A capacitor and a method of making a capacitor, is provided with improved reliability performance. The capacitor comprises an anode; a dielectric on the anode; and a cathode on the dielectric wherein the cathode comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented by Formula A.sub.xB.sub.yC.sub.z as described herein.

An improved formulation of conductive polymer is provided. The formulation comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented the ratio of Formula A:
A.sub.xB.sub.yC.sub.z  Formula A
wherein:
A is polystyrenesulfonic acid or salt of polystyrenesulfonate;
B and C separately represent polymerized units substituted by a group selected from:
—C(O)OR.sup.6 wherein R.sup.6 is selected from the group consisting of:
—(CHR.sup.17).sub.b—R.sup.18. All other groups are defined. The conductive polymer has an average particle size of at least 1 nm to no more than 10 microns.

An improved formulation of conductive polymer is provided. The formulation comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented the ratio of Formula A:
A.sub.xB.sub.yC.sub.z  Formula A
wherein:
A is polystyrenesulfonic acid or salt of polystyrenesulfonate;
B and C separately represent polymerized units substituted by a group selected from:
—C(O)OR.sup.6 wherein R.sup.6 is selected from the group consisting of:
—(CHR.sup.17).sub.b—R.sup.18. All other groups are defined. The conductive polymer has an average particle size of at least 1 nm to no more than 10 microns.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I): ##STR00001##
wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

An improved slurry of conductive polymer is provided. The slurry comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented the ratio of Formula A:

A.sub.xB.sub.yC.sub.z   Formula A

wherein:
A is polystyrenesulfonic acid or salt of polystyrenesulfonate;
B and C separately represent polymerized units substituted by a group selected from:
—C(O)OR.sup.6 wherein R.sup.6 is selected from the group consisting of:
—(CHR.sup.17).sub.b—R.sup.18. All other groups are defined. The conductive polymer has an average particle size of at least 1 nm to no more than 10 microns.

An improved slurry of conductive polymer is provided. The slurry comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented the ratio of Formula A:

A.sub.xB.sub.yC.sub.z   Formula A

wherein:
A is polystyrenesulfonic acid or salt of polystyrenesulfonate;
B and C separately represent polymerized units substituted by a group selected from:
—C(O)OR.sup.6 wherein R.sup.6 is selected from the group consisting of:
—(CHR.sup.17).sub.b—R.sup.18. All other groups are defined. The conductive polymer has an average particle size of at least 1 nm to no more than 10 microns.

A capacitor and a method of making a capacitor, is provided with improved reliability performance. The capacitor comprises an anode; a dielectric on the anode; and a cathode on the dielectric wherein the cathode comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented by Formula A.sub.xB.sub.yC.sub.z as described herein.

A capacitor and a method of making a capacitor, is provided with improved reliability performance. The capacitor comprises an anode; a dielectric on the anode; and a cathode on the dielectric wherein the cathode comprises a conductive polymer and a polyanion wherein the polyanion is a copolymer comprising groups A, B and C represented by Formula A.sub.xB.sub.yC.sub.z as described herein.

Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I):

##STR00001##

wherein: Ar.sup.1 represents an aromatic group; R.sup.1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R.sup.1 groups together optionally form a fused ring structure with Ar.sup.1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar.sup.1, and two or more of R.sup.1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.