The quality of an automotive sun shade is frequently determined by the reflective paint used in the manufacturing of the sun shade. This invention discloses a method of polishing reflective metallic paint after its application onto the material of automotive sun shades leading to an improvement in the reflective potential of the surface of the paint. The outcome is a measureable improvement in product performance.

The quality of an automotive sun shade is frequently determined by the reflective paint used in the manufacturing of the sun shade. This invention discloses a method of polishing reflective metallic paint after its application onto the material of automotive sun shades leading to an improvement in the reflective potential of the surface of the paint. The outcome is a measureable improvement in product performance.

In an automatic wet sanding apparatus including a disc and a cushion pad, a disc center hole is formed at a central portion of the disc and a pad center hole is formed at a central portion of the cushion pad. Water having been supplied to an introduction space inside a skirt is stirred as an eccentric head rotates eccentrically and thereby pushed out toward a painted surface via the disc center hole and the pad center hole with enhanced pressure. Thus, sanding dust resulting from automatic wet sanding can be washed away toward an outer circumferential side by the water that is pushed out toward the outer circumferential side, so that the likelihood of clogging due to sanding dust can be reduced and high sanding efficiency can be maintained.

In an automatic wet sanding apparatus including a disc and a cushion pad, a disc center hole is formed at a central portion of the disc and a pad center hole is formed at a central portion of the cushion pad. Water having been supplied to an introduction space inside a skirt is stirred as an eccentric head rotates eccentrically and thereby pushed out toward a painted surface via the disc center hole and the pad center hole with enhanced pressure. Thus, sanding dust resulting from automatic wet sanding can be washed away toward an outer circumferential side by the water that is pushed out toward the outer circumferential side, so that the likelihood of clogging due to sanding dust can be reduced and high sanding efficiency can be maintained.

A polishing assembly and method for polishing optical cables, the polishing assembly having a platform configured to receive a polishing film and configured to rotate according to a dual orbital motion; a force gauge functionally coupled to the platform and configured to measure downward force applied against the platform; a mounting fixture configured to mount a plurality of optical cables; and a movable arm configured to move the mounting fixture downwards to press mounted cables against the polishing film, upwards to pull the mounted cables away from the polishing film, and to rotate circularly along a continuous circular path. The optical cables are pressed against the rotating polishing film while simultaneously monitoring the downward force applied against the platform so that downward force can be maintained within a prescribed tolerance throughout the polishing process.

A polishing assembly and method for polishing optical cables, the polishing assembly having a platform configured to receive a polishing film and configured to rotate according to a dual orbital motion; a force gauge functionally coupled to the platform and configured to measure downward force applied against the platform; a mounting fixture configured to mount a plurality of optical cables; and a movable arm configured to move the mounting fixture downwards to press mounted cables against the polishing film, upwards to pull the mounted cables away from the polishing film, and to rotate circularly along a continuous circular path. The optical cables are pressed against the rotating polishing film while simultaneously monitoring the downward force applied against the platform so that downward force can be maintained within a prescribed tolerance throughout the polishing process.

According to one embodiment of the present disclosure, provided is a substrate cleaning device including: a substrate holder configured to hold a substrate; a substrate cleaning member configured to come into sliding contact with the held substrate, and clean the substrate using a first cleaning liquid supplied from a first nozzle; a self-cleaning member configured to come into sliding contact with the substrate cleaning member at a retreat position separated from the substrate holder, and performs self-cleaning on the substrate cleaning member using a second cleaning liquid supplied from a second nozzle; a measurement module configured to measure a physical property value of a waste liquid of the second cleaning liquid used for the self-cleaning of the substrate cleaning member; and a controller configured to estimate a number of fine particles adhering to the cleaned substrate based on the physical property value of the waste liquid.

According to one embodiment of the present disclosure, provided is a substrate cleaning device including: a substrate holder configured to hold a substrate; a substrate cleaning member configured to come into sliding contact with the held substrate, and clean the substrate using a first cleaning liquid supplied from a first nozzle; a self-cleaning member configured to come into sliding contact with the substrate cleaning member at a retreat position separated from the substrate holder, and performs self-cleaning on the substrate cleaning member using a second cleaning liquid supplied from a second nozzle; a measurement module configured to measure a physical property value of a waste liquid of the second cleaning liquid used for the self-cleaning of the substrate cleaning member; and a controller configured to estimate a number of fine particles adhering to the cleaned substrate based on the physical property value of the waste liquid.

A wheel polishing device is provided and configured to be used with a polishing stand. The device includes a base plate defining a plurality of tracks and a plurality of peg members. Each of the plurality of peg members configured to slidably engage a least one of the plurality of tracks defined by the plate. A peg expanding hub is configured to expand into the plurality of peg members when a nut is tightened on a center screw that passes through the peg expanding hub.

A wheel polishing device is provided and configured to be used with a polishing stand. The device includes a base plate defining a plurality of tracks and a plurality of peg members. Each of the plurality of peg members configured to slidably engage a least one of the plurality of tracks defined by the plate. A peg expanding hub is configured to expand into the plurality of peg members when a nut is tightened on a center screw that passes through the peg expanding hub.