A treatment system and process includes a ribbon beam ion source that is configured to implant ions into a product to modify a portion of the product; multiple means of controlling the temperature of the product; the means including radiative conduction, gas conduction to a heatsink by means of a gas cushion, adjustment of the ion beam density at the product, adjustment of the ion beam intensity at the product and ion beam acceleration parameters, and adjustment of the ion dose to the product b; and a product movement system configured to move the product through the treatment system past the ribbon beam ion source. The treatment system further includes a system controller configured to control at least one the following: the gas cushion system, the ribbon beam ion source, the temperature control system, the heatsink, and the product movement system.

Provided is an inorganic composition having excellent mechanical strength and the like.

Disclosed is an inorganic composition and the like, wherein the flexural strength of the inorganic composition is 300 MPa or greater, and the fluorescence intensity based on JIS K 0120, is 3,000 RFU or less.

A method for structuring an anti-counterfeit marking (18) in the thickness of an object (1) made from an at least partially transparent amorphous, semi-crystalline or crystalline material, the at least partially transparent object (1) comprising a top surface (2) and a bottom surface (4) which extends at a distance from the top surface (2).

Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.

Methods for manufacturing a carbon-containing glass material are disclosed. The method includes flowing a hydrocarbon gas and silane into a reactor, and providing an additive to the reactor. The method includes generating a non-thermal equilibrium plasma based on excitement of the hydrocarbon gas and the silane by a microwave energy, where the non-thermal equilibrium plasma includes a plurality of methyl radicals. The method includes ion-bombarding the glass material with at least the methyl radicals to create an interphase region. The method includes forming a plurality of FLG nanoplatelets within the interphase region based on recombination or self-nucleation of the methyl radicals. The FLG nanoplatelets may be dispersed throughout the interphase region in a non-periodic orientation that at least partially inhibits formation of cracks in the glass material. The method includes doping surfaces of the FLG nanoplatelets with the additive, and intercalating the additive between adjacent graphene layers within the FLG nanoplatelets formed in the glass material.

The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 10.sup.14 ions/cm.sup.2 and 2.5×10.sup.17 ions/cm.sup.2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.

Mechanical properties of a cover glass for a touch screen are improved by ion implanting the front surface. The implant process uses non-mass analyzed ions that physically embed in voids between inter-connected molecules of the glass. The embedded ions create compression stress on the molecular structure, thus enhancing the mechanical properties of the glass to avoid scratches. Also, implanting ions containing fluoride enhances the hydrophobic and oleophobis properties of the glass to prevent finger prints.

Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. In one or more embodiments, the interface exhibits an effective adhesion energy of about less than about 4 J/m.sup.2. In some embodiments, the interface is modified by the inclusion of a crack mitigating layer containing an inorganic material between the glass substrate and the film.

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.