Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.

The invention relates to a method and a system for the processing of an end-of-use pneumatic tyre that is provided with an inner lining (SAL) layer manufactured with a sealing agent intended to seal any punctures and at least partially applied to the surface of an inner cavity (2) of the end-of-use pneumatic tyre; the system (1) comprises an applicator device (6), which is provided with at least one nozzle (13) which dispenses a cryogenic fluid, preferably liquid nitrogen, upon the (SAL) layer of sealing agent in such a way that the (SAL) layer of sealing agent reaches the solid state; a device (14) for the removal of the (SAL) layer of solid sealing agent that is provided with a tool (16) for removing the (SAL) layer of solid sealing agent by means of mechanical abrasion; and a circuit (17) for suctioning the solid sealing agent removed by the tool (16).

Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.

With the components assembled and the ice block formed, the Ice clamping device will allow the user a safe and effective way use the ice block to clean a food grade grilling surface. Thereby cleaning the grilling surface without direct metal on metal contact with that surface there by eliminating the issues and hazards assorted with those cleaning tools i.e. metal from wire bristles or broken material that can be ingested.

A method for removing powder from a component or part produced by a powder bed additive manufacturing system is provided. The method includes providing a part, the part having at least one internal cavity with at least one external opening, the at least one cavity being at least partly filled with powder grains, the powder grains being connected to each other and to the walls of the cavity by mechanical, frictional, electrical, physical, or chemical forces. The method further includes adding medium in liquid phase to the at least one cavity of the part, the liquid having the property that it expands in phase transition from liquid to solid phase; transforming added medium to solid phase to loosen and break up at least a fraction of the powder grains connections from each other; and removing powder from the at least one internal cavity.

A method provides for selecting a scale-dissolving agent suitable for components of the scale. The method for selecting the scale-dissolving agent includes a step of determining coordinates of specific physical properties of scale to be removed based on Hansen solubility parameter and a step of selecting the dissolving agent based on the distance between the coordinates of specific physical properties of scale to be removed and the coordinates of specific physical properties of the dissolving agent. Also provided is a method for removing scale using it.

According to one embodiment, a processing apparatus for processing substrates having different base shapes includes a stage comprising a first portion having a substrate facing surface and an opening extending therethough connected to a source of a cooling fluid, and a second portion located outwardly of the first portion, a substrate support, having a substrate support surface thereon, extending over the second portion, a process fluid outlet overlying the first portion, and a driving unit coupled to one of the stage and the first portion, wherein the driving unit is configured to move at least one of the substrate support surface and the substrate facing surface such that the relative locations of the substrate support surface and the substrate facing surface of the stage are changeable based on the shape of a substrate to be processed in the apparatus.

According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different from the first cleaning method and is subsequent to the first cleaning process. The first cleaning method includes at least one of acidic cleaning or alkaline cleaning. The second cleaning method includes freeze cleaning.

A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

Provided are a method and apparatus for cleaning organic materials accumulated on a mask used in a process of depositing organic materials. The apparatus includes a plasma generating unit, a cleaning chamber connected to the plasma generating unit and accommodating the mask therein, a gas injection port disposed within the cleaning chamber configured to inject the plasma, and a cooling device disposed on a first surface of the mask opposite to an opposite surface of the mask facing the gas injection port.