A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent

##STR00001##

To provide a method for recovering an acid of an anionic fluorinated emulsifier with a high yield from a basic ion exchange resin having a nonionic surfactant physically adsorbed thereon and having the anionic fluorinated emulsifier adsorbed thereon. A method for eluting and recovering an acid of an anionic fluorinated emulsifier from a basic ion exchange resin having a nonionic surfactant physically adsorbed thereon and having the anionic fluorinated emulsifier adsorbed thereon, which comprises a step (1) of bringing the basic ion exchange resin into contact with a water-soluble organic solvent and a step (2) of recovering the acid of the anionic fluorinated emulsifier from the basic ion exchange resin from which the ionic surfactant is eluted in the step (1).

A method for producing a compound represented by formula (P1): (B.sup.1f).sub.mp(A.sup.1).sub.np, wherein B.sup.1f is RfCOO, Rf is a hydrocarbon having one or more fluorine atoms, A.sup.1 is a group excluding H, mp is (valence of A.sup.1)×np and is 1 or 2, np is mp/(valence of A.sup.1) and is 1, A.sup.1 has a valence of 1 or 2, the method comprising step A of reacting a compound represented by formula (S1): (B.sup.1f)(R.sup.1), wherein B.sup.1f is as defined above, and R.sup.1 is an organic group, and a compound represented by formula (S2): (A.sup.1).sub.ms2(B.sup.2).sub.ns2, wherein A.sup.1 is as defined above, B.sup.2 is OH, CO.sub.3, or HCO.sub.3, ms2 is (valence of B.sup.2)×ns2/(valence of A.sup.1) and is 1 or 2, and ns2 is (valence of A.sup.1)×ms2/(valence of B.sup.2) and 1 or 2, or a hydrate thereof.

Such a method is a novel production method of a fluorinated carboxylic acid salt compound (preferably a fluorinated carboxylic acid salt compound having a low water content).

A method for producing a compound represented by formula (P1): (B.sup.1f).sub.mp(A.sup.1).sub.np, wherein B.sup.1f is RfCOO, Rf is a hydrocarbon having one or more fluorine atoms, A.sup.1 is a group excluding H, mp is (valence of A.sup.1)×np and is 1 or 2, np is mp/(valence of A.sup.1) and is 1, A.sup.1 has a valence of 1 or 2, the method comprising step A of reacting a compound represented by formula (S1): (B.sup.1f)(R.sup.1), wherein B.sup.1f is as defined above, and R.sup.1 is an organic group, and a compound represented by formula (S2): (A.sup.1).sub.ms2(B.sup.2).sub.ns2, wherein A.sup.1 is as defined above, B.sup.2 is OH, CO.sub.3, or HCO.sub.3, ms2 is (valence of B.sup.2)×ns2/(valence of A.sup.1) and is 1 or 2, and ns2 is (valence of A.sup.1)×ms2/(valence of B.sup.2) and 1 or 2, or a hydrate thereof.

Such a method is a novel production method of a fluorinated carboxylic acid salt compound (preferably a fluorinated carboxylic acid salt compound having a low water content).

A method for removing a fluorine-containing compound from discharge water, which includes bringing discharge water containing two or more fluorine-containing compounds represented by the following general formula (1) or (2) into contact with an adsorbent so as to adsorb the two or more fluorine-containing compounds:

(H—(CF.sub.2).sub.m—COO).sub.pM.sup.1  General Formula (1):

wherein m is 3 to 19, M.sup.1 is H, a metal atom, NR.sup.b.sub.4, where R.sup.b is the same or different and is H or an organic group having 1 to 10 carbon atoms, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent; and p is 1 or 2;

(H—(CF.sub.2).sub.n—SO.sub.3).sub.qM.sup.2  General Formula (2):

wherein n is 4 to 20; M.sup.2 is H, a metal atom, NR.sup.b.sub.4, where R.sup.b is the same as above, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent; and q is 1 or 2.

A method for removing a fluorine-containing compound from discharge water, which includes bringing discharge water containing two or more fluorine-containing compounds represented by the following general formula (1) or (2) into contact with an adsorbent so as to adsorb the two or more fluorine-containing compounds:

(H—(CF.sub.2).sub.m—COO).sub.pM.sup.1  General Formula (1):

wherein m is 3 to 19, M.sup.1 is H, a metal atom, NR.sup.b.sub.4, where R.sup.b is the same or different and is H or an organic group having 1 to 10 carbon atoms, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent; and p is 1 or 2;

(H—(CF.sub.2).sub.n—SO.sub.3).sub.qM.sup.2  General Formula (2):

wherein n is 4 to 20; M.sup.2 is H, a metal atom, NR.sup.b.sub.4, where R.sup.b is the same as above, imidazolium optionally having a substituent, pyridinium optionally having a substituent, or phosphonium optionally having a substituent; and q is 1 or 2.

Beta-hydroxybutyric acid-based radiopharmaceuticals, pharmaceutical compositions comprising same, methods for preparing same, and methods of using same for diagnostic imaging and non-imaging tracer studies are provided.

Beta-hydroxybutyric acid-based radiopharmaceuticals, pharmaceutical compositions comprising same, methods for preparing same, and methods of using same for diagnostic imaging and non-imaging tracer studies are provided.