A composition for treating swimming pool water comprises sodium bisulphate and aluminium sulphate. The aluminium sulphate in the composition minimizes the precipitation of sodium bisulphate at temperatures lower than about 5 degrees Celsius for a time period to maintain a concentrated form of acid to control the pH level of the water. In some embodiments, the composition includes 30 to 40% sodium bisulphate (NaHSO4) wt/wt %, 0.2% to 5% aluminium sulphate Al2(SO4)3 wt/wt %, 0.1% to 1% copper sulphate/chelating agent wt/wt %, 0.01% to 0.02% sodium hydroxide, and balance water.

A ballast water treatment apparatus and a ballast water treatment system having a ballast water treatment apparatus are provided. The ballast water treatment apparatus includes a ballast water transport line configured to transport ballast water between a first location and a second location, the transported ballast water being passed through at least one injector, and a plasma generation device configured to be fed with a feed gas optionally comprising oxygen, and configured to generate a feed gas plasma by a streamer type discharge in a discharge area to provide a treated gas at a treated-gas outlet. The injector includes a liquid passage having an area constructed such as to increase a velocity of the passed-through water in a region of increased velocity, and an injector gas inlet provided in the region of increased velocity. The treated-gas outlet is in gaseous connection with the injector gas inlet.

Various embodiments of the present invention relate to, among other things, a nano carrier platform for generating enhanced engineered water nanostructures (iEWNS) encapsulating and delivering reactive oxygen species (ROS) and, in some instances, other active ingredients, methods for inactivating at least one of viruses, bacteria, bacterial spores, and fungi on a substrate by applying iEWNS to the substrate.

A membrane separation pretreatment apparatus including a membrane separation unit and a first underwater plasma discharge unit disposed in front of the membrane separation unit is provided. The membrane separation pretreatment apparatus includes a membrane separation unit configured to remove particulate matter contained in raw water, and a first underwater plasma discharge unit disposed in front of the membrane separation unit and configured to cause a portion of the raw water to be introduced into the membrane separation unit to perform underwater plasma discharging.

The device provided relates to the field of water purification and disinfection. The device for water purification works by exposing water to an hydroxyl radicals and includes a corona discharge reactor, an ejector, at least one solenoid valve, control electronics, a mixing chamber. Inside the reactor there is a group of pin discharge electrodes, an earthen solid electrode, a chamber of saturated vapors of treated water, and the reactor is interfaced to the ejector. The device allows to obtain at the output of the device water with a high degree of purification, as from biological pollution, as well as to get rid of many undesirable chemical compounds present in the source water by their oxidation to safe products.

There are provided processes for treating a residual. For example, such processes can comprise treating a mixture comprising the residual, a peracid or source thereof and an ammonium salt in a reactor, with an electric field, by means of at least one anode and at least one cathode that define therebetween an electrokinetic zone for treating the mixture. Such processes allow for inactivation of at least one type of pathogen in the residual so as to obtain a treated residual.

To provide a sterilizing liquid and a method of producing the same that have no restrictions on application methods and usage and can be widely used for sterilization, a sterilizing liquid including water containing reactive oxygen species and a nanoparticle catalyst in a stationary state is produced by causing cavitation in water having a conductivity of 2000 μS/cm or less and COD of 2000 ppm or less while causing the water to flow by a stirrer 2, and causing generation of plasma by a plasma generation mechanism 3 in which a pulse voltage is applied across electrodes 31 in the water including air bubbles mainly containing water vapor generated by the cavitation.

A water treatment device comprising a clear container with lid surrounded by a solar reflector, and an insert in the form of a thin sheet or mesh permanently coated with titanium dioxide as a water sanitizing catalyst. The container is filled with non-potable water, covered with the lid, and placed in direct sunlight. Direct and reflected sunlight enters the water through the clear container and lid, where the sunlight's UV radiation and increased solar thermal heat disinfect the water. Further, the catalyst on the insert reacts with dissolved oxygen in the water to produce reactive oxygen species. These reactive species react with and decompose organic compounds in the water, and kill or inactivate pathogens. In addition, the reactive oxygen species further react with the water itself to produce additional free radical species, which also react with and decompose organic compounds and kill or inactivate pathogens.

The present invention discloses a solvent assisted cavitation process for the removal of pollutants from waste water comprising treating waste water in a batch or continuous process in a cavitation device fed with 1-10% of an immiscible solvent resulting in a reduction in concentration of ammoniacal nitrogen and/or COD in the waste water.

A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.