C04B41/0027

Method for doping using electric field

A doping method using an electric field includes stacking a sacrificial layer on a doped layer, disposing a doping material on the sacrificial layer, disposing electrodes on the doping material and the doped layer, respectively, and doping the doping material into the doped layer through oxidation, diffusion, and reduction of the doping material by the electric field.

Ultra-high dielectric constant garnet

Disclosed are embodiments of synthetic garnet materials for use in radiofrequency applications. In some embodiments, increased amounts of bismuth can be added into specific sites in the crystal structure of the synthetic garnet in order to boost certain properties, such as the dielectric constant and magnetization. Accordingly, embodiments of the disclosed materials can be used in high frequency applications, such as in base station antennas.

PART MADE OF SILICON-BASED CERAMIC OR CMC AND METHOD FOR PRODUCING SUCH A PART

The invention relates to a part made of silicon-based ceramic material or silicon-based ceramic matrix composite (CMC) material comprising an environmental barrier coating (EBC), said coating (12, 13) comprising a bonding layer (12) deposited on the surface of the ceramic material or ceramic matrix composite (CMC), said bonding layer (12) being topped by one or more layers together forming a multifunctional barrier structure (13), characterised in that the bonding layer (12) has at its interface with the multifunctional structure a polycrystalline silica layer (12) or sub-layer (12b).

PART MADE OF SILICON-BASED CERAMIC OR CMC AND METHOD FOR PRODUCING SUCH A PART

The invention relates to a part made of silicon-based ceramic material or silicon-based ceramic matrix composite (CMC) material comprising an environmental barrier coating (EBC), said coating (12, 13) comprising a bonding layer (12) deposited on the surface of the ceramic material or ceramic matrix composite (CMC), said bonding layer (12) being topped by one or more layers together forming a multifunctional barrier structure (13), characterised in that the bonding layer (12) has at its interface with the multifunctional structure a polycrystalline silica layer (12) or sub-layer (12b).

ULTRA-HIGH DIELECTRIC CONSTANT GARNET
20210317044 · 2021-10-14 ·

Disclosed are embodiments of synthetic garnet materials for use in radiofrequency applications. In some embodiments, increased amounts of bismuth can be added into specific sites in the crystal structure of the synthetic garnet in order to boost certain properties, such as the dielectric constant and magnetization. Accordingly, embodiments of the disclosed materials can be used in high frequency applications, such as in base station antennas.

Ultra-high dielectric constant garnet

Disclosed are embodiments of synthetic garnet materials for use in radiofrequency applications. In some embodiments, increased amounts of bismuth can be added into specific sites in the crystal structure of the synthetic garnet in order to boost certain properties, such as the dielectric constant and magnetization. Accordingly, embodiments of the disclosed materials can be used in high frequency applications, such as in base station antennas.

METHOD FOR DOPING USING ELECTRIC FIELD
20210140053 · 2021-05-13 ·

A doping method using an electric field includes stacking a sacrificial layer on a doped layer, disposing a doping material on the sacrificial layer, disposing electrodes on the doping material and the doped layer, respectively, and doping the doping material into the doped layer through oxidation, diffusion, and reduction of the doping material by the electric field.

Chemical and topological surface modification to enhance coating adhesion and compatibility

A process of coating a substrate containing silicon with an environmental barrier coating, comprising altering a surface of the substrate and applying an environmental barrier layer to the surface of the substrate.

Chemical and topological surface modification to enhance coating adhesion and compatibility

A process of coating a substrate containing silicon with an environmental barrier coating, comprising altering a surface of the substrate and applying an environmental barrier layer to the surface of the substrate.

Chemical and topological surface modification to enhance coating adhesion and compatibility

A process of coating a substrate containing silicon with an environmental barrier coating, comprising altering a surface of the substrate and applying an environmental barrier layer to the surface of the substrate.