This disclosure relates to amphiphilic compounds containing a cyclobutene or cyclobutane moiety. In some embodiments, the compounds are useful for treating infection by Mycobacterium such as Mycobacterium tuberculosis. Cyclobutene containing compounds are also useful as monomers in the preparation of amphiphilic polymers.

This disclosure relates to amphiphilic compounds containing a cyclobutene or cyclobutane moiety. In some embodiments, the compounds are useful for treating infection by Mycobacterium such as Mycobacterium tuberculosis. Cyclobutene containing compounds are also useful as monomers in the preparation of amphiphilic polymers.

A lithographic method includes forming a photoresist layer on a target layer, forming a photo-decomposable base (PDB) layer on the photo resist layer, performing an exposure operation using a mask, and performing a negative development treatment to form a patterned photoresist layer on the target layer. In some cases, the photo-decomposable base layer includes a self-generating top coating photo-decomposable base (TC-PDB) layer. The method can also include forming a top surface water-resistant coating in separate coating process. In some embodiments, a top surface water-resistant coating is self-generated during a photoresist coating process.

A lithographic method includes forming a photoresist layer on a target layer, forming a photo-decomposable base (PDB) layer on the photo resist layer, performing an exposure operation using a mask, and performing a negative development treatment to form a patterned photoresist layer on the target layer. In some cases, the photo-decomposable base layer includes a self-generating top coating photo-decomposable base (TC-PDB) layer. The method can also include forming a top surface water-resistant coating in separate coating process. In some embodiments, a top surface water-resistant coating is self-generated during a photoresist coating process.