Patent classifications
C01B7/19
Method for removing fluoride from a zinc-containing solution or suspension, defluoridated zinc sulfate solution and use thereof, and method for producing zinc and hydrogen fluoride or hydrofluoric acid
Embodiments of the invention relate to a process for removing fluoride from a solution or suspension containing zinc, in particular a solution of zinc sulfate, a defluoridated solution of zinc sulfate obtainable by such a process, its use as well as processes for producing zinc and hydrogen fluoride or hydrofluoric acid. The process for removing fluoride comprises (i) providing a solution or suspension A containing zinc, wherein the solution or suspension A containing zinc further contains fluoride ions; (ii) adding a solution B containing a dissolved salt of a rare earth element to the solution or suspension A containing zinc, wherein a solid comprising a rare earth element fluoride and a solution C containing zinc are formed; and (iii) separating the solid from the solution C containing zinc, wherein the solution C containing zinc has a lower concentration of fluoride ions than the solution or suspension A containing zinc.
Preparation Method and Use Method of Material for Deep Purification of HF Electronic Gas
Provided is a preparation method and use method of a material for deep purification of HF electronic gas. A metal fluoride-loaded activated carbon material AC/MFx.nH20 is prepared, and a mixed gas flow of carbonyl fluoride and high-purity nitrogen is used to deeply dehydrate the material to obtain the material for deep purification of HF electronic gas AC/MFx. This kind of material has fluoride that can form crystal water to form hydrated metal fluoride, and has strong water absorption properties. Moreover, the anhydrous fluoride and activated carbon do not have to face the problem of being corroded by HF, and the collapse of framework structure and the secondary pollution to HF from reaction products would not be caused. The material has the advantages of high purity and extremely low moisture content when being used for efficiently removing moisture in HF.
Universal Chemical Processor
A universal chemical processor (UCP) including a reactor vessel with a main chamber, comprises inlets for feedstock, a fluidizing medium and reactants. The UCP further includes a reactive X-ray chemical processor (RXCP) having a large area hollow cylindrical cold cathode in the main chamber, a grid positioned concentrically with respect to the cathode, and an anode positioned concentrically with respect to the cathode and grid. In operation, when activated, the cathode of the RXCP emits electrodes onto the anode, which then emits X-rays into a radiation zone within the main chamber capable of ionizing feedstock and reactants, inducing chemical reactions, and sterilizing and decomposing organic materials within the radiation zone, and wherein, a fluidized bed is supported in the main chamber when the fluidizing medium and feedstock are supplied. The RXCP and the fluidized bed portions can be operated separately or in conjunction to achieve unanticipated results.
Universal chemical processor
A universal chemical processor (UCP) including a reactor vessel with a main chamber, comprises inlets for feedstock, a fluidizing medium and reactants. The UCP further includes a reactive X-ray chemical processor (RXCP) having a large area hollow cylindrical cold cathode in the main chamber, a grid positioned concentrically with respect to the cathode, and an anode positioned concentrically with respect to the cathode and grid. In operation, when activated, the cathode of the RXCP emits electrodes onto the anode, which then emits X-rays into a radiation zone within the main chamber capable of ionizing feedstock and reactants, inducing chemical reactions, and sterilizing and decomposing organic materials within the radiation zone, and wherein, a fluidized bed is supported in the main chamber when the fluidizing medium and feedstock are supplied. The RXCP and the fluidized bed portions can be operated separately or in conjunction to achieve unanticipated results.
METHOD FOR PREPARING ELECTRONIC GRADE INORGANIC ACIDS FROM WASTE ACID SOLUTION
A method for preparing electronic grade inorganic acids includes: introducing alkali metal salts into a waste acid solution containing hydrofluoric acid, nitric acid and water to obtain hydrogen fluoride vapor, and a distillation residue mixture containing nitric acid, water and the alkali metal salts; subjecting the first distillation residue mixture to evaporation treatment, and then introducing an alkali earth metal nitrate salt into the resultant nitric acid/water mixture followed by distillation treatment so as to obtain nitric acid vapor; and removing mist droplets in the hydrogen fluoride and nitric acid vapor, followed by condensation treatment and concentration adjustment so as to obtain electronic grade hydrofluoric acid and nitric acid.
Process for reducing the concentration of arsenic in an aqueous solution comprising a fluoroacid
A process for reducing the concentration of one or more arsenic-containing compounds in an aqueous solution comprising at least one fluoroacid, which process comprises: (i) contacting the aqueous solution with an oxidising agent to produce one or more Asv-containing compounds; and (ii) removal of precipitated arsenic-containing compounds; wherein the process comprises a step (iii) the addition of an aqueous alkali solution or slurry, which may take place after step (i) and before step (ii) or after step (ii).
Reverse osmosis for purifying mixtures of hydrofluoric acid and nitric acid
Disclosed is a method of purifying a solution containing hydrofluoric acid, nitric acid and at least one silicon impurity by treating the solution with at least one reverse osmosis membrane. According to the method of the present invention, silicon impurities contained in the solution containing hydrofluoric acid and nitric acid can be selectively removed or reduced. This method can be advantageously used in the photovoltaic industry or in the battery component industry.
AZEOTROPIC COMPOSITIONS OF HYDROGEN FLUORIDE AND Z-3,3,3-TRIFLUORO-1-CHLOROPROPENE
An azeotropic or quasi-azeotropic composition including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more (hydro)halocarbon compounds including 1 to 3 carbon atoms. The (hydro) halocarbon compounds are preferably selected among tetrachlorofluoropropanes, trichlorodifluoropropanes, dichlorotrifluoropropanes, chlorotetrafluoropropanes, pentafluoropropanes, dichlorodifluoropropenes, chlorotrifluoropropenes and tetrafluoropropenes. A process for producing a main (hydro)halocarbon compound, including the formation of a mixture of compounds including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more other (hydro)halocarbon compounds, distillation of this mixture making it possible to collect, firstly, an azeotropic composition, and, secondly, at least one of the compounds of the mixture.
Method of recycling hydrochloric and hydrofluoric acid effluent
A method of recycling mixtures of hydrochloric and hydrofluoric acid. In particular, a method of recycling hydrofluoric acid and boron fluoride mixtures. A process for upgrading mixtures of fluoroboron compounds contaminated with chlorides as an aqueous solution of boron fluoride hydrates, including a step of vacuum distillation. Also, a method of producing gaseous boron trifluoride.
Method of recycling hydrochloric and hydrofluoric acid effluent
A method of recycling mixtures of hydrochloric and hydrofluoric acid. In particular, a method of recycling hydrofluoric acid and boron fluoride mixtures. A process for upgrading mixtures of fluoroboron compounds contaminated with chlorides as an aqueous solution of boron fluoride hydrates, including a step of vacuum distillation. Also, a method of producing gaseous boron trifluoride.