Patent classifications
C03C2201/02
Transparent beta-quartz glass ceramics
A transparent β-quartz glass ceramic is provided. The glass ceramic includes a primary crystal phase including a β-quartz solid solution, a secondary crystal phase including tetragonal ZrO.sub.2, and a lithium aluminosilicate amorphous phase. The glass ceramic may be ion exchanged utilizing molten nitrate salt baths. Methods for producing the glass ceramic are also provided.
Preparation of a quartz glass body in a multi-chamber oven
One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.
Fused quartz container having low levels of surface defects
A quartz glass container is shown and described herein. The quartz glass container exhibits a low concentration of surface defects on an inner surface of the container. In aspects hereof, the container may have a surface defect density of 50 or fewer surface defects per square centimeter within a 1 cm band centered 1 cm from the base of the container.
QUARTZ CONTAINER MANUFACTURING METHOD AND FORMING APPARATUS
A quartz container manufacturing method and a forming apparatus, relating to the solar photovoltaic technical field, and providing a mold comprising a top cylinder and a mold bottom; during formation of a container blank, when the mold forms a first included angle with a horizontal plane and the mold is rotated at a first rotation speed, the source material forms a first blank on the inner wall of the top cylinder; when the mold forms a second included angle with the horizontal plane and the mold is rotated at a second rotation speed, the source material forms a second blank on the inner wall of the mold bottom; a quartz container is manufactured from a container blank composed of the first blank and the second blank.
SILICA GLASS, HIGH FREQUENCY DEVICE USING SILICA GLASS, AND SILICA GLASS PRODUCTION METHOD
The present invention relates to a silica glass including bublles in the number of 1×10.sup.7/cm.sup.3 to 1×10.sup.15/cm.sup.3 and having a density of 0.5 g/cm.sup.3 to 1.95 g/cm.sup.3. The present invention also relates to a method for producing a silica glass, including: a step of depositing SiO.sub.2 fine particles generated by flame hydrolysis of a silicon compound, to obtain a silica glass porous body; a step of heating and sintering the silica glass porous body in an inert gas atmosphere, to obtain a silica glass dense body; and a step of performing a foaming treatment to heat the silica glass dense body under a reduced pressure condition.
Silica glass crucible
A silica glass crucible includes a cylindrical side wall portion, a curved bottom portion, and a corner portion that is provided between the side wall portion and the bottom portion and has a higher curvature than a curvature of the bottom portion, in which a first region provided from a crucible inner surface to a middle in a thickness direction, a second region that is provided outside the first region in the thickness direction and has a different strain distribution from the first region, and a third region that is provided outside the second region in the thickness direction and up to the crucible outer surface and has a different strain distribution from the second region, are provided, and internal residual stresses of the first region and the third region are compressive stresses, whereas an internal residual stress of the second region includes a tensile stress.
Preparation of quartz glass bodies from silicon dioxide granulate
One aspect relates to a process for the preparation of a quartz glass body including, providing a silicon dioxide granulate obtainable from a silicon dioxide powder, wherein the silicon dioxide granulate has a larger particle size than the silicon dioxide powder, making a 5 glass melt out of silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The melting crucible has at least one inlet and at least one outlet. A least part of the glass melt is removed via the melting crucible outlet. One aspect further relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing 10 of the quartz glass body.
METHOD FOR REMOVING DISTURBING METALS FROM GLASS
A method for producing glass by removing coloring ions through reduction is described, as are products obtained by this method.
QUARTZ GLASS WITH LOW CONTENT OF HYDROXYL AND HIGH PURITY AND METHOD FOR PREPARING THE SAME
A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.
Low dielectric loss glasses for electronic devices
An article including a glass having that includes SiO.sub.2, Al.sub.2O.sub.3, and B.sub.2O.sub.3 and least one of Li.sub.2O, Na.sub.2O, K.sub.2O, MgO, CaO, SrO, BaO, SnO.sub.2, ZnO, La.sub.2O.sub.3, F, and Fe.sub.2O.sub.3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.