A fluorinated amide compound having a specific repeating unit and a fluorinated nitrogen-containing heterocyclic ring-containing compound having a specific repeating unit.

A compound represented by the following formula (1): ##STR00001##
wherein R.sup.1 is a monovalent organic group containing a polyether chain; X.sup.1 and X.sup.2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC.sub.6F.sub.12).sub.m11—(OC.sub.5F.sub.10).sub.m12—(OC.sub.4F.sub.8).sub.m13—(OC.sub.3X.sup.10.sub.6).sub.m14—(OC.sub.2F.sub.4).sub.m15—(OCF.sub.2).sub.m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X.sup.10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R.sup.1 being other than those containing a urethane bond.

A compound represented by the following formula (1): ##STR00001##
wherein R.sup.1 is a monovalent organic group containing a polyether chain; X.sup.1 and X.sup.2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC.sub.6F.sub.12).sub.m11—(OC.sub.5F.sub.10).sub.m12—(OC.sub.4F.sub.8).sub.m13—(OC.sub.3X.sup.10.sub.6).sub.m14—(OC.sub.2F.sub.4).sub.m15—(OCF.sub.2).sub.m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X.sup.10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R.sup.1 being other than those containing a urethane bond.

There is provided a compound of formula I, (I) wherein R.sup.1 and R.sup.2 are as defined herein, which compounds are useful in the treatment of diseases characterised by impaired signalling of neurotrophins and/or other trophic factors, such as Alzheimer's disease and the like.

##STR00001##

There is provided a compound of formula I, (I) wherein R.sup.1 and R.sup.2 are as defined herein, which compounds are useful in the treatment of diseases characterised by impaired signalling of neurotrophins and/or other trophic factors, such as Alzheimer's disease and the like.

##STR00001##

A composition is provided including a compound (A) represented by Formula (1) and a compound (B) represented by Formula (2), wherein the compound (B) is contained in an amount of 0.00002 to 0.2 parts by mass with respect to 100 parts by mass of the compound (A): (R.sub.1—COO).sub.n—R.sub.2—(NCO).sub.m . . . (1) (in Formula (1), R.sub.1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R.sub.2 is an (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms; and n and m are each an integer of 1 or 2) ##STR00001##
(in Formula (2), R is (—R.sub.2—(OCO—R.sub.1), and R.sub.1 and R.sub.2 are the same as those in Formula (1)).

A composition is provided including a compound (A) represented by Formula (1) and a compound (B) represented by Formula (2), wherein the compound (B) is contained in an amount of 0.00002 to 0.2 parts by mass with respect to 100 parts by mass of the compound (A): (R.sub.1—COO).sub.n—R.sub.2—(NCO).sub.m . . . (1) (in Formula (1), R.sub.1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R.sub.2 is an (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms; and n and m are each an integer of 1 or 2) ##STR00001##
(in Formula (2), R is (—R.sub.2—(OCO—R.sub.1), and R.sub.1 and R.sub.2 are the same as those in Formula (1)).

A resist underlayer film, which, while exhibiting excellent resistance to a resist developer which is a resist solvent or an alkaline aqueous solution, exhibits removability, and preferably solubility, only in wet etching chemicals. This composition for forming a resist underlayer film contains a solvent, a heterocyclic compound having a dicyanostyryl group, a cyclic compound including an amide group, for example, and the reaction product of a heterocyclic compound precursor having an epoxy group and an active proton compound, for example.

A resist underlayer film, which, while exhibiting excellent resistance to a resist developer which is a resist solvent or an alkaline aqueous solution, exhibits removability, and preferably solubility, only in wet etching chemicals. This composition for forming a resist underlayer film contains a solvent, a heterocyclic compound having a dicyanostyryl group, a cyclic compound including an amide group, for example, and the reaction product of a heterocyclic compound precursor having an epoxy group and an active proton compound, for example.

A method for producing a thiol compound including a light emission process in which light is emitted to a colored thiol compound or a composition containing the thiol compound. In the light emission process, it is preferable to emit light including light with a wavelength of 250 nm to 600 nm to the composition.