container for a first and second solvent substantially immiscible; injection means for injecting a predetermined dispersion volume of at least one layered semiconductor particle material or its precursor(s), occurring at a liquid-liquid interface formed within the container and between the first and second solvent, and creating a particle film at the liquid-liquid interface; a first support means; substrate extracting means; substrate supply means; compression means, reducing a distance between particles and push the film onto the substrate, wherein the compression means includes several pushing means mounted on a drive device, wherein at least two of the several pushing means are at least partially submerged in the second solvent during drive device rotation, and moved through the second solvent toward the first support means.

A large-area monolayer of solvent dispersed nanomaterials and method of producing same is provided. The method includes dripping a nanomaterial solvent into a container filled with water whereby the nanomaterial being dripped collects at the air-water interface to produce the large-area monolayer. In one embodiment, different nanomaterial solvents can be dripped, at predetermined intervals such that the resulting large-area monolayer includes at least two different nanomaterials.

The present invention generally relates to a device and a process for performing large-scale noncovalent functionalization of 2D materials, with chemical pattern elements as small as a few nanometers, using thermally controlled rotary Langmuir-Schaefer conversion. In particular, the present invention discloses a device comprising a thermally regulated disc driven by a rotor with fine speed control configured to be operable with a Langmuir trough for performing large-scale noncovalent functionalization of 2D materials, achieving ordered domain areas up to nearly 10,000 m.sup.2, with chemical pattern elements as small as a few nanometers. A process using the device for performing large-scale noncovalent functionalization of 2D materials with chemical pattern elements as small as a few nanometers is within the scope of this disclosure. The process we demonstrate would be readily extensible to roll-to-roll processing, addressing a longstanding challenge in scaling Langmuir-Schaefer transfer for practical applications.

The disclosure is directed at a large-area monolayer of solvent dispersed nanomaterials and method of producing same. The method of the disclosure includes dripping a nanomaterial solvent into a container filled with water whereby the nanomaterial being dripped collects at the air-water interface to produce the large-area monolayer. In one embodiment, different nanomaterial solvents can be dripped, at predetermined intervals such that the resulting large-area monolayer includes at least two different nanomaterials.

A Langmuir-Blodgett trough comprising a middle barrier, configured for creating two different layers of material over the surface of a single subphase liquid. The first layer of material is located on a first side of the middle barrier, while the second layer of material is located on a second side of the middle barrier. The through comprises an adjustment apparatus which comprises a first grooved edge, a second grooved edge, a first side barrier, and a second side barrier. The first side barrier and a second side barrier extend between the first grooved edges. The motion of the first and second side barriers is configured to adjust the surface areas of the first and second materials.

The disclosure is directed at a large-area monolayer of solvent dispersed nanomaterials and method of producing same. The method of the disclosure includes dripping a nanomaterial solvent into a container filled with water whereby the nanomaterial being dripped collects at the air-water interface to produce the large-area monolayer. In one embodiment, different nanomaterial solvents can be dripped, at predetermined intervals such that the resulting large-area monolayer includes at least two different nanomaterials.

A device for coating semiconductor/semiconductor precursor particles on a flexible substrate and a preparation method of a semiconducting thin film, wherein the device includes: a container for a first and second solvent substantially immiscible; injection means for injecting a predetermined dispersion volume of at least one layered semiconductor particle material or its precursor(s), occurring at a liquid-liquid interface formed within the container and between the first and second solvent, and creating a particle film at the liquid-liquid interface; a first support means; substrate extracting means; substrate supply means; compression means, reducing a distance between particles and push the film onto the substrate, wherein the compression means includes several pushing means mounted on a drive device, wherein at least two of the several pushing means are at least partially submerged in the second solvent during drive device rotation, and moved through the second solvent toward the first support means.

A method is disclosed of three-dimensional (3D) free-form printing for coating free-form objects, the method including: arranging a free-form object in a Langmuir-Blodgett (LB) trough filed with a liquid, the LB trough designed based on a shape of the free-form object; arranging an LB film comprising a plurality of colloidal nanospheres on a surface of the liquid within the LB trough; and draining the liquid from the LB trough to form a self-assemble film of the colloidal nanoparticles on a surface of the free-form object.

Disclosed is an apparatus for graphene wet transfer, which includes: a reservoir body having at least two reservoirs; a barrier structure located on the reservoir and having at least one separated space formed by barriers; and a substrate frame located below the barrier structure and having at least one substrate accommodation groove for accommodating a target substrate to which graphene is transferred. Here, each reservoir may be filled with a solution for a wet transfer process, and the graphene may be separately located in each separated space in a floating state in the solution.

Disclosed is an apparatus for graphene wet transfer, which includes: a reservoir body having at least two reservoirs; a barrier structure located on the reservoir and having at least one separated space formed by barriers; and a substrate frame located below the barrier structure and having at least one substrate accommodation groove for accommodating a target substrate to which graphene is transferred. Here, each reservoir may be filled with a solution for a wet transfer process, and the graphene may be separately located in each separated space in a floating state in the solution.