C07C233/80

Diarylamide Compound and Application Thereof
20230045031 · 2023-02-09 ·

A use of a diarylamide compound having the structure as shown in formula (I) or a pharmaceutically acceptable salt thereof in preparing a drug which acts as a urea transporter protein inhibitor, and a novel diarylamide compound. The diarylamide compound has urea transporter protein inhibitor effect, and can produce urea selective diuresis in the body without obvious toxicity.

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Diarylamide Compound and Application Thereof
20230045031 · 2023-02-09 ·

A use of a diarylamide compound having the structure as shown in formula (I) or a pharmaceutically acceptable salt thereof in preparing a drug which acts as a urea transporter protein inhibitor, and a novel diarylamide compound. The diarylamide compound has urea transporter protein inhibitor effect, and can produce urea selective diuresis in the body without obvious toxicity.

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RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME

A resin having a small linear thermal expansion coefficient and a low absorbance is provided. The resin is characterized by including at least one structure selected from structures represented by the following general formulae (1) and (2):

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RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME

A resin having a small linear thermal expansion coefficient and a low absorbance is provided. The resin is characterized by including at least one structure selected from structures represented by the following general formulae (1) and (2):

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SMALL-CELL POLYSTYRENE FOAMS, AND PROCESS FOR PRODUCING SAME
20230227627 · 2023-07-20 ·

The invention relates to a process for producing small-cell foams from a styrene-polymer component (S) and an additive of formula (I), wherein Z represents a C.sub.1-C.sub.5-alkylene group or an oxygen or sulfur atom, R.sub.1 and R.sub.2 represent, e.g., a C.sub.3-C.sub.12-alkyl residue, C.sub.3-C.sub.12-cycloalkyl residue or benzyl residue; and R.sub.3, R.sub.4, R.sub.5 and R.sub.6 represent hydrogen or a C.sub.1-C.sub.6-alkyl residue, comprising the steps of: —heating at least a styrene-polymer component (S) to obtain a molten, polymeric molding compound, —introducing a propellant (T) into the molten molding compound to form a foamable composition (Z), and—foaming the foamable composition to obtain a foamed molding, the molten polymeric molding compound containing at least one carboxylic acid derivative of the general formula (I).

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ARYL AND HETEROARYL COMPOUNDS, AND THERAPEUTIC USES THEREOF IN CONDITIONS ASSOCIATED WITH THE ALTERATION OF THE ACTIVITY OF GALACTOCEREBROSIDASE

The application is directed to compounds of formulae (IA) and (IB): (IA) and (IB), and their salts and solvates, wherein R.sup.1a, R.sup.2a, .sup.A1, A.sup.2, A.sup.3, A.sup.4, R.sup.1b, R.sup.2b, B.sup.1, B.sup.2, B.sup.3, and G are as set forth in the specification, as well as to methods for their preparation, N pharmaceutical compositions comprising the same, and use thereof for the treatment and/or prevention of, e.g., lysosomal storage diseases, such as Krabbe's disease, and α-synucleinopathies, such as Parkinson's disease.

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Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate, and a material for forming an organic film containing the compound. A material for forming an organic film, including: (A) a compound for forming an organic film shown by the following general formula (1A); and (B) an organic solvent, ##STR00001## noting that in the general formula (1B), when W.sub.1 represents ##STR00002##  R.sub.1 does not represent any of ##STR00003##

FLUORINATED AMIDE COMPOUND, COMPOUND CONTAINING FLUORINATED NITROGEN-CONTAINING HETEROCYCLIC RING, AND FLUORINATED COMPOUND

A fluorinated amide compound having a specific repeating unit and a fluorinated nitrogen-containing heterocyclic ring-containing compound having a specific repeating unit.

Polyamideimide Precursor, Polyamideimide Prepared Therefrom, and Polyamideimide Film Including the Same

Provided are a polyamideimide precursor, a polyamideimide prepared therefrom, and a polyamideimide film including the same. Specifically, the polyamideimide film according to an exemplary embodiment includes a polyamideimide derived from a combination of specific compositions to implement a high modulus and excellent optical properties.

Small molecule inhibitors selective for polo-like kinase proteins

Disclosed are small molecule PLK inhibitors that can target the polo box domain (PBD). Inhibitors can have an atomic mass of about 1000 Da or less and a general structure of ##STR00001##
For instance, the inhibitors can include an alkyl benzamido benzoic acid core structure.