B05D3/068

Method of applying electron beam curable aqueous coating material

Provided is a method of applying an electron beam curable aqueous coating material, including coating a surface of a material to be coated with the electron beam curable aqueous coating material to form a wet coating film; drying the wet coating film until a time integration value of a reciprocal of an average value of viscosities of a region from a surface of the wet coating film to a depth of one half a film thickness of the wet coating film is in a range of 0.30 (Pa.Math.s).sup.−1.Math.min to 0.90 (Pa.Math.s).sup.−1.Math.min, which is acquired by an electric field pick-up method, and a solid content concentration of the wet coating film is 90% by mass or greater; and curing the obtained dry coating film by irradiation with an electron beam after the wet coating film is dried.

DECORATIVE SHEET AND METHOD FOR MANUFACTURING DECORATIVE SHEET
20230025597 · 2023-01-26 ·

There is provided a decorative sheet having excellent design properties, i.e., low gloss, and having fingerprint resistance, high durability (particularly scratch resistance or contamination resistance), and processability. A decorative sheet (1) according to this embodiment includes: a base material layer (2); and a surface protective layer (5) provided on one surface of the base material layer (2), in which the surface protective layer (5) has ridge-like parts provided to project in a ridge-like shape and form an irregular shape on the surface, RSm/Ra of the irregular shape of the surface protective layer (5) is within the range of 10 or more and 300 or less, the surface protective layer (5) contains an ionizing radiation curable resin as a main material, the ionizing radiation curable resin contains, as a main component, a trifunctional acrylic resin containing a repeating structure, the repeating structure is any one of the structures of ethylene oxide, propylene oxide, and ε-caprolactone, and the number of repetitions of the repeating structure is 3 or more.

APPLICATION OR FILM FORMATION METHOD FOR PARTICULATE MATTER
20220410203 · 2022-12-29 · ·

[Problem] Upon application or film formation of a particulate matter to/on an object, the particulate matter moving with a speed is heated in a time duration from a suction port for particulate matter to the object, thereby softening or melting at least some of the particulate matter when the particulate matter is applied to the object.

[Solution] A particulate matter is heated by means of induction heating or laser in a time duration from a suction port for particulate matter to an object, so that at least some of the particulate matter is softened or melted at a relatively low temperature on the object in synergy with the collision energy of the particulate matter with the object, thereby enabling the application or film formation of the particulate matter.

Process for electron beam curable inkjet formulations

The present invention provides a method for printing energy-curable ink and coating compositions that have good adhesion to substrates, good print quality, solvent and scratch resistance, and low potential for migration of uncured monomers. The method comprises the steps of printing the ink or coating onto a substrate; partially curing the printed ink or coating by irradiating with UV energy; optionally printing and partially UV curing additional ink layers printed on the first layer; and completing curing via exposure to electron beam radiation, wherein the EB cure dose is greater than or equal to 20 kGy, and the accelerating voltage is greater than or equal to 70 keV.

Systems and methods of electron beam induced processing

Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.

Urea (multi)-(meth)acrylate (multi)-silane compositions and articles including the same

Urea (multi)-(meth)acrylate (multi)-silane precursor compounds, synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds, either neat or in a solvent, and optionally with a catalyst, such as a tin compound, to accelerate the reaction. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-(meth)acrylate (multi)-silane precursor compound synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making the urea (multi)-(meth)acrylate (multi)-silanes and their use in composite films and electronic devices are described.

METHOD FOR MASKLESS PATTERNING OF METAL ALLOYS
20230037586 · 2023-02-09 ·

The disclosure relates to maskless, laser-assisted methods for making a metal surface comprising at least one of hydrophobic and hydrophilic regions; and at least one of micro- and nanostructured regions.

NANOSCALE THIN FILM DEPOSITION SYSTEMS

A method and system for nanoscale precision programmable profiling on substrates. Profiling material is dispensed on a substrate or a superstrate. The superstrate is brought in contact with the substrate. The profiling material is then cured after bringing the superstrate in contact with the substrate. The superstrate is separated from the substrate after curing. An optical metrology of points on the substrate corresponding to the final substrate profile is then performed.

SYSTEMS AND METHODS OF ELECTRON BEAM INDUCED PROCESSING
20230158520 · 2023-05-25 ·

Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.

METHOD OF COATING A SUBSTRATE BY ELECTRON BEAM CURING

Method of coating a substrate comprising the steps of: i) applying to the substrate a radiation curable aqueous composition comprising a dispersed polymeric binder, ii) thermally drying the aqueous coating composition and iii) electron beam curing the coating composition, the method being characterized by the fact that the aqueous coating composition is a physically drying, film-forming aqueous composition and that the curing is performed in air atmosphere.