Patent classifications
C01B32/956
METHOD FOR MANUFACTURING ANODE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERY, ANODE ACTIVE MATERIAL, MANUFACTURED BY SAME METHOD, FOR LITHIUM SECONDARY BATTERY, AND LITHIUM SECONDARY BATTERY COMPRISING ANODE ACTIVE MATERIAL
The present invention is related to a manufacturing method of a negative active material for a lithium secondary battery, a negative active material for a lithium secondary battery manufactured by the method, and a lithium secondary battery including the same. According to one embodiment, it is provided that: a method of manufacturing a negative active material for lithium secondary battery, comprising: coating a negative active material precursor containing Si with crude tar or soft pitch; and annealing an obtained coating product, wherein, the crude tar contains a low molecular weight component that can be removed by a distillation process in an amount of 20 wt % or less.
Method for preparing SiC ingot, method for preparing SiC wafer and the SiC wafer prepared therefrom
A method for preparing a SiC ingot includes: preparing a reactor by disposing a raw material in a crucible body and disposing a SiC seed in a crucible cover, and then wrapping the crucible body with a heat insulating material having a density of 0.14 to 0.28 g/cc; and growing the SiC ingot from the SiC seed by placing the reactor in a reaction chamber and adjusting an inside of the reactor to a crystal growth atmosphere such that the raw material is vapor-transported and deposited to the SiC seed.
Method for preparing SiC ingot, method for preparing SiC wafer and the SiC wafer prepared therefrom
A method for preparing a SiC ingot includes: preparing a reactor by disposing a raw material in a crucible body and disposing a SiC seed in a crucible cover, and then wrapping the crucible body with a heat insulating material having a density of 0.14 to 0.28 g/cc; and growing the SiC ingot from the SiC seed by placing the reactor in a reaction chamber and adjusting an inside of the reactor to a crystal growth atmosphere such that the raw material is vapor-transported and deposited to the SiC seed.
Sinterable powder for making a dense slip casted pressureless sintered SiC based ceramic product
A SiC based sinterable powder mixture comprising, by dried weight of said powder: a) a mineral content comprising—silicon carbide (SiC) particles, —mineral boron compound particles, the powder comprising at least 50% by weight of SiC and the total mineral content of the powder being at least 90% by weight, b) at least a water insoluble carbon-containing source, in particular a carbon containing resin, the powder comprising at least 1% by weight, and preferably less than 10% by weight, of said water insoluble carbon-containing source, wherein the average particle size of said sinterable powder is comprised between 0.5 to 2.0 micrometers.
SiC epitaxial wafer and method for manufacturing same
According to the present invention, there is provided a SiC epitaxial wafer including: a 4H-SiC single crystal substrate which has a surface with an off angle with respect to a c-plane as a main surface and a bevel part on a peripheral part; and a SiC epitaxial layer having a film thickness of 20 μm or more, which is formed on the 4H-SiC single crystal substrate, in which a density of an interface dislocation extending from an outer peripheral edge of the SiC epitaxial layer is 10 lines/cm or less.
SiC epitaxial wafer and method for manufacturing same
According to the present invention, there is provided a SiC epitaxial wafer including: a 4H-SiC single crystal substrate which has a surface with an off angle with respect to a c-plane as a main surface and a bevel part on a peripheral part; and a SiC epitaxial layer having a film thickness of 20 μm or more, which is formed on the 4H-SiC single crystal substrate, in which a density of an interface dislocation extending from an outer peripheral edge of the SiC epitaxial layer is 10 lines/cm or less.
METHOD FOR FABRICATING CERAMIC MATRIX COMPOSITE COMPONENTS
A method for fabricating a component according to an example of the present disclosure includes the steps of depositing a stoichiometric precursor layer onto a preform, and densifying the preform by depositing a matrix material onto the stoichiometric precursor layer. An alternate method and a component are also disclosed.
TWO DIMENSIONAL SILICON CARBIDE MATERIALS AND FABRICATION METHODS THEREOF
Disclosed is a method for synthesizing two-dimensional (2D) silicon carbide and other materials. The method includes the use of hexagonal SiC precursor in a wet exfoliation technique. The method may also include synthesizing two-dimensional (2D) silicon carbide by a chemical vapor deposition method, or a combination of a liquid exfoliation technique and a chemical vapor deposition method.
Silicon carbide single crystal substrate
In a case where a detector is positioned in a [11-20] direction, and where a first measurement region including a center of a main surface is irradiated with an X ray in a direction within ±15° relative to a [−1-120] direction, a ratio of a maximum intensity of a first intensity profile is more than or equal to 1500. In a case where the detector is positioned in a direction parallel to a [−1100] direction, and where the first measurement region is irradiated with an X ray in a direction within ±6° relative to a [1-100] direction, a ratio of a maximum intensity of a second intensity profile is more than or equal to 1500. An absolute value of a difference between maximum value and minimum value of energy at which the first intensity profile indicates a maximum value is less than or equal to 0.06 keV.
SiC composite and method for manufacturing the same
The present invention relates to a SiC composite and a method for manufacturing the same. More particularly, the present invention relates to a slurry composition for ceramic matrix composites which can not only reduce the number of precursor impregnation pyrolysis (PIP) cycles but also be useful in the PIP process to increase hardness, thermal stability, and relative density.