An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

The present invention concerns a method for obtaining a finished or semi-finished zirconia-based article, the surface of the article having a metallic external appearance and non-zero surface electrical conductivity, wherein the method includes the steps of: taking at least one zirconia article, pre-shaped in its finished or semi-finished form; placing said article in a chamber in which a hydrogen and carbon/nitrogen gas mixture is heated; heating said article and the gas mixture using at least one resistive element traversed by an electric current to obtain dissociation of the hydrogen and carbon/nitrogen based gas molecules and an increase in the temperature of said article; keeping said article in the reactive atmosphere thus created to obtain diffusion of the carbon/nitrogen atoms in the external surface of said article.

The present invention concerns a method for obtaining a finished or semi-finished zirconia-based article, the surface of the article having a metallic external appearance and non-zero surface electrical conductivity, wherein the method includes the steps of: taking at least one zirconia article, pre-shaped in its finished or semi-finished form; placing said article in a chamber in which a hydrogen and carbon/nitrogen gas mixture is heated; heating said article and the gas mixture using at least one resistive element traversed by an electric current to obtain dissociation of the hydrogen and carbon/nitrogen based gas molecules and an increase in the temperature of said article; keeping said article in the reactive atmosphere thus created to obtain diffusion of the carbon/nitrogen atoms in the external surface of said article.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

A method for forming a high temperature coating includes forming a pre-sintered ceramic coating on a ceramic composite substrate. The pre-sintered ceramic coating comprises a plurality of ceramic particles. The method further includes sintering at least a portion of the pre-sintered ceramic coating by heating the portion of the pre-sintered ceramic coating to a sintering temperature of the pre-sintered ceramic coating using one or more non-contact radiative heating elements. The sintering temperature is greater than about 1000 degrees Celsius (° C.).

A method for forming a high temperature coating includes forming a pre-sintered ceramic coating on a ceramic composite substrate. The pre-sintered ceramic coating comprises a plurality of ceramic particles. The method further includes sintering at least a portion of the pre-sintered ceramic coating by heating the portion of the pre-sintered ceramic coating to a sintering temperature of the pre-sintered ceramic coating using one or more non-contact radiative heating elements. The sintering temperature is greater than about 1000 degrees Celsius (° C.).

A method may produce a ceramic part with a mother-of-pearl effect, in particular for watchmaking. Such methods may include: forming a ceramic body; depositing a layer of an oxy-nitride component of the OxNy type on at least a portion of the ceramic body; and oxidizing at least a portion of the oxy-nitride layer, preferably by heating.

A method may produce a ceramic part with a mother-of-pearl effect, in particular for watchmaking. Such methods may include: forming a ceramic body; depositing a layer of an oxy-nitride component of the OxNy type on at least a portion of the ceramic body; and oxidizing at least a portion of the oxy-nitride layer, preferably by heating.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.