A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Compositions suitable for enhanced oil recovery comprising a) a mixture of α-sulfocarbonyl compounds of formulae (1) and (2) in a mixture ratio (1) to (2) of from 1:99 to 99:1 ##STR00001## wherein R.sub.1, R.sub.3 and R.sub.5, which may be the same or different at each occurrence, are hydrogen or a linear or branched alkyl chain having 1 to 20 carbon atoms, R.sub.2 and R.sub.4, which may be the same or different at each occurrence, may be a linear or branched alkyl group having 4 to 24 carbon atoms and in which the alkyl chain may comprise one or more cycloaliphatic groups, and X is H or a metal forming a salt with the sulfonate group, and b) a salt containing aqueous solution.

Compositions suitable for enhanced oil recovery comprising a) a mixture of α-sulfocarbonyl compounds of formulae (1) and (2) in a mixture ratio (1) to (2) of from 1:99 to 99:1 ##STR00001## wherein R.sub.1, R.sub.3 and R.sub.5, which may be the same or different at each occurrence, are hydrogen or a linear or branched alkyl chain having 1 to 20 carbon atoms, R.sub.2 and R.sub.4, which may be the same or different at each occurrence, may be a linear or branched alkyl group having 4 to 24 carbon atoms and in which the alkyl chain may comprise one or more cycloaliphatic groups, and X is H or a metal forming a salt with the sulfonate group, and b) a salt containing aqueous solution.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Furthermore, a second object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. In addition, a third object of the present invention is to provide a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition.

The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va.sup.1 is a divalent hydrocarbon group. n.sub.a1 represents an integer of 0 to 2. Ra′.sup.12 and Ra′.sup.13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′.sup.14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R.sup.b1 represents a cyclic hydrocarbon group. Y.sup.b1 represents a divalent linking group containing an ester bond. V.sup.b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M.sup.m+ is an m-valent organic cation.

##STR00001##

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va.sup.1 is a divalent hydrocarbon group. n.sub.a1 represents an integer of 0 to 2. Ra′.sup.12 and Ra′.sup.13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′.sup.14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R.sup.b1 represents a cyclic hydrocarbon group. Y.sup.b1 represents a divalent linking group containing an ester bond. V.sup.b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M.sup.m+ is an m-valent organic cation.

##STR00001##

A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.