An adaptive precision chuck for a precision/ultraprecision machining system is described. The chuck (200) defining a mount for receiving a workpiece (300) wherein, when in use, the centre of the mount is configured to be substantially concentric with an axis of rotation (214) of the machining system, the chuck (200) further including jaws (201) about the mount and a plurality of compliant flexures (203-206) configured, upon application of rotational forces by the machining system to the chuck about the axis of rotation (214), to engage the jaws (210) upon a workpiece (300) in the mount.

A mount flange for mounting a cutting blade on a spindle is provided. The cutting blade has a central engaging hole and a peripheral cutting edge. The mount flange includes a cylindrical boss portion having a front portion adapted to be inserted into the engaging hole of the cutting blade and a rear portion whose inner circumferential surface is adapted to be engaged with the spindle, and a flange portion projecting radially outward from the rear portion of the boss portion and having a front surface functioning as a mounting surface adapted to come into abutment against one side surface of the cutting blade. An annular space is formed in the mount flange so as to surround the spindle and open to the inner circumferential surface of the boss portion, thereby suppressing rearward warpage of the outer circumference of the flange portion due to the rotation of the spindle.

A blade holding jig for holding a washer-type cutting blade via an annular retainer flange includes an annular flange holding portion configured to hold a first annular surface of the retainer flange under suction, and an annular non-contact suction portion arranged on an outer peripheral portion of the flange holding portion and configured to produce a negative pressure by ejection of a fluid toward the outer peripheral portion of the retainer flange held by the flange holding portion and to draw up the cutting blade toward the retainer flange. The cutting blade drawn up toward the retainer flange by the non-contact suction portion is held on the retainer flange by a suction force acting from the flange holding portion via a plurality of through holes disposed extending from a second annular surface to the first annular surface of the retainer flange.

A vacuum gripper for semiconductor workpieces is produced from at least one base material by means of an additive manufacturing method such as 3D printing. The method may also include printing various other feature of the vacuum gripper such as reinforcing structures and or seals. The gripper may include a plurality of suction openings and corresponding channels for providing a negative pressure when cooperating with a vacuum.

A chuck includes a chuck surface, a plurality of vacuum ports being distributed over the chuck surface. Each of the vacuum ports is open to a conduit that is connectable to a suction source that is operable to apply suction to that vacuum port. A flow restrictor is located within each conduit and is characterized by a flow resistance. The flow resistance of the flow restrictor in at least one conduit is less than the flow resistance of the flow restrictor in at least one other conduit.

A method for finishing a glass or ceramic article includes applying a force to the glass or ceramic article. The force is applied to the glass or ceramic article at least when the glass or ceramic article is at a temperature that is greater than or equal to a creep temperature of the glass or ceramic article. Holding the force to the glass or ceramic article as the glass or ceramic article is cooled to a temperature that is less than the creep temperature of the glass or ceramic article.

A planarization apparatus comprising a superstrate chuck is provided. The superstrate includes a plurality of inner lands protruding from a surface of the superstrate chuck and a peripheral land protruding from the surface of the superstrate chuck along a periphery of the superstrate chuck and encircling the inner lands therein. The peripheral land has a height smaller than a height of each of the inner lands. The peripheral land has a width sufficiently larger than a width of each of the inner lands such that a pressure leakage through the peripheral land is controlled to be less than a threshold.

A chuck includes a chuck surface, a plurality of vacuum ports being distributed over the chuck surface. Each of the vacuum ports is open to a conduit that is connectable to a suction source that is operable to apply suction to that vacuum port. A flow restrictor is located within each conduit and is characterized by a flow resistance. The flow resistance of the flow restrictor in at least one conduit is less than the flow resistance of the flow restrictor in at least one other conduit.

An expander unit of a cryogenic refrigerator device includes a moving assembly with a porous regenerative heat exchanger configured to move back and forth along a longitudinal axis. A magnetic spring assembly includes a stationary magnetic assembly fixed to the cold finger base that includes one or more magnetic rings fixedly arranged about a bore. A movable magnetic assembly includes one or more movable magnetic rings fixed to the moving assembly. An outer lateral dimension of each of the movable magnetic rings is less than an inner lateral dimension of the bore. The stationary magnetic assembly and the movable magnetic assembly are configured such that, when the moving assembly is displaced along the longitudinal axis from an equilibrium position, attractive and repulsive forces between the movable magnetic assembly and the stationary magnetic assembly yield a restoring force that is directed to restore the moving assembly to the equilibrium position.

A chuck includes a chuck surface, a plurality of vacuum ports being distributed over the chuck surface. Each of the vacuum ports is open to a conduit that is connectable to a suction source that is operable to apply suction to that vacuum port. A flow restrictor is located within each conduit and is characterized by a flow resistance. The flow resistance of the flow restrictor in at least one conduit is less than the flow resistance of the flow restrictor in at least one other conduit.