The present disclosure provides a composition containing (A) 1,1,1,3,3,3-hexafluoroisopropyl methyl ether (HFE-356mmz) and/or 1,1,2,3,3,3-hexafluoropropyl methyl ether (HFE-356mec), and (B) a fluorine oil.

The present disclosure provides a composition containing (A) 1,1,1,3,3,3-hexafluoroisopropyl methyl ether (HFE-356mmz) and/or 1,1,2,3,3,3-hexafluoropropyl methyl ether (HFE-356mec), and (B) a fluorine oil.

A process for continuous preparation of halogenated alkoxyethane of general formula XClHC—CF.sub.2OR, where X is —Cl or -f and OR is C.sub.1-4 alkoxy, the process comprising a step of introducing in a flow reactor reaction components comprising (i) a compound of general formula XClHC—CYF.sub.2, where each of X and Y is independently —Cl or —F, (ii) a base, and (iii) a C.sub.1-4 alkanol, wherein a) the flow reactor comprises one or more tubular flow line(s) through which the reaction components flow as a reaction mixture, c) the halogenated alkoxyethane is formed at least upon the reaction components mixing, with the so formed halogenated alkoxyethane flowing out of the flow reactor in a reactor effluent, and b) the base is one that forms a salt soluble in the alkanol during formation of the halogenated alkoxyethane.

A process for continuous preparation of halogenated alkoxyethane of general formula XClHC—CF.sub.2OR, where X is —Cl or -f and OR is C.sub.1-4 alkoxy, the process comprising a step of introducing in a flow reactor reaction components comprising (i) a compound of general formula XClHC—CYF.sub.2, where each of X and Y is independently —Cl or —F, (ii) a base, and (iii) a C.sub.1-4 alkanol, wherein a) the flow reactor comprises one or more tubular flow line(s) through which the reaction components flow as a reaction mixture, c) the halogenated alkoxyethane is formed at least upon the reaction components mixing, with the so formed halogenated alkoxyethane flowing out of the flow reactor in a reactor effluent, and b) the base is one that forms a salt soluble in the alkanol during formation of the halogenated alkoxyethane.

This invention relates to the use of base-labile protecting groups for stepwise synthesis of polymers including oligomers. One or more monomers that have a base-labile protecting group at one end and a leaving group at the other are used in synthetic cycles comprising deprotection under stronger basic conditions to remove the base-labile protecting group, and coupling with a monomer under weaker basic conditions to elongate the polymer without premature deprotection of the base-labile protecting group. Advantages of the invention include the possibility to shorten the synthetic cycle from three steps in prior art methods to two steps, more efficient deprotection, more efficient coupling, and the use of less harmful and less expensive chemicals. One of the goals for stepwise polymer synthesis is to prepare monodisperse and sequence-defined polymers.

The object is to provide a composition capable of forming a surface layer with excellent abrasion resistance, a substrate with a surface layer, and a method for producing a substrate with a surface layer. It is also an object to provide new compounds and their production methods.

The composition of the invention comprises a first component made of a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and at least one type of second component selected from compound (A) (R.sup.fa—(OX.sup.a).sub.m1-L.sup.a-CZ.sup.a1═CH.sub.2) and compound (B) (CH.sub.2═CZ.sup.b2-L.sup.b2-(OX.sup.b).sub.m2-L.sup.b1-CZ.sup.b1═CH.sub.2), where R.sup.fa is a fluoroalkyl group, X.sup.a and X.sup.b are fluoroalkylene groups, L.sup.a is a single bond or a divalent linking group (but excluding (OX.sup.a).sub.na), L.sup.b1 and L.sup.b2 are single bonds or divalent linking groups (but excluding (OX.sup.b).sub.nb), Z.sup.a1, Z.sup.b1 and Z.sup.b2 are fluorine atoms or trifluoromethyl groups, and m1 and m2 are integers of 2 or more.

A process for continuous preparation of halogenated alkoxyethane of general formula XClHC—CF.sub.2OR, where X is —Cl or —F and OR is C.sub.1-4 alkoxy, the process comprising a step of introducing in a flow reactor reaction components comprising (i) a compound of general formula XClC═CF.sub.2, (ii) abase, and (iii) a C.sub.1-4 alkanol, wherein a) the flow reactor comprises one or more tubular flow line(s) having an internal cross-sectional area of less than 115 mm.sup.2 through which the reaction components flow as a reaction mixture, and b) the halogenated alkoxyethane is formed at least upon the reaction components mixing, with the so formed halogenated alkoxyethane flowing out of the flow reactor in a reactor effluent.

A process for continuous preparation of halogenated alkoxyethane of general formula XClHC—CF.sub.2OR, where X is —Cl or —F and OR is C.sub.1-4 alkoxy, the process comprising a step of introducing in a flow reactor reaction components comprising (i) a compound of general formula XClC═CF.sub.2, (ii) abase, and (iii) a C.sub.1-4 alkanol, wherein a) the flow reactor comprises one or more tubular flow line(s) having an internal cross-sectional area of less than 115 mm.sup.2 through which the reaction components flow as a reaction mixture, and b) the halogenated alkoxyethane is formed at least upon the reaction components mixing, with the so formed halogenated alkoxyethane flowing out of the flow reactor in a reactor effluent.

The present disclosure discloses a fluoroalkyl glycerin derivative usable as an excellent surfactant by having functional groups and the number of carbon atoms controlled in the molecular structure, and its use as a surfactant. A fluoroalkyl glycerin derivative according to the present disclosure is used as a fluorine-based nonionic surfactant, and replaces existing fluoro compounds as well as having excellent surfactant properties compared to existing surfactants having a linear alkyl group.

The present disclosure discloses a method for preparing a hybrid-type fluorine-based nonionic surfactant capable of producing a high purity material in a high yield. By preparing a hybrid-type fluorine-based nonionic surfactant according to the present disclosure, the surfactant is mass-produced in a high yield through controlling reaction conditions including a solvent.