Disclosed herein are hydrogen peroxide solutions in non-aqueous solvents and processes for manufacturing the non-aqueous hydrogen peroxide solutions starting from an aqueous hydrogen peroxide solution. Exemplary non-aqueous solvents include alcohols such as tert-butyl alcohol. It has been discovered that when tert-butyl alcohol and an aqueous hydrogen peroxide solution are combined in certain ratios, and water from this mixture is removed by an azeotropic distillation, tert-butyl alcohol-based hydrogen peroxide solution comprising less than 1 wt % water are readily achieved.

Disclosed herein are hydrogen peroxide solutions in non-aqueous solvents and processes for manufacturing the non-aqueous hydrogen peroxide solutions starting from an aqueous hydrogen peroxide solution. Exemplary non-aqueous solvents include alcohols such as tert-butyl alcohol. It has been discovered that when tert-butyl alcohol and an aqueous hydrogen peroxide solution are combined in certain ratios, and water from this mixture is removed by an azeotropic distillation, tert-butyl alcohol-based hydrogen peroxide solution comprising less than 1 wt % water are readily achieved.

The present disclosure provides for and includes electrocatalytic devices and methods for the production of Dry Hydrogen Peroxide (DHP), a non-hydrated, gaseous form of hydrogen peroxide.

The present disclosure provides for and includes electrocatalytic devices and methods for the production of Dry Hydrogen Peroxide (DHP), a non-hydrated, gaseous form of hydrogen peroxide.

Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

The present disclosure provides for and includes electrocatalytic devices and methods for the production of Dry Hydrogen Peroxide (DHP), a non-hydrated, gaseous form of hydrogen peroxide.

Disclosed is a production device and production method of an electronic grade hydrogen peroxide aqueous solution. An industrial grade hydrogen peroxide is subjected to rectification, reverse osmosis, ion exchange, and finally filtered through an ultrafiltration membrane, and an electronic grade hydrogen peroxide aqueous solution is obtained. Through the above-mentioned integrated design, the disclosure overcomes the problems of small yield and low purity in the prior art, and the method for producing electronic grade hydrogen peroxide has low energy consumption, low cost and high profit, and is suitable for continuous mass production.

Disclosed is a production device and production method of an electronic grade hydrogen peroxide aqueous solution. An industrial grade hydrogen peroxide is subjected to rectification, reverse osmosis, ion exchange, and finally filtered through an ultrafiltration membrane, and an electronic grade hydrogen peroxide aqueous solution is obtained. Through the above-mentioned integrated design, the disclosure overcomes the problems of small yield and low purity in the prior art, and the method for producing electronic grade hydrogen peroxide has low energy consumption, low cost and high profit, and is suitable for continuous mass production.

In some embodiments, a system is disclosed for delivering hydrogen peroxide to a semiconductor processing chamber. The system includes a process canister for holding a H.sub.2O.sub.2/H.sub.2O mixture in a liquid state, an evaporator provided with an evaporator heater, a first feed line for feeding the liquid H.sub.2O.sub.2/H.sub.2O mixture to the evaporator, and a second feed line for feeding the evaporated H.sub.2O.sub.2/H.sub.2O mixture to the processing chamber, the second feed line provided with a second feed line heater. The evaporator heater is configured to heat the evaporator to a temperature lower than 120 C. and the second feed line heater is configured to heat the feed line to a temperature equal to or higher than the temperature of the evaporator.

In some embodiments, a system is disclosed for delivering hydrogen peroxide to a semiconductor processing chamber. The system includes a process canister for holding a H.sub.2O.sub.2/H.sub.2O mixture in a liquid state, an evaporator provided with an evaporator heater, a first feed line for feeding the liquid H.sub.2O.sub.2/H.sub.2O mixture to the evaporator, and a second feed line for feeding the evaporated H.sub.2O.sub.2/H.sub.2O mixture to the processing chamber, the second feed line provided with a second feed line heater. The evaporator heater is configured to heat the evaporator to a temperature lower than 120 C. and the second feed line heater is configured to heat the feed line to a temperature equal to or higher than the temperature of the evaporator.