Disclosed are a salt represented by formula (I), an acid generator, and a resist composition comprising the same:

##STR00001##

wherein R.sup.1 and R.sup.2 each represent a hydroxy group, *—O—R.sup.10, *—O-L.sup.10-CO—O—R.sup.10; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A.sup.1 and A.sup.2 each represent a hydrocarbon group, the hydrocarbon group may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO.sub.2—; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; and AI.sup.− represents an organic anion.

The present application provides methods and compounds of modulating Nrf2 pathway. Methods for treating cancer and neurodegenerative conditions are also provided.

The present application provides methods and compounds of modulating Nrf2 pathway. Methods for treating cancer and neurodegenerative conditions are also provided.

To provide a resist material that can form a film with high smoothness and uniformity and has high patterning performance, such as resolution, a resist material is provided that contains a calixarene compound (A) with a molecular structure represented by the following structural formula (1) and a resin component (B); ##STR00001##
wherein R.sup.1 denotes a perfluoroalkyl group or a structural moiety with a perfluoroalkyl group; R.sup.2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group; R.sup.3 denotes a hydrogen atom, an aliphatic hydrocarbon group that optionally has a substituent, or an aryl group that optionally has a substituent; n denotes an integer in the range of 2 to 10; and * denotes a bonding point with an aromatic ring.

To provide a resist material that can form a film with high smoothness and uniformity and has high patterning performance, such as resolution, a resist material is provided that contains a calixarene compound (A) with a molecular structure represented by the following structural formula (1) and a resin component (B); ##STR00001##
wherein R.sup.1 denotes a perfluoroalkyl group or a structural moiety with a perfluoroalkyl group; R.sup.2 denotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group; R.sup.3 denotes a hydrogen atom, an aliphatic hydrocarbon group that optionally has a substituent, or an aryl group that optionally has a substituent; n denotes an integer in the range of 2 to 10; and * denotes a bonding point with an aromatic ring.

A method of preparing a thiomethylphenol derivative is disclosed, the method including: (a) carrying out a primary reaction of a phenol derivative represented by the following Chemical Formula 2, a mercaptan derivative represented by R.sub.4SH, and paraformaldehyde at a reaction temperature T.sub.1 under conditions in which a heterocyclic base having 3 to 10 carbon atoms and an acid are simultaneously present; and (b) carrying out a secondary reaction at a reaction temperature T.sub.2 to prepare a thiomethylphenol derivative represented by the following Chemical Formula 1, wherein T.sub.1<T.sub.2 is satisfied.

A method of preparing a thiomethylphenol derivative is disclosed, the method including: (a) carrying out a primary reaction of a phenol derivative represented by the following Chemical Formula 2, a mercaptan derivative represented by R.sub.4SH, and paraformaldehyde at a reaction temperature T.sub.1 under conditions in which a heterocyclic base having 3 to 10 carbon atoms and an acid are simultaneously present; and (b) carrying out a secondary reaction at a reaction temperature T.sub.2 to prepare a thiomethylphenol derivative represented by the following Chemical Formula 1, wherein T.sub.1<T.sub.2 is satisfied.

The present disclosure relates to a crosslinking ligand, a method for patterning a nanoparticle layer, a quantum dot light-emitting device, and a display device. The crosslinking ligand includes: at least two coordinating groups, at least one photosensitive degradation group and at least one thermosensitive crosslinking group, both of which are connected between the coordinating groups. The method for patterning the nanoparticle layer includes: forming a nanoparticle layer on a substrate; attaching a solution containing the crosslinking ligand to the substrate, to allow the crosslinking ligand to form a crosslinking between nanoparticles; performing a light irradiation treatment on a preset region of the substrate; removing the nanoparticles in the preset region; and performing a heat treatment on the substrate. The present disclosure does not need to design the structure of the ligand of the nanoparticles, and can form a nanoparticle layer with high resolution, simple process and high realizability.

Cross-linked amphiphile constructs that form self-assembled monolayers (SAMs) on metal surfaces such as gold surfaces are disclosed. These new SAMs generate well packed and highly oriented monolayer films on gold surfaces. A method for using the SAMs in the fabrication of biomolecule sensors is also disclosed.

Cross-linked amphiphile constructs that form self-assembled monolayers (SAMs) on metal surfaces such as gold surfaces are disclosed. These new SAMs generate well packed and highly oriented monolayer films on gold surfaces. A method for using the SAMs in the fabrication of biomolecule sensors is also disclosed.