A substrate processing gas of the present invention contains IF.sub.5; and IF.sub.7, in which a content of the IF.sub.5 is equal to or more than 1 ppm and equal to or less than 2% on a volume basis with respect to a total amount of the IF.sub.5 and the IF.sub.7.

A substrate processing gas of the present invention contains IF.sub.5; and IF.sub.7, in which a content of the IF.sub.5 is equal to or more than 1 ppm and equal to or less than 2% on a volume basis with respect to a total amount of the IF.sub.5 and the IF.sub.7.

A method for measuring the concentration of fluorine gas (F.sub.2) contained in a halogen fluoride-containing gas using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer, the method including, before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.

There is provided a method for producing high-purity bromine pentafluoride while leaving a less amount of an unreacted fluorine gas. The method for producing bromine pentafluoride includes a reaction step of feeding a bromine-containing compound, which is at least one of a bromine gas and bromine trifluoride, and a fluorine gas to a reactor to give a (fluorine atom):(bromine atom) molar ratio, that is, F/Br of 3.0 or more and 4.7 or less and reacting the bromine-containing compound and the fluorine gas to each other to obtain a reaction mixture containing bromine pentafluoride and bromine trifluoride; and a separation step of separating bromine pentafluoride and bromine trifluoride in the reaction mixture from each other.

There is provided a method for producing high-purity bromine pentafluoride while leaving a less amount of an unreacted fluorine gas. The method for producing bromine pentafluoride includes a reaction step of feeding a bromine-containing compound, which is at least one of a bromine gas and bromine trifluoride, and a fluorine gas to a reactor to give a (fluorine atom):(bromine atom) molar ratio, that is, F/Br of 3.0 or more and 4.7 or less and reacting the bromine-containing compound and the fluorine gas to each other to obtain a reaction mixture containing bromine pentafluoride and bromine trifluoride; and a separation step of separating bromine pentafluoride and bromine trifluoride in the reaction mixture from each other.

An object of the present invention is to provide a method for producing a fluorinated organic compound with a high yield without using carbon tetrachloride in view of the fact that the production of a fluorinated organic compound with a sufficient yield was impossible for a hitherto-known method that uses a fluorinating agent that contains IF.sub.5-pyridine-HF alone. Another object of the present invention is to provide a fluorinating reagent that is capable of achieving this object. The present invention provides a composition comprising (1) IF.sub.5 and (2) an aprotic solvent (with the proviso that carbon tetrachloride is excluded), wherein the aprotic solvent is contained in an amount within a range of 50 mass ppm to 20 mass %.

An object of the present invention is to provide a method for producing a fluorinated organic compound with a high yield without using carbon tetrachloride in view of the fact that the production of a fluorinated organic compound with a sufficient yield was impossible for a hitherto-known method that uses a fluorinating agent that contains IF.sub.5-pyridine-HF alone. Another object of the present invention is to provide a fluorinating reagent that is capable of achieving this object. The present invention provides a composition comprising (1) IF.sub.5 and (2) an aprotic solvent (with the proviso that carbon tetrachloride is excluded), wherein the aprotic solvent is contained in an amount within a range of 50 mass ppm to 20 mass %.

Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF.sub.3, IF.sub.5, IF.sub.7, BrF.sub.3, BrF.sub.5, NF.sub.3, WF.sub.6, SiF.sub.4, CF.sub.4, SF.sub.6 and BF.sub.3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

Disclosed is a purification method for removing a metal component from a fluorine compound gas containing hydrogen fluoride and a metal component. This method includes a removing step for removing the hydrogen fluoride and the metal component therefrom by bringing the fluorine compound gas into contact with a solid metal fluoride to adsorb the hydrogen fluoride and the metal component on the metal fluoride. It is preferable for the fluorine compound gas to contain at least one kind selected from the group consisting of CIF, CIF.sub.3, IF.sub.5, IF.sub.7, BrF.sub.3, BrF.sub.5, NF.sub.3, WF.sub.6, SiF.sub.4, CF.sub.4, SF.sub.6 and BF.sub.3. It is also preferable for the metal fluoride to be an alkali metal fluoride or an alkali earth metal fluoride. Surprisingly, the presence of hydrogen fluoride in a fluorine compound gas makes it possible to remove a metal component therefrom as an impurity as a result of adsorption thereof by a metal fluoride.

A substrate processing gas of the present invention contains IF.sub.5; and IF.sub.7, in which a content of the IF.sub.5 is equal to or more than 1 ppm and equal to or less than 2% on a volume basis with respect to a total amount of the IF.sub.5 and the IF.sub.7.