Patent classifications
B25J19/0079
PAINTING ROBOT
An inkjet-type vehicle painting machine capable of keeping temperature elevation of a nozzle head to a certain temperature or less. The painting robot comprises a power supply means for supplying power to drive a piezoelectric substrate of a nozzle head, and a robot arm for moving the nozzle head. The nozzle head is provided in an explosion-proof housing equipped with an explosion-proof construction. A heat dissipation means that dissipates heat generated from the nozzle head within the explosion-proof housing is attached to the nozzle head. A temperature measurement means for measuring the temperature of the heat dissipation means is attached to the heat dissipation means.
Driving apparatus and conveying apparatus
A driving apparatus includes a rotation body in which at least a lower portion is a cylindrical rotated portion, a housing including a top plate portion in which the rotated portion is inserted, a driving mechanism provided in the housing and configured to rotate the rotation body, and an exhaust unit. The top plate portion of the housing comprises a circular opening in which the rotated portion is inserted, and a groove portion provided to surround the opening and communicating with the opening. The groove portion comprises, at at least one point of the groove portion in a circumferential direction, a wide portion whose groove width in a radial direction of the opening is made large. The exhaust unit is provided to communicate with the wide portion and exhausts air in the groove portion.
WAFER HANDLING ROBOT WITH RADIAL GAS CURTAIN AND/OR INTERIOR VOLUME CONTROL
Systems and techniques for reducing or eliminating particulate contamination from wafer handling robots configured for vertical translation are disclosed. In one such technique, a collar may be provided having an aperture through it through which the turret of a wafer handling robot may be extended or retracted. The collar may have one or more radial gas passages. Gas directed at the turret from the radial passage(s) may turn downward when it strikes the turret and may act to prevent or discourage gas from within the base of the wafer handling robot from escaping through the aperture. In another technique, a bellows may be affixed to the bottom of the turret and to the bottom of the base such that the volume of the base occupied by the turret and the bellows remains generally fixed regardless of the degree to which the turret is extended from the base.
Internal pressure adjustment of a robot
An internal pressure adjustment system includes a gas supply line that supplies incombustible gas to a housing space of a robot, and an exhaust line that exhausts gas from the housing space. The internal pressure adjustment system further includes an on-off valve of a gas pressure driven type that switches between opening and closing of the exhaust line in accordance with the gas supply pressure. The exhaust line is opened in response to an increase in the gas supply pressure and the exhaust line is closed in response to a decrease in the gas supply pressure.
APPARATUS, SYSTEM AND METHOD FOR PROVIDING A FLIPPER FOR IN-PROCESS SUBSTRATES
An apparatus, system and method for a substrate flipper capable of accommodating substrates of varying sizes. The apparatus, system and method may include a base housing providing at least a portion of a rotating feature; an arm enclosure rotatably associated with the rotating feature and providing at least one arm actuator, and at least one gripper actuator; two arms at two substantially distal points with respect to one another along the arm enclosure, each of the two arms being communicatively associated with the at least one arm actuator; and a gripper associated with each of the two arms distal from the arm enclosure, communicatively associated with the at least one gripper actuator and capable of gripping one of the substrates upon actuation of the gripper. The actuation of the at least one arm actuator effectuates a change in distance between central longitudinal axes of each of the two arms.
JOINT STRUCTURE FOR ROBOT
Provided is a joint structure for a robot which can prevent leakage of a lubricant which is charged to the interior of the joint structure while improving a drip-proof property. The joint structure for the robot includes: a first arm which is hollow; a second arm which is rotatably mounted to the first arm; a power transmission mechanism which is provided adjacent to the outside of the first arm, the power transmission mechanism including a gear and an inner space which houses the gear and is charged with a lubricant; a booster section which increases a pressure in an interior of the first arm to be higher than an outside pressure; and a one-way communication section which allows the interior of the first arm and the inner space to communicate with each other and a gas in the interior of the first arm to flow into the inner space, while preventing the lubricant in the inner space from flowing out to the interior of the first arm.
DEVICE FOR TRANSFERRING SUBSTRATE, SYSTEM FOR PROCESSING SUBSTRATE, AND METHOD OF PROCESSING SUBSTRATE
There is provided a device for transferring a substrate under air pressure. The device comprises a base part, a transfer arm part configured to transfer a substrate, a telescopic shaft part which is provided between the base part and the transfer arm part, and divided into a plurality of division shaft parts having a tubular shape, an annular channel which is provided in a circumference of a surface of a division shaft parts, and an exhaust channel which is connected to the annular channel so as to exhaust the gas flowing into the annular channel.
PROTECTIVE DRAPE FOR ROBOTIC SYSTEMS
A protective drape for a robotic arm is provided. The protective drape may be used with robotic arm that are required to operate in varied environments that illustratively include industrial applications, a sterile surgical suite for patient care, and a clean room for manufacturing sensitive electronic components. In each of these applications, there is a need to prevent contaminants from infiltrating from the environment to the robot and affecting operation of the robot itself or the robotic system, as well to prevent contaminants from the robot from infecting a patient or contaminating an assembly or process product.
ROBOT SYSTEM
A robot system is provided, which includes a paint booth, and a pretreatment robot configured to perform painting pretreatment on a workpiece that is an object to be painted, the pretreatment robot being an explosion-proof robot disposed in the paint booth and including an end effector used for the painting pretreatment.
Device for transferring substrate, system for processing substrate, and method of processing substrate
There is provided a device for transferring a substrate under air pressure. The device comprises a base part, a transfer arm part configured to transfer a substrate, a telescopic shaft part which is provided between the base part and the transfer arm part, and divided into a plurality of division shaft parts having a tubular shape, an annular channel which is provided in a circumference of a surface of a division shaft parts, and an exhaust channel which is connected to the annular channel so as to exhaust the gas flowing into the annular channel.