A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A.sup.1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. ##STR00001##

The present invention pertains to: a fluororesin that includes a residue unit represented by formula (1), and a terminal group represented by formula (2); and a fluororesin that includes a residue unit represented by formula (1) and has a transmittance of 50% or more measured at an optical path length of 10 mm and a wavelength of 275 nm when dissolved in perfluorohexane to produce a 10 wt % perfluorohexane solution.

##STR00001##

In formula (1): Rf.sub.1, Rf.sub.2, Rf.sub.3, and Rf.sub.4 each independently represent one selected from the group consisting of fluorine atoms, C1-7 linear perfluoroalkyl groups, C3-7 branched perfluoroalkyl groups, or C3-7 cyclic perfluoroalkyl groups; the perfluoroalkyl groups may have an etheric oxygen atom; Rf.sub.1, Rf.sub.2, Rf.sub.3, and Rf.sub.4 may bond to each other to form a ring having 4 to 8 carbon atoms; and the ring may include an etheric oxygen atom.

##STR00002##

In formula (2), i is an integer of 3-20. The present invention provides: a fluororesin that includes an oxolane ring, has suppressed yellowing after heating and melting, and especially has reduced discoloration, even in molding of thick products; and a method for producing said fluororesin.

The present invention provides a method for producing a benzaldehyde in which an amino group is bonded in the 2 position, a halogeno group or an alkoxy group is bonded in the 3 position, and a hydrogen atom, an alkyl group, a halogeno group, an alkoxy group, or a cyano group is bonded independently in each of the 4, 5, and 6 positions, the method including: preparing a benzaldehyde in which a halogeno group or an alkoxy group is bonded in the 3 position, a hydrogen atom is bonded in the 2 position, and a hydrogen atom, an alkyl group, a halogeno group, an alkoxy group, or a cyano group is bonded independently in each of the 4, 5, and 6 positions so that a lithiation reaction is most active at the 2 position; acetal-protecting a formyl group in the benzaldehyde; sequentially performing lithiation, azidation, and amination of the 2 position; and the performing acetal deportection.

The present invention provides a method for producing a benzaldehyde in which an amino group is bonded in the 2 position, a halogeno group or an alkoxy group is bonded in the 3 position, and a hydrogen atom, an alkyl group, a halogeno group, an alkoxy group, or a cyano group is bonded independently in each of the 4, 5, and 6 positions, the method including: preparing a benzaldehyde in which a halogeno group or an alkoxy group is bonded in the 3 position, a hydrogen atom is bonded in the 2 position, and a hydrogen atom, an alkyl group, a halogeno group, an alkoxy group, or a cyano group is bonded independently in each of the 4, 5, and 6 positions so that a lithiation reaction is most active at the 2 position; acetal-protecting a formyl group in the benzaldehyde; sequentially performing lithiation, azidation, and amination of the 2 position; and the performing acetal deportection.

An object of the present disclosure is to provide a method for producing an organic compound, and a composition. The object is achieved by a method for producing a compound represented by formula (1):

##STR00001##

wherein X represents —O—, an optionally substituted imino group, or —S—, R.sup.1 represents a hydrogen atom or a hydrocarbyl group optionally having at least one substituent, and R.sup.2 represents a hydrogen atom or a monovalent organic group, or R.sup.1 and R.sup.2, together with X and one carbon atom respectively adjacent to R.sup.1 and R.sup.2, may form a heterocyclic ring optionally having at least one substituent, R.sup.3 represents a hydrogen atom or a monovalent organic group, and R.sup.4 represents —CF.sub.2CH.sub.3 or —CH.sub.2CHF.sub.2; the method including step A of reacting a compound represented by formula (2):

##STR00002##

wherein the alphabetical symbols are as defined above, with vinylidene fluoride under light irradiation.

An object of the present disclosure is to provide a method for producing an organic compound, and a composition. The object is achieved by a method for producing a compound represented by formula (1):

##STR00001##

wherein X represents —O—, an optionally substituted imino group, or —S—, R.sup.1 represents a hydrogen atom or a hydrocarbyl group optionally having at least one substituent, and R.sup.2 represents a hydrogen atom or a monovalent organic group, or R.sup.1 and R.sup.2, together with X and one carbon atom respectively adjacent to R.sup.1 and R.sup.2, may form a heterocyclic ring optionally having at least one substituent, R.sup.3 represents a hydrogen atom or a monovalent organic group, and R.sup.4 represents —CF.sub.2CH.sub.3 or —CH.sub.2CHF.sub.2; the method including step A of reacting a compound represented by formula (2):

##STR00002##

wherein the alphabetical symbols are as defined above, with vinylidene fluoride under light irradiation.

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A.sup.1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

##STR00001##

A process for preparing a polyfluorinated compound of formula Ar—R.sub.1 (I), wherein Ar—R.sub.1 (I) is an aromatic ring system

##STR00001##

wherein R.sub.1 is selected from the group consisting of SF.sub.4Cl, SF.sub.3, SF.sub.2CF.sub.3, TeF.sub.5, TeF.sub.4CF.sub.3, SeF.sub.3, IF.sub.2, SeF.sub.2CF.sub.3, and IF.sub.4, X.sub.2 is N or CR.sub.2, X.sub.3 is N or CR.sub.3, X.sub.4 is N or CR.sub.4, X.sub.5 is N or CR.sub.5, X.sub.6 is N or CR.sub.6, and the total number of nitrogen atoms in the aromatic ring system is between 0 and 3, wherein R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently selected from the group consisting of hydrogen, fluoro, chloro, bromo, nitro, trifluoromethyl, 2,2,2-trifluoroethyl, pentafluorosulfanyl, phthalimido, azido, benzyloxy, trifluoromethoxy, 2,2,2-trifluoroethoxy, methoxycarbonyl, ethoxycarbonyl, methylcarbonyl, ethylcarbonyl, acetoxy, t-butyl, phenylcarbonyl, benzylcarbonyl, 3-trifluoromethylphenyl, phenylsulfonyl, methylsulfonyl, chlorophenyl, methyldoxolonyl, methyl, isopropyl, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, fluoromethyl, fluoroethyl and phenyl.

A process for preparing a polyfluorinated compound of formula Ar—R.sub.1 (I), wherein Ar—R.sub.1 (I) is an aromatic ring system

##STR00001##

wherein R.sub.1 is selected from the group consisting of SF.sub.4Cl, SF.sub.3, SF.sub.2CF.sub.3, TeF.sub.5, TeF.sub.4CF.sub.3, SeF.sub.3, IF.sub.2, SeF.sub.2CF.sub.3, and IF.sub.4, X.sub.2 is N or CR.sub.2, X.sub.3 is N or CR.sub.3, X.sub.4 is N or CR.sub.4, X.sub.5 is N or CR.sub.5, X.sub.6 is N or CR.sub.6, and the total number of nitrogen atoms in the aromatic ring system is between 0 and 3, wherein R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently selected from the group consisting of hydrogen, fluoro, chloro, bromo, nitro, trifluoromethyl, 2,2,2-trifluoroethyl, pentafluorosulfanyl, phthalimido, azido, benzyloxy, trifluoromethoxy, 2,2,2-trifluoroethoxy, methoxycarbonyl, ethoxycarbonyl, methylcarbonyl, ethylcarbonyl, acetoxy, t-butyl, phenylcarbonyl, benzylcarbonyl, 3-trifluoromethylphenyl, phenylsulfonyl, methylsulfonyl, chlorophenyl, methyldoxolonyl, methyl, isopropyl, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, fluoromethyl, fluoroethyl and phenyl.

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A.sup.1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

##STR00001##