A method and an apparatus for producing a porous glass preform by using organosiloxane raw material is provided. The apparatus for producing the porous glass preform 12 according to the present embodiment is configured to mix organosiloxane in a liquid state being a raw material with a carrier gas in a vaporizer 6, heat this mixture to be vaporized, supply this vapor to a burner 13 as a gas raw material, and produce a porous glass preform by depositing a glass fine particle produced by combusting the gas raw material on a starting material, herein the apparatus for producing a porous glass preform includes a moisture removing apparatus 8 configured to remove moisture in the carrier gas and supply the vaporizer with the carrier gas.

A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

A method of manufacturing synthetic quartz glass through an outside vapor deposition (OVD) process with improved deposition efficiency. When a hollow cylindrical synthetic quartz glass product is manufactured through an OVD method or the like, it is environmentally friendly in view of using a smaller amount of chlorine and is economical in view of requiring no separate treatment equipment, as compared to a conventional technique using silicon chloride (SiCl.sub.4). Also, the method, in which octamethylcyclotetrasiloxane is supplied to a deposition burner while being sprayed in the form of a droplet along with a high-pressure carrier gas and vaporized by the deposition burner, can effectively address the high-temperature heating and slow decomposition involved when octamethylcyclotetrasiloxane ([(CH.sub.3).sub.2SiO].sub.4) is used as a source for depositing silicon dioxide particles.

Vaporizers and systems for vaporizing liquid precursor for forming glass optical fiber preforms are provided. The vaporizer includes an expansion chamber at least partially enclosed by a side wall, the expansion chamber comprising an upper end and a lower end with the side wall disposed between the upper end and the lower end. The vaporizer further includes a closed-loop liquid delivery conduit positioned in the expansion chamber proximate to the upper end of the expansion chamber, wherein the closed-loop liquid delivery conduit comprises a plurality of nozzles oriented to direct a spray of liquid precursor onto an inner surface of the side wall. Further, the vaporizer includes at least one supply conduit positioned proximate the upper end of the expansion chamber and coupled to the closed-loop liquid delivery conduit, and a vapor delivery outlet coupled to the expansion chamber and configured to direct vaporized liquid precursor from the expansion chamber.

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO.sub.2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO.sub.2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO.sub.2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m.sup.2/g. A device for carrying out the method is also provided.

A method and an apparatus for producing a porous glass preform by using organosiloxane raw material is provided. The apparatus for producing the porous glass preform 12 according to the present embodiment is configured to mix organosiloxane in a liquid state being a raw material with a carrier gas in a vaporizer 6, heat this mixture to be vaporized, supply this vapor to a burner 13 as a gas raw material, and produce a porous glass preform by depositing a glass fine particle produced by combusting the gas raw material on a starting material, herein the apparatus for producing a porous glass preform includes a moisture removing apparatus 8 configured to remove moisture in the carrier gas and supply the vaporizer with the carrier gas.

The porous glass base material manufacturing apparatus releases gas of organic siloxane raw materials into the flame of a group of burners that moves relative to a starting base material along the longitudinal direction of the starting base material rotating around a rotation axis along the longitudinal direction to form soot of porous glass particles on the surface of the starting base material. The porous glass base material manufacturing apparatus is equipped with a vaporizer that vaporizes liquid raw materials containing organic siloxane in a liquid state supplied from a raw material tank to make a raw material mixed gas mixed with raw material gas and carrier gas and a raw material gas pipe that supplies the raw material mixed gas to the burner. The raw material gas pipe is insulated and kept warm by double insulation.

A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO.sub.2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO.sub.2 feedstock material to produce a gaseous SiO.sub.2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO.sub.2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO.sub.2 soot body; (F) vitrifying the titanium-doped SiO.sub.2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight. The liquid SiO.sub.2 feedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiO.sub.2 feedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiO.sub.2 feedstock vapor.

One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

A method of producing soot, including: combusting a first fuel stream and a first oxidizer at a burner face; combusting a second fuel stream and a second oxidizer at the burner face, wherein the second fuel stream and the second oxidizer are premixed in advance of the burner face and a second equivalence ratio of the second fuel stream and the second oxidizer is less than about 1; and combusting a silicon-containing fuel into a plurality of soot particles, wherein the second fuel stream and the second oxidizer are combusted between the first fuel stream and the silicon-containing fuel. Applying this method of producing soot to deposit a preform suitable for the manufacture of optical fibers.