To manufacture a transferred object in which a transfer failure is restrained with higher efficiency. Provided is a master including a base material, a pattern layer provided on one surface of the base material, a micro concave-convex structure being formed in the pattern layer, and an absorption layer provided to be sandwiched between the base material and the pattern layer, and having a light absorption coefficient larger than a light absorption coefficient of the pattern layer.

An imprint apparatus that forms a pattern made of an imprint material on each of a plurality of shot regions of a substrate, includes a user interface configured to allow a user to perform editing for assigning each of the plurality of shot regions to any one of a plurality of groups such that each of the plurality of groups is formed by at least one shot region onto which the imprint material is continuously supplied from a dispenser.

Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some exemplary workflows exploit orthogonal chemistries of substrate layers such that the process does not include polishing steps. Substrates prepared by the method described herein can include a first primer set and a second primer set compatible with simultaneous paired-end sequencing methods.

A production method of a mold having a recessed pattern includes: a plate precursor preparation step of preparing a plate precursor having a pedestal on which a protruding pattern is disposed; a resin plate preparation step of preparing a thermoplastic resin plate having a recessed step portion; and a resin plate precursor production step of producing a thermoplastic resin plate precursor. The plate precursor comprises a substrate having a larger area than the pedestal in a plan view on a side opposite to a surface of the pedestal on which the protruding pattern is disposed. An edge portion where a side surface of the pedestal and the substrate are in contact with each other has a through-hole penetrating the substrate along the side surface of the pedestal.

An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a pattern formation area, the imprint apparatus includes a detection unit configured to detect a contact state of the imprint material on the substrate with the mold, a light modulation element configured to control an intensity distribution of irradiation light irradiating the substrate, and a control unit configured to control a timing of irradiating the substrate with the irradiation light having the intensity distribution controlled by the light modulation element based on a detection result of the detection unit.

Implanted medical devices need a mechanism of immobilization to surrounding tissues, which minimizes tissue damage while providing reliable long-term anchoring. This disclosure relates to techniques for patterning arbitrarily shaped 3D objects and to patterned balloon devices having micro- or nano-patterning on an outer surface of an inflatable balloon. The external pattern can provide enhanced friction and anchoring in an aqueous environment. Examples of these types of patterns are hexagonal arrays inspired by tree frogs, corrugated patterns, and microneedle patterns. The patterned balloon devices can be disposed between an implant and surrounding tissues to facilitate anchoring of the implant.

Imprint apparatus brings pattern region of mold into contact with imprint material on shot region of substrate, aligns the shot region and the pattern region with each other, and cures the imprint material. The apparatus includes light irradiator which irradiates the imprint material with light. In state that the imprint material on the shot region and the pattern region are in contact and the pattern region is flat, the light irradiator performs preliminary exposure of irradiating the imprint material with the light to increase viscosity of the imprint material. In the preliminary exposure, the light irradiator irradiates the imprint material with the light under illuminance distribution determined such that illuminance in contact beginning region where the imprint material and the pattern region begin to contact is lower than illuminance in certain region different from the contact beginning region.

A method of imprinting a substrate (180), comprising affixing a flexible stamp (104) carrying an imprinting pattern (106) to a first carrier (102) comprising an array of apertures (112) which, by gas pressure, either pull the flexible stamp towards the first carrier or push it away; pushing it to a second carrier (170) carrying a substrate (180) with a resist layer (182), leaving a gap (190) for creating a controllable contact area between the flexible stamp and the substrate and space (196) between the first carrier and the flexible stamp; progressively pushing areas of the flexible stamp into the resist layer to imprint it; developing the resist layer; and progressively releasing the flexible stamp by applying suction through successive apertures whilst controlling the inward flow of gas to the space (196) through the apertures that are not yet under suction in order to maintain the space (196) there above ambient but below a pre-determined maximum pressure.

Provided is an imprint apparatus which reduces a shift of a mold from a desired position. The imprint apparatus that forms a pattern of an imprint material on a substrate using a mold includes a correction mechanism which corrects a shape and a magnification of the mold, and a control unit which controls the correction mechanism on the basis of a difference in shape and magnification between the mold and the substrate. The control unit changes a shape coefficient multiplied by a correction amount of the shape to balance a resultant force and a moment on the mold applied by the correction mechanism on the basis of a magnification coefficient, which is a coefficient multiplied by a correction amount of the magnification through closed-loop control.