Patent classifications
C01B2210/0042
A SYSTEM FOR OBTAINING HIGH PURITY NITROGEN IN NITROGEN GAS PURIFICATION APPLICATIONS AND A METHOD THEREOF
Disclosed is a system developed for obtaining high purity (minimum 99.999%) nitrogen gas in nitrogen gas purification applications and drying obtained nitrogen gas before applying it on areas of use, and to an operating method of said system.
HYDROGEN SEPARATION FILTER AND METHOD FOR MANUFACTURING HYDROGEN SEPARATION FILTER
Provided is a hydrogen separation filter allowing a hydrogen purification at a lower temperature than conventional one, and a method for manufacturing the same. A hydrogen separation filter includes a porous substrate, a lattice expansion layer formed on the porous substrate and containing a first material, and a hydrogen dissociation and transmission layer formed on the lattice expansion layer and containing a second material selected from the group consisting of Pd, V, Ta, Ti, Nb, and alloys thereof. The first material and the second material have a same crystalline structure. A lattice constant a.sub.1, bulk of a first bulk material having a same composition and a same crystalline structure as the first material and a lattice constant a.sub.2, bulk of a second bulk material having a same composition and a same crystalline structure as the second material satisfy a formula (1):
PRODUCTION METHOD FOR HIGH-PURITY HYDROGEN CHLORIDE GAS
A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas: 1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation step of bringing the crude hydrochloric acid obtained in the step 1) into contact with an inert gas at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and 3) a high-purity hydrogen chloride gas generation step of supplying the volatile organic impurity-removed hydrochloric acid obtained in the step 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.
PROCESS FOR SEPARATION OF HYDROGEN AND OXYGEN
Embodiments of the invention are directed to methods, processes, and systems for safely and reliably purifying hydrogen from a gas mixture containing hydrogen and oxygen.
HELIUM RECOVERY PROCESS
A process for recovery of helium from one or more than one helium-containing off-gas streams comprises preconditioning off-gas through a multi-stage preconditioning device, cryogenically separating a helium-enriched gas fraction from the preconditioned off-gas received from the preconditioning device a cryogenic separation device, and purifying the helium-enriched gas fraction received from the cryogenic separation device using a purification device so as to obtain purified helium gas with a higher helium content than the helium-enriched gas.
Process for separation of hydrogen and oxygen
Embodiments of the invention are directed to methods, processes, and systems for safely and reliably purifying hydrogen from a gas mixture containing hydrogen and oxygen.
Process for separation of hydrogen and oxygen
Embodiments of the invention are directed to methods, processes, and systems for safely and reliably purifying hydrogen from a gas mixture containing hydrogen and oxygen.
PROCESS FOR SEPARATION OF HYDROGEN AND OXYGEN
Embodiments of the invention are directed to methods, processes, and systems for safely and reliably purifying hydrogen from a gas mixture containing hydrogen and oxygen.
Gas purifier
The invention relates to a gas purifier that removes moisture and oxygen from inert gases and reducing gases, for example, at sub-atmospheric pressures. The purifier can remove part per million levels of moisture in a gas stream to less than 100 parts per trillion by volume, and has a low pressure drop and a sharp breakthrough curve.
PURIFICATION APPARATUS AND PURIFICATION METHOD FOR NON-METAL SEMICONDUCTOR MATERIAL
A purification apparatus and purification method of a non-metallic semiconductor material relate to the field of preparation of high-purity materials, and are especially applicable to preparation of high-purity non-metal materials, in particular to an apparatus and method for purifying a non-metallic semiconductor material by means of a metal melt. The apparatus includes a furnace body, a pressure balance valve, a crucible disposed in the middle of the lower part of the furnace body, a heating and supporting structure for the crucible, a liftable injection mechanism disposed right above the crucible, and a liftable and rotatable recovery mechanism disposed next to the liftable injection mechanism. The method is completed based on the purification apparatus, and includes: injecting the gasified non-metal material into the metal melt under a high pressure environment; reducing the ambient pressure, and collecting the bubbles volatilized from the metal melt to obtain the purified non-metal material. The technical solution proposed in the present invention can be used to effectively remove impurities in the non-metal material, especially remove elements of similar properties. The apparatus is highly integrated and easy to control, and the method is simple.