The invention relates to a novel storage material on the basis of nanoporous silicon dioxide particles for the adsorption of chlorine, to the use of said storage material for chlorine recovery and for chlorine liquefaction for the purpose of storing, transport and cleaning.

The invention relates to a novel storage material on the basis of nanoporous silicon dioxide particles for the adsorption of chlorine, to the use of said storage material for chlorine recovery and for chlorine liquefaction for the purpose of storing, transport and cleaning.

A method of safely vaporizing liquid chlorine containing high concentrations of nitrogen trichloride contaminant from a chloralkali plant. In a vertical plug-flow vaporizer having an upward flow direction, a stream of liquid chlorine containing nitrogen trichloride is received. A gas such as air, nitrogen or chlorine gas is introduced into the liquid stream upstream of the boiling zone of the vaporizer to induce a flow regime, for example annular flow or mist flow, that prevents a mass accumulation of nitrogen trichloride in the vaporizer. The liquid chlorine containing nitrogen trichloride is vaporized. The resulting gas stream may be processed to destroy the nitrogen trichloride and recycled to the chlorine production train.

A method of safely vaporizing liquid chlorine containing high concentrations of nitrogen trichloride contaminant from a chloralkali plant. In a vertical plug-flow vaporizer having an upward flow direction, a stream of liquid chlorine containing nitrogen trichloride is received. A gas such as air, nitrogen or chlorine gas is introduced into the liquid stream upstream of the boiling zone of the vaporizer to induce a flow regime, for example annular flow or mist flow, that prevents a mass accumulation of nitrogen trichloride in the vaporizer. The liquid chlorine containing nitrogen trichloride is vaporized. The resulting gas stream may be processed to destroy the nitrogen trichloride and recycled to the chlorine production train.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.

The present invention relates to a process for purifying raw-material gases by fractionation. In particular, the present invention relates to a process for cleansing chlorine gas of bromine.