B08B3/12

CLEANING DEVICE
20180001355 · 2018-01-04 · ·

A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.

POWDER REMOVAL ENCLOSURE FOR ADDITIVELY MANUFACTURED COMPONENTS

Various embodiments of the invention include an apparatus for removing particulates from the surface of a 3D printed workpiece. Various particular embodiments include a material removal apparatus having: an enclosure having a first inlet and a first outlet; a rotatable platform contained within the enclosure for positioning a 3D printed workpiece having particulate on a surface thereof; a pressurized fluid applicator connected to the first inlet and configured to selectively apply a pressurized fluid to the 3D printed workpiece; a vibration source configured to apply an adjustable vibratory frequency to at least one of the rotatable platform or the 3D printed workpiece; and a material reclamation unit connected to the first outlet configured to collect a material removed from the 3D printed workpiece.

POWDER REMOVAL ENCLOSURE FOR ADDITIVELY MANUFACTURED COMPONENTS

Various embodiments of the invention include an apparatus for removing particulates from the surface of a 3D printed workpiece. Various particular embodiments include a material removal apparatus having: an enclosure having a first inlet and a first outlet; a rotatable platform contained within the enclosure for positioning a 3D printed workpiece having particulate on a surface thereof; a pressurized fluid applicator connected to the first inlet and configured to selectively apply a pressurized fluid to the 3D printed workpiece; a vibration source configured to apply an adjustable vibratory frequency to at least one of the rotatable platform or the 3D printed workpiece; and a material reclamation unit connected to the first outlet configured to collect a material removed from the 3D printed workpiece.

METHOD FOR REMOVING FOREIGN MATERIALS FROM THE SURFACE OF AN ARTICLE
20230002575 · 2023-01-05 ·

The present invention relates to a method for removing a foreign material from the surface of an article comprising the following steps: i) providing an article having a surface covered at least partly with a foreign material; ii) contacting the article provided in step i) with a cleaning medium being an acid having a pKa in the range from −10 to 7 having a minimum concentration of 1 wt.-% and with a carrier medium having a density different from the density of the cleaning medium to obtain a mixture comprising the foreign material solved and/or dispersed in the cleaning medium, the carrier medium and the article free from the foreign material; iii) allowing the mixture obtained in step ii) to separate to obtain a heterophasic emulsion comprising at least a first phase comprising the carrier medium and the article free from the foreign material and a second phase comprising the cleaning medium and the foreign material solved and/or dispersed therein; iv) separating the phases obtained in step iii); and v) separating the article free from the foreign material from the carrier medium. Furthermore, the present invention relates to an installation for carrying out the inventive process.

METHOD FOR REMOVING FOREIGN MATERIALS FROM THE SURFACE OF AN ARTICLE
20230002575 · 2023-01-05 ·

The present invention relates to a method for removing a foreign material from the surface of an article comprising the following steps: i) providing an article having a surface covered at least partly with a foreign material; ii) contacting the article provided in step i) with a cleaning medium being an acid having a pKa in the range from −10 to 7 having a minimum concentration of 1 wt.-% and with a carrier medium having a density different from the density of the cleaning medium to obtain a mixture comprising the foreign material solved and/or dispersed in the cleaning medium, the carrier medium and the article free from the foreign material; iii) allowing the mixture obtained in step ii) to separate to obtain a heterophasic emulsion comprising at least a first phase comprising the carrier medium and the article free from the foreign material and a second phase comprising the cleaning medium and the foreign material solved and/or dispersed therein; iv) separating the phases obtained in step iii); and v) separating the article free from the foreign material from the carrier medium. Furthermore, the present invention relates to an installation for carrying out the inventive process.

WORKPIECE CLEANING APPARATUS AND CLEANING METHOD

The present disclosure relates to a workpiece cleaning device and a cleaning method. The workpiece cleaning device comprises: a frame (1); and a plurality of cleaning tanks disposed on the frame (1) side by side, comprising a molten salt cleaning tank (2) for cleaning a workpiece with molten salt, a first rinsing tank (5) for rinsing the workpiece cleaned with the molten salt, a de-rusting cleaning tank (6) for cleaning the workpiece rinsed in the first rinsing tank (5) with a de-rusting agent, a second rinsing tank (7) for rinsing the workpiece cleaned with the de-rusting agent, and an anti-rust cleaning tank (8) for cleaning the workpiece rinsed in the second rinsing tank (7) with anti-rust liquid, which are sequentially disposed from upstream to downstream in terms of procedure.

WORKPIECE CLEANING APPARATUS AND CLEANING METHOD

The present disclosure relates to a workpiece cleaning device and a cleaning method. The workpiece cleaning device comprises: a frame (1); and a plurality of cleaning tanks disposed on the frame (1) side by side, comprising a molten salt cleaning tank (2) for cleaning a workpiece with molten salt, a first rinsing tank (5) for rinsing the workpiece cleaned with the molten salt, a de-rusting cleaning tank (6) for cleaning the workpiece rinsed in the first rinsing tank (5) with a de-rusting agent, a second rinsing tank (7) for rinsing the workpiece cleaned with the de-rusting agent, and an anti-rust cleaning tank (8) for cleaning the workpiece rinsed in the second rinsing tank (7) with anti-rust liquid, which are sequentially disposed from upstream to downstream in terms of procedure.

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
20230234107 · 2023-07-27 · ·

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
20230234107 · 2023-07-27 · ·

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

MODULE FOR CHEMICALLY PROCESSING A SUBSTRATE

The invention relates to a module for chemically processing a substrate, a method for chemically processing a substrate and a use of a module for chemically processing a substrate and in particular a large substrate. The module for chemically processing a substrate comprises: an immersion chamber, a spray unit, and a motion unit (14). The immersion chamber is configured to receive a first liquid and the substrate, so that the substrate is immersed in the liquid. The spray unit comprises a plurality of spray nozzles, which are configured to spray a second liquid within the immersion chamber. The motion unit is configured to provide a relative motion between the substrate and the spray unit.