A particle removal device for a filling machine configured to form, fill, and seal individual packages is provided. The particle removal device comprises an air supply pipe, and a controller being programmed to activate the particle removal device such that a jet of air is directed into a ready-to-fill package passing the particle removal device.

An apparatus for removing labels from reusable containers, which includes supporting elements for at least one reusable container, on the outer lateral surface of which at least one label to be removed is applied; the apparatus includes at least one cutting device, which is provided with at least one blade which is configured to be arranged, with its cutting portion in a position that faces at least one portion of the label, and movement elements for moving the aforesaid portion of the label which are adapted to actively impart, on command, to the portion of the label, a movement away from the outer lateral surface of the container, in order to bring the portion of the label against the cutting portion of the blade.

Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.

A foreign object removal apparatus removes a foreign object attached on a can body by rinsing the can body. The foreign object removal apparatus includes a conveyance line configured to convey the can body, a destaticizing air blower configured to blow a destaticizing air to the conveyed can body, and a rinser configured to rinse the can body after blowing the destaticizing air using the destaticizing air blower.

This invention provides a method and a system for cleaning a container for storing wafers or masks. A contained with lid is washed directly after the container is loaded with lid opened in the cleaning system. Gas exchange rate in the washing station can be increased such that particles or AMC inside the container or attached to the lid can be carried out more easily. Then, contamination-free gas is purged to the container as well as lid in a high temperature environment. A vacuum station can be optionally adapted between the washing station and the contamination-free gas purging station to enhance the cleanliness of the container.

In a carbonated drink filling method, a preform is continuously transferred and introduced into a heating furnace, heated to a temperature for molding the preform into a container, molded into the container in a molding die after the preform exits the heating furnace, conveyed in an upright position during which a coolant (F) is injected to a bottom of the container to cool the bottom. The container is filled with a carbonated drink (a) through a mouth portion of the container, and the mouth portion is then sealed. The coolant is injected in the cooling to the bottom of the container from a nozzle opening on either or both sides of a conveyance line of the container, and the nozzle opening is directed diagonally upward to the bottom of the container in such a manner that an extension of the nozzle opening intersects with the conveyance line of the container.

Contaminant is prevented from migrating from a gripping hand and contaminating a substrate case after cleaning the substrate case. The apparatus cleans, in a state with no substrate, a substrate case C which holds a substrate, provided with a booth 10 which forms a clean space, provided with cleaning tanks 40, 50 which hold and clean the parts of the substrate case C in a separated status in the booth 10, provided with a conveyance mechanism 60 which grips part of the substrate case C by a gripping hand 70 and conveys them to and from the cleaning tanks 40, 50, making the gripping hand 70 stand by at a standby position Q in the booth 10 during cleaning of the substrate case C, and provided with a cleaning means 80 for cleaning the gripping hand 70 during cleaning of the parts. The cleaning means 80 is provided with a spray nozzle 81 which sprays a gas toward the gripping hand 70 and an exhaust fan 82 which exhausts the gas from the inside of the booth 10.

A blend of aliphatic hydrocarbons and polyglycol ether(s) is used in a process for cleaning railroad tank cars that have been gravity drained of hydrocarbon fluids but may be left with a residuum containing heavy hydrocarbons, paraffin and noxious gas. A simple recirculation system is established between the chemical source, the contaminated railcar, canister filters and back to the chemical source. Contaminates are removed from the cleaning chemical by the filters and there is no water or steam used which might otherwise damage the railcar.

The invention provides an apparatus for treating surfaces of a container. The apparatus comprises an openable reaction chamber housing, an exhaust escapement and an electrode assembly. The electrode assembly comprises a probe assembly coupled with a power source, the probe assembly comprising an elongate wand body, and a helically configured primary electrode and a helically configured counter electrode disposed about an outer circumferential surface of the wand body in an alternating helical configuration. The elongate wand body has a fluid passageway defined therewithin, and one or more outlet openings that are formed on an outer circumferential surface of the wand body and that extend inward through said outer circumferential surface and upto the fluid passageway. One or both of the primary electrode and the counter electrode may be energizable by the power source.

Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.