A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Provided herein are processes for synthesizing intermediates useful in preparing Mcl-1 inhibitors. In particular, provided herein are processes for synthesizing compound F, or a salt thereof, wherein R.sup.1 and OPG.sup.2 are described herein. Compound F can be useful in synthesizing compound A1, or a salt of solvate thereof, and compound A2, or a salt of solvate thereof.

##STR00001##

A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.

A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Provided are a salt capable of producing a resist pattern with satisfactory line edge roughness (LER), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same:

##STR00001##

wherein, in formula (I), R.sup.4, R.sup.3, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 represents an integer of 1 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 5, and m7 represents an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI.sup.− represents an organic anion.

Provided are a salt capable of producing a resist pattern with satisfactory line edge roughness (LER), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same:

##STR00001##

wherein, in formula (I), R.sup.4, R.sup.3, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 represents an integer of 1 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 5, and m7 represents an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI.sup.− represents an organic anion.