Systems and methods for forming an oxidation protection system on a composite structure are provided. In various embodiments, the oxidation protection system comprises a boron-glass layer formed on the composite substrate and a silicon-glass layer formed over the boron-glass layer. Each of the boron-glass layer and the silicon-glass layer includes a glass former.

Systems and methods for forming an oxidation protection system on a composite structure are provided. In various embodiments, the oxidation protection system comprises a boron-glass layer formed on the composite substrate and a silicon-glass layer formed over the boron-glass layer. Each of the boron-glass layer and the silicon-glass layer includes a glass former.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

A ceramic component included in a plasma etching apparatus, wherein a surface of the ceramic component may include a base material and a composite material disposed in contact with the base material, wherein a resistivity of the ceramic component may be 10.sup.−1 Ω.Math.cm to 20 Ω.Math.cm, and wherein the base material may include a first boron carbide-based material and the composite material may include at least one selected from the group consisting of a second boron carbide-based material, a carbon-based material, and combinations thereof, is disclosed.

A method for forming an oxidation protection system on a composite structure is provided, which may comprise applying a ceramic layer slurry to the composite structure, wherein the ceramic layer slurry may comprise aluminum and silicon in a solvent or carrier fluid; heating the composite structure to form a ceramic layer on the composite structure, wherein the ceramic layer may comprise aluminum nitride; applying a sealing slurry to the composite structure, wherein the sealing slurry may comprise a sealing pre-slurry composition and a sealing carrier fluid, wherein the sealing pre-slurry composition may comprise a sealing phosphate glass composition; and/or heating the composite structure to form a sealing layer on the composite structure.

A method for forming an oxidation protection system on a composite structure is provided, which may comprise applying a ceramic layer slurry to the composite structure, wherein the ceramic layer slurry may comprise aluminum and silicon in a solvent or carrier fluid; heating the composite structure to form a ceramic layer on the composite structure, wherein the ceramic layer may comprise aluminum nitride; applying a sealing slurry to the composite structure, wherein the sealing slurry may comprise a sealing pre-slurry composition and a sealing carrier fluid, wherein the sealing pre-slurry composition may comprise a sealing phosphate glass composition; and/or heating the composite structure to form a sealing layer on the composite structure.

Systems and methods for forming an oxidation protection system on a composite structure are provided. In various embodiments, an oxidation protection system disposed on a substrate may comprise a boron-silicon-glass layer formed directly on the composite structure. The boron-silicon-glass layer may comprise a boron compound, a silicon compound, and a glass compound.

Systems and methods for forming an oxidation protection system on a composite structure are provided. In various embodiments, an oxidation protection system disposed on a substrate may comprise a boron-silicon-glass layer formed directly on the composite structure. The boron-silicon-glass layer may comprise a boron compound, a silicon compound, and a glass compound.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.