A method may comprise: placing a probe in a molten metal melt comprising a thixotropic metal alloy; injecting a gas into the molten metal melt to form a saturated slurry, the saturated slurry being at a temperature above a liquidus temperature of the thixotropic metal alloy after injecting the gas; removing the probe from the molten metal melt; and depositing the molten metal melt through an extruder of an additive manufacturing system.

A method may comprise: placing a probe in a molten metal melt comprising a thixotropic metal alloy; injecting a gas into the molten metal melt to form a saturated slurry, the saturated slurry being at a temperature above a liquidus temperature of the thixotropic metal alloy after injecting the gas; removing the probe from the molten metal melt; and depositing the molten metal melt through an extruder of an additive manufacturing system.

A method for the manufacturing of an object. The method includes receiving a desired alloy composition for the object, depositing a plurality of foils in a stack to form the object, applying heat to the stack at a first temperature to bond the plurality of foils to each other, and applying heat to the stack at a second temperature to homogenize the composition of the stack. The homogenized stack has the desired alloy composition.

Methods for forming a polycrystalline diamond compact (PDC) drill bit from catalyst-free synthesized polycrystalline diamonds are described. The polycrystalline diamonds are deposited within a mold. In some cases, a matrix body material is deposited within the mold, and an infiltration process is performed to bond the polycrystalline diamonds to the matrix body material to form the PDC drill bit. In some cases, a drill bit body is formed within the mold, and forming the drill bit body within the mold includes depositing a layer of matrix body material particles within the mold, depositing an adhesive ink within the mold, and curing the adhesive ink. In some cases, a sintering process is performed after forming the drill bit body to remove at least a portion of the adhesive ink and increase a density of the drill bit body to form the PDC drill bit.

Methods for forming a polycrystalline diamond compact (PDC) drill bit from catalyst-free synthesized polycrystalline diamonds are described. The polycrystalline diamonds are deposited within a mold. In some cases, a matrix body material is deposited within the mold, and an infiltration process is performed to bond the polycrystalline diamonds to the matrix body material to form the PDC drill bit. In some cases, a drill bit body is formed within the mold, and forming the drill bit body within the mold includes depositing a layer of matrix body material particles within the mold, depositing an adhesive ink within the mold, and curing the adhesive ink. In some cases, a sintering process is performed after forming the drill bit body to remove at least a portion of the adhesive ink and increase a density of the drill bit body to form the PDC drill bit.

A method of manufacturing a gas sensor for detecting xylene is provided. A method of manufacturing a gas sensor includes reacting a mixed material including a first material containing a cobalt (Co) element and a second material containing a chromium (Cr) element to form a CoCr.sub.2O.sub.4 hollow structure having a hollow shape.

A method of manufacturing a gas sensor for detecting xylene is provided. A method of manufacturing a gas sensor includes reacting a mixed material including a first material containing a cobalt (Co) element and a second material containing a chromium (Cr) element to form a CoCr.sub.2O.sub.4 hollow structure having a hollow shape.

A titanium product includes an inner layer portion and a surface layer portion joined to the inner layer portion. The surface layer portion has a composition consisting of, by mass %, O: 0.4% or less, Fe: 0.5% or less, Cl: 0.020% or less, the balance: Ti and impurities. The inner layer portion 3 has pores and a composition consisting of, by mass %, O: 0.4% or less, Fe: 0.5% or less, Cl: more than 0.020% and 0.60%, the balance: Ti and impurities. The area fraction of the pores in the inner layer portion in a cross-section perpendicular to the longitudinal direction of the titanium product is more than 0% and not more than 30%. The Cl content (Cl.sub.I) of the inner layer portion, a thickness (t.sub.S) of the surface layer portion, and a thickness (t.sub.I) of the inner layer portion satisfy the expression [Cl.sub.I≤0.03+0.02×t.sub.S/t.sub.I].

A titanium product includes an inner layer portion and a surface layer portion joined to the inner layer portion. The surface layer portion has a composition consisting of, by mass %, O: 0.4% or less, Fe: 0.5% or less, Cl: 0.020% or less, the balance: Ti and impurities. The inner layer portion 3 has pores and a composition consisting of, by mass %, O: 0.4% or less, Fe: 0.5% or less, Cl: more than 0.020% and 0.60%, the balance: Ti and impurities. The area fraction of the pores in the inner layer portion in a cross-section perpendicular to the longitudinal direction of the titanium product is more than 0% and not more than 30%. The Cl content (Cl.sub.I) of the inner layer portion, a thickness (t.sub.S) of the surface layer portion, and a thickness (t.sub.I) of the inner layer portion satisfy the expression [Cl.sub.I≤0.03+0.02×t.sub.S/t.sub.I].

A titanium aluminide (TiAl) coating capable of improving high-temperature oxidation resistance of titanium alloys and a preparation method thereof are provided. The TiAl coating includes α-AlF.sub.3 nanoparticles, and a content of the α-AlF.sub.3 nanoparticles is 5-30 vol. % of the TiAl coating. The preparation method of the TiAl coating includes: using a TiAl alloy target and an α-AlF.sub.3 target as raw materials, and performing magnetron sputtering on a substrate surface to prepare a coating; the magnetron sputtering is double-target co-sputtering, and a substrate temperature during the magnetron sputtering is 150° C., the TiAl alloy target is performed direct current sputtering with a power of 0.5-2 kW, and the α-AlF.sub.3 target is performed radio frequency sputtering with a power of 0.07-0.2 kW. After the coating is obtained by the double-target co-sputtering, the obtained coating is heat-treated at 600-800° C. for 5-20 h to obtain a final coating.