Patent classifications
B08B7/0085
SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus of an embodiment includes a nozzle plate and a support configured to support a substrate at a predetermined distance from the nozzle plate with a first surface of the substrate facing the nozzle plate. A processing liquid supply unit is configured to supply a processing liquid to a second surface of the substrate that is opposite to the first surface. A first supply unit is configured to supply a first fluid from a first supply port in the nozzle plate. A second supply unit is configured to supply a second fluid from a second supply port closer to a outer edge of the nozzle plate than the first supply port.
Self-cleaning top burner for a stove
A pyrolytic cleaning top burner system for a stove having a normal cooking mode includes a top burner coupled to a stove, a cover for seating on the stove surface, means for heating a top burner, and an exhaust outlet. The cover covers at least the top burner in a cleaning mode. The heating means heats to a cleaning temperature in a cleaning mode that permits baked on food that is positioned under the cover to be disintegrated with heat. The exhaust outlet exhausts air from under the cover. A method for pyrolytically cleaning a top burner of a stove or cooktop is also disclosed.
CLEANING DEVICE
A cleaning device includes a supporting mechanism, a clamping mechanism arranged on the supporting mechanism and used to clamp a spray head, a heating mechanism, an adjusting mechanism, and a cleaning mechanism. The heating mechanism, the adjusting mechanism, and the cleaning mechanism are arranged on the supporting mechanism. The heating mechanism is used to heat the spray head clamped by the clamping mechanism. The cleaning mechanism is used to inject cleaning liquid into the spray head, dredge the spray head, and detect the spray head. The adjusting mechanism is used to rotate and adjust a position of the cleaning mechanism to complete different tasks on the spray head.
System for cleaning metallic scraps from organic compounds
An installation for melting metallic scraps, and particularly adapted for melting aluminium scraps, includes a system for cleaning the metallic scraps, and in particular for cleaning the scraps from organic compounds.
METHOD FOR CLEANING AND/ OR EVALUATING A FOOD PRODUCTS MOULD DRUM AND A COMBINATION OF SUCH A FOOD PRODUCTS MOULD DRUM AND A MOULD DRUM CLEANING AND/ OR EVALUATING DEVICE
A method for cleaning and/or evaluating a food products mould drum and a combination of such a food products mould drum and a mould drum cleaning and/or evaluating device are disclosed. The mould drum cleaning and/or evaluating device includes one or more pressure housings arranged against the outside of and over one or more mould cavities and form, together with the mould drum, an outside chamber. The outside chamber includes a chamber port connectable to a pressure line of a fluid circuit, and the mould drum includes a passage port connectable to a return line of the fluid circuit. Cleaning/evaluating occurs by allowing a pressurized fluid stream to enter via the chamber port into mould cavities and then via a wall part porous structure through a passage, and exit via the passage port to the return line of the fluid circuit.
Method for cleaning and/ or evaluating a food products mould drum and a combination of such a food products mould drum and a mould drum cleaning and/ or evaluating device
A method for cleaning and/or evaluating a food products mould drum and a combination of such a food products mould drum and a mould drum cleaning and/or evaluating device are disclosed. The mould drum cleaning and/or evaluating device includes one or more pressure housings arranged against the outside of and over one or more mould cavities and form, together with the mould drum, an outside chamber. The outside chamber includes a chamber port connectable to a pressure line of a fluid circuit, and the mould drum includes a passage port connectable to a return line of the fluid circuit. Cleaning/evaluating occurs by allowing a pressurized fluid stream to enter via the chamber port into mould cavities and then via a wall part porous structure through a passage, and exit via the passage port to the return line of the fluid circuit.
METHOD AND APPARATUS FOR CLEANING A HEATING ELEMENT OF AEROSOL GENERATING DEVICE
A method of using an aerosol-generating device having a reusable heating element and a battery to provide energy for heating the heating element is provided, the method including steps of: bringing the heating element into proximity to an aerosol-forming substrate; actuating the heating element through a first thermal cycle in which a temperature of the heating element is raised to a first temperature to heat the substrate sufficiently for an aerosol to be formed; removing the heating element from proximity to the substrate; docking the device in a docking station for recharging the battery; and when the device is docked in the docking station, actuating the heating element through a second thermal cycle in which the temperature of the heating element is raised to a second temperature, higher than the first temperature. An aerosol-generating device and an aerosol-generating system are also provided.
Thermally removable fill materials for anti-stiction applications
A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of wash solutions of the type used to clean etch residues from the spaces between the features. In the present method, the spaces are at least partially filled with a displacement solution, such as via spin coating, to substantially displace the wash solution. The displacement solution includes at least one solvent and at least one fill material which is a polyalkene carbonate (PAC) and/or a saccharide. The solvent is then volatized to deposit the fill material in substantially solid form within the spaces. The fill material may be removed by thermal degradation via heat treatment, wherein the need for removal of the fill material by plasma ashing is obviated in order to prevent or mitigate silicon loss.
SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus of an embodiment includes a nozzle plate and a support configured to support a substrate at a predetermined distance from the nozzle plate with a first surface of the substrate facing the nozzle plate. A processing liquid supply unit is configured to supply a processing liquid to a second surface of the substrate that is opposite to the first surface. A first supply unit is configured to supply a first fluid from a first supply port in the nozzle plate. A second supply unit is configured to supply a second fluid from a second supply port closer to a outer edge of the nozzle plate than the first supply port.
SYSTEM FOR CLEANING METALLIC SCRAPS FROM ORGANIC COMPOUNDS
An installation for melting metallic scraps, and particularly adapted for melting aluminium scraps, includes a system for cleaning the metallic scraps, and in particular for cleaning the scraps from organic compounds.