The present disclosure relates to a cocrystal of pterostilbene and a coformer capable to form hydrogen bond interactions, to a process for the preparation thereof, and to its use as a medicament or a dietary supplement. The present disclosure also relates to a composition comprising the cocrystal.

A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the α-position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group ##STR00001##

A resist composition including a compound (D0) represented by general formula (d0) and a polymeric compound (A10) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below (in formula (d0), n represents an integer of 2 or more; in formula (a0-1), W.sup.1 represents a polymerizable group-containing group; C.sup.t represents a tertiary carbon atom, and the α-position of C.sup.t is a carbon atom which constitutes a carbon-carbon unsaturated bond; R.sup.11 represents an aromatic hydrocarbon group which may have a substituent, or a chain hydrocarbon group; R.sup.12 and R.sup.13 each independently represents a chain hydrocarbon group, or R.sup.12 and R.sup.13 are mutually bonded to form a cyclic group ##STR00001##

A metal compound includes a metal and at least two aromatic hydroxycarboxylic acid structures. Each aromatic hydroxycarboxylic acid structure includes an aromatic moiety having a hydroxyl substituent and a carboxylic acid substituent, which cooperatively bond the aromatic moiety to the metal via at least one of ionic bond, covalent bond and coordinate bond. Each aromatic hydroxycarboxylic acid structure is bonded to a polymer segment.

A chemically amplified positive-type photosensitive resin composition with which a resist pattern having a rectangular cross-sectional shape is easily formed, which has satisfactory sensitivity, and which can suppress decomposition of the acid generating agent; a photosensitive dry film having a photosensitive layer including the photosensitive resin composition; a method for producing the photosensitive dry film; a method for producing a patterned resist film using the positive-type photosensitive resin composition; a method for producing a substrate provided with a template using the positive-type photosensitive resin composition; and a method for producing a plated article using the positive-type photosensitive resin composition. The photosensitive resin composition includes an acid generating agent to generate an acid by irradiation with an active ray or radiation, a resin having alkali solubility that increases under action of an acid, and an acid diffusion suppressing agent, wherein the acid generating agent includes a non-ionic acid generating agent that generates sulfonic acid upon the irradiation, and the acid diffusion suppressing agent includes a compound having a specific structure that is decomposed by the irradiation.

Alkyl salicylic acids, overbased detergents derived from alkyl salicylic acids, lubricating compositions including the alkyl salicylic acids and/or overbased detergents, and processes of making and using the same, are described.

Alkyl salicylic acids, overbased detergents derived from alkyl salicylic acids, lubricating compositions including the alkyl salicylic acids and/or overbased detergents, and processes of making and using the same, are described.

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. ##STR00001##

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.