A glass sheet includes a first main surface and a second main surface opposite to the first main surface in a thickness direction. X represented by the following formula (1) is −0.29<X<0.29: A×Δ.sup.1H/.sup.30Si+B×ΔNa.sub.2O+C×ΔSn+D×ΔF=X (1). F.sub.0-3 determined according to the following formula (II) is 0.02 or more: F.sub.0-3=[average fluorine concentration (wt %) by SIMS at depth of 0 to 3 μm in first main surface]×3 (II).

A method of forming an optical fiber, including: exposing a soot core preform to a dopant gas at a pressure of from 1.5 atm to 40 atm, the soot core preform comprising silica, the dopant gas comprising a first halogen doping precursor and a second halogen doping precursor, the first halogen doping precursor doping the soot core preform with a first halogen dopant and the second halogen precursor doping the soot core preform with a second halogen dopant; and sintering the soot core preform to form a halogen-doped closed-pore body, the halogen-doped closed-pore body having a combined concentration of the first halogen dopant and the second halogen dopant of at least 2.0 wt %.

A silica glass for a radio-frequency device has an OH group concentration being less than or equal to 300 wtppm; an FQ value being higher than or equal to 90,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.

A method of forming an optical fiber, including: exposing a soot core preform to a dopant gas at a pressure of from 1.5 atm to 40 atm, the soot core preform comprising silica, the dopant gas comprising a first halogen doping precursor and a second halogen doping precursor, the first halogen doping precursor doping the soot core preform with a first halogen dopant and the second halogen precursor doping the soot core preform with a second halogen dopant; and sintering the soot core preform to form a halogen-doped closed-pore body, the halogen-doped closed-pore body having a combined concentration of the first halogen dopant and the second halogen dopant of at least 2.0 wt %.

A silica glass for a radio-frequency device has an OH group concentration being less than or equal to 300 wtppm; an FQ value being higher than or equal to 90,000 GHz at a frequency of higher than or equal to 25 GHz and lower than or equal to 30 GHz; and a slope being greater than or equal to 1,000 in a case where the FQ value is approximated as a linear function of the frequency in a frequency band of higher than or equal to 20 GHz and lower than or equal to 100 GHz.

The core region of an optical fiber is doped with chlorine in a concentration that allows for the viscosity of the core region to be lowered, approaching the viscosity of the surrounding cladding. An annular interface region is disposed between the core and cladding and contains a concentration of fluorine dopant sufficient to match the viscosity of the core. By including this annular stress accommodation region, the cladding layer can be formed to include the relatively high concentration of fluorine required to provide the desired degree of optical signal confinement (i.e., forming a low loss optical fiber). The inclusion of the annular stress accommodation region allows for the formation of a large effective area optical fiber that exhibits low loss (i.e., <0.19 dB/km) in both the C-band and L-band transmission ranges.

One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

The core region of an optical fiber is doped with chlorine in a concentration that allows for the viscosity of the core region to be lowered, approaching the viscosity of the surrounding cladding. An annular interface region is disposed between the core and cladding and contains a concentration of fluorine dopant sufficient to match the viscosity of the core. By including this annular stress accommodation region, the cladding layer can be formed to include the relatively high concentration of fluorine required to provide the desired degree of optical signal confinement (i.e., forming a low loss optical fiber).

The Ti.sup.3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti.sup.3+ ions in favor of Ti.sup.4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO.sub.2SiO.sub.2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti.sup.3+/Ti.sup.4+510.sup.4.